Stephen D Rosasco

Array ( [id] => 8604962 [patent_doc_number] => 20130010274 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-01-10 [patent_title] => 'MASKS FOR USE IN LITHOGRAPHY INCLUDING IMAGE REVERSAL ASSIST FEATURES, LITHOGRAPHY SYSTEMS INCLUDING SUCH MASKS, AND METHODS OF FORMING SUCH MASKS' [patent_app_type] => utility [patent_app_number] => 13/615103 [patent_app_country] => US [patent_app_date] => 2012-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 9705 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13615103 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8707876 [patent_doc_number] => 20130065165 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-03-14 [patent_title] => 'MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING A TRANSFER MASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 13/611707 [patent_app_country] => US [patent_app_date] => 2012-09-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 10535 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13611707 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9761955 [patent_doc_number] => 08846275 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-09-30 [patent_title] => 'Method for mask patterns' [patent_app_type] => utility [patent_app_number] => 13/610367 [patent_app_country] => US [patent_app_date] => 2012-09-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2624 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13610367 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9401427 [patent_doc_number] => 08691478 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-04-08 [patent_title] => 'Attenuated phase shift mask for multi-patterning' [patent_app_type] => utility [patent_app_number] => 13/607823 [patent_app_country] => US [patent_app_date] => 2012-09-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 27 [patent_no_of_words] => 5250 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13607823 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8707875 [patent_doc_number] => 20130065164 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-03-14 [patent_title] => 'PELLICLE FOR LITHOGRAPHY AND A METHOD OF MAKING THEREOF' [patent_app_type] => utility [patent_app_number] => 13/606162 [patent_app_country] => US [patent_app_date] => 2012-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 10151 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13606162 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8697227 [patent_doc_number] => 20130059236 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-03-07 [patent_title] => 'MASK BLANK, TRANSFER MASK AND PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICES' [patent_app_type] => utility [patent_app_number] => 13/605125 [patent_app_country] => US [patent_app_date] => 2012-09-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 16270 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13605125 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9003510 [patent_doc_number] => 20130224635 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-08-29 [patent_title] => 'MASK PATTERN CREATION METHOD, RECORDING MEDIUM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD' [patent_app_type] => utility [patent_app_number] => 13/604076 [patent_app_country] => US [patent_app_date] => 2012-09-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 11944 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13604076 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8841387 [patent_doc_number] => 20130137015 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-05-30 [patent_title] => 'MASK AND PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 13/604003 [patent_app_country] => US [patent_app_date] => 2012-09-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 2756 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13604003 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8821359 [patent_doc_number] => 20130122404 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-05-16 [patent_title] => 'METHOD OF FORMING PHOTOMASKS AND PHOTOMASKS FORMED BY THE SAME' [patent_app_type] => utility [patent_app_number] => 13/602598 [patent_app_country] => US [patent_app_date] => 2012-09-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 3942 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13602598 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9607920 [patent_doc_number] => 08785084 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-22 [patent_title] => 'Method for mask fabrication and repair' [patent_app_type] => utility [patent_app_number] => 13/602916 [patent_app_country] => US [patent_app_date] => 2012-09-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3912 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13602916 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10463778 [patent_doc_number] => 20150348793 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-12-03 [patent_title] => 'PLASMONIC NANO-LITHOGRAPHY BASED ON ATTENUATED TOTAL REFLECTION' [patent_app_type] => utility [patent_app_number] => 14/425326 [patent_app_country] => US [patent_app_date] => 2012-09-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 6416 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14425326 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8566403 [patent_doc_number] => 20120328974 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-12-27 [patent_title] => 'PHOTOMASK DEFECT CORRECTING METHOD AND DEVICE' [patent_app_type] => utility [patent_app_number] => 13/601028 [patent_app_country] => US [patent_app_date] => 2012-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 11787 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13601028 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8522592 [patent_doc_number] => 20120322000 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-12-20 [patent_title] => 'REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME' [patent_app_type] => utility [patent_app_number] => 13/598837 [patent_app_country] => US [patent_app_date] => 2012-08-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 14314 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13598837 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9589033 [patent_doc_number] => 08778572 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-15 [patent_title] => 'Photomask and pattern forming method' [patent_app_type] => utility [patent_app_number] => 13/599152 [patent_app_country] => US [patent_app_date] => 2012-08-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 23 [patent_no_of_words] => 5335 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13599152 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9574919 [patent_doc_number] => 08765331 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-01 [patent_title] => 'Reducing edge die reflectivity in extreme ultraviolet lithography' [patent_app_type] => utility [patent_app_number] => 13/587970 [patent_app_country] => US [patent_app_date] => 2012-08-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 19 [patent_no_of_words] => 6181 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13587970 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9054715 [patent_doc_number] => 20130252429 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-09-26 [patent_title] => 'MASK AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 13/569860 [patent_app_country] => US [patent_app_date] => 2012-08-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 7522 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13569860 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9703564 [patent_doc_number] => 08828625 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-09-09 [patent_title] => 'Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same' [patent_app_type] => utility [patent_app_number] => 13/567900 [patent_app_country] => US [patent_app_date] => 2012-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 6221 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13567900 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9496238 [patent_doc_number] => 08735050 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-27 [patent_title] => 'Integrated circuits and methods for fabricating integrated circuits using double patterning processes' [patent_app_type] => utility [patent_app_number] => 13/567233 [patent_app_country] => US [patent_app_date] => 2012-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 4509 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 204 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13567233 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9626253 [patent_doc_number] => 08795930 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-08-05 [patent_title] => 'Self-polarized mask and self-polarized mask application' [patent_app_type] => utility [patent_app_number] => 13/565080 [patent_app_country] => US [patent_app_date] => 2012-08-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 30 [patent_no_of_words] => 4604 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13565080 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9574918 [patent_doc_number] => 08765330 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-01 [patent_title] => 'Phase shift mask for extreme ultraviolet lithography and method of fabricating same' [patent_app_type] => utility [patent_app_number] => 13/564198 [patent_app_country] => US [patent_app_date] => 2012-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 7226 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13564198 [rel_patent_id] =>[rel_patent_doc_number] =>)