Search

Stephen D Rosasco

Examiner (ID: 6637, Phone: (571)272-1389 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1752, 1795, 1507, 1721, 1113, 1756, 1737
Total Applications
2769
Issued Applications
2461
Pending Applications
68
Abandoned Applications
246

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 8796838 [patent_doc_number] => 08435705 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-05-07 [patent_title] => 'Methods of correcting optical parameters in photomasks' [patent_app_type] => utility [patent_app_number] => 13/072993 [patent_app_country] => US [patent_app_date] => 2011-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 16 [patent_no_of_words] => 6679 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13072993 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/072993
Methods of correcting optical parameters in photomasks Mar 27, 2011 Issued
Array ( [id] => 6189141 [patent_doc_number] => 20110171821 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-07-14 [patent_title] => 'Semiconductor Devices and Methods of Manufacturing Thereof' [patent_app_type] => utility [patent_app_number] => 13/072227 [patent_app_country] => US [patent_app_date] => 2011-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7884 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0171/20110171821.pdf [firstpage_image] =>[orig_patent_app_number] => 13072227 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/072227
Semiconductor devices and methods of manufacturing thereof Mar 24, 2011 Issued
Array ( [id] => 6188580 [patent_doc_number] => 20110171567 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-07-14 [patent_title] => 'PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK BLANK' [patent_app_type] => utility [patent_app_number] => 13/072571 [patent_app_country] => US [patent_app_date] => 2011-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 10630 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0171/20110171567.pdf [firstpage_image] =>[orig_patent_app_number] => 13072571 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/072571
Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank Mar 24, 2011 Issued
Array ( [id] => 8932357 [patent_doc_number] => 08492054 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-07-23 [patent_title] => 'Mechanisms for patterning fine features' [patent_app_type] => utility [patent_app_number] => 13/072169 [patent_app_country] => US [patent_app_date] => 2011-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5028 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13072169 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/072169
Mechanisms for patterning fine features Mar 24, 2011 Issued
Array ( [id] => 6188579 [patent_doc_number] => 20110171566 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-07-14 [patent_title] => 'REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY' [patent_app_type] => utility [patent_app_number] => 13/070728 [patent_app_country] => US [patent_app_date] => 2011-03-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 13883 [patent_no_of_claims] => 37 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0171/20110171566.pdf [firstpage_image] =>[orig_patent_app_number] => 13070728 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/070728
Reflective mask blank for EUV lithography Mar 23, 2011 Issued
Array ( [id] => 8875540 [patent_doc_number] => 08470500 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-06-25 [patent_title] => 'Reflective extreme ultraviolet mask' [patent_app_type] => utility [patent_app_number] => 13/069758 [patent_app_country] => US [patent_app_date] => 2011-03-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 3998 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13069758 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/069758
Reflective extreme ultraviolet mask Mar 22, 2011 Issued
Array ( [id] => 8560020 [patent_doc_number] => 08334083 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-12-18 [patent_title] => 'Etch process for controlling pattern CD and integrity in multi-layer masks' [patent_app_type] => utility [patent_app_number] => 13/053215 [patent_app_country] => US [patent_app_date] => 2011-03-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 15 [patent_no_of_words] => 7518 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 251 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13053215 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/053215
Etch process for controlling pattern CD and integrity in multi-layer masks Mar 21, 2011 Issued
Array ( [id] => 7488274 [patent_doc_number] => 20110236807 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-09-29 [patent_title] => 'Pellicle for lithography' [patent_app_type] => utility [patent_app_number] => 13/064335 [patent_app_country] => US [patent_app_date] => 2011-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3138 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0236/20110236807.pdf [firstpage_image] =>[orig_patent_app_number] => 13064335 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/064335
Pellicle for lithography Mar 20, 2011 Issued
Array ( [id] => 8405795 [patent_doc_number] => 20120237858 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-09-20 [patent_title] => 'PHOTOMASK AND A METHOD FOR DETERMINING A PATTERN OF A PHOTOMASK' [patent_app_type] => utility [patent_app_number] => 13/051339 [patent_app_country] => US [patent_app_date] => 2011-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 3245 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13051339 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/051339
PHOTOMASK AND A METHOD FOR DETERMINING A PATTERN OF A PHOTOMASK Mar 17, 2011 Abandoned
Array ( [id] => 7977035 [patent_doc_number] => 08071264 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-12-06 [patent_title] => 'Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask' [patent_app_type] => utility [patent_app_number] => 13/050548 [patent_app_country] => US [patent_app_date] => 2011-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 31 [patent_no_of_words] => 13276 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 169 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/071/08071264.pdf [firstpage_image] =>[orig_patent_app_number] => 13050548 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/050548
Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask Mar 16, 2011 Issued
Array ( [id] => 8339899 [patent_doc_number] => 08241821 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-08-14 [patent_title] => 'Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithography' [patent_app_type] => utility [patent_app_number] => 13/038429 [patent_app_country] => US [patent_app_date] => 2011-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 11962 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 153 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13038429 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/038429
Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithography Mar 1, 2011 Issued
Array ( [id] => 9046594 [patent_doc_number] => 08541147 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-09-24 [patent_title] => 'System and method of selective optical pattern enhancement for semiconductor manufacturing' [patent_app_type] => utility [patent_app_number] => 13/035900 [patent_app_country] => US [patent_app_date] => 2011-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 11 [patent_no_of_words] => 4241 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13035900 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/035900
System and method of selective optical pattern enhancement for semiconductor manufacturing Feb 24, 2011 Issued
Array ( [id] => 8675185 [patent_doc_number] => 08383298 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-02-26 [patent_title] => 'Substrate processing method, manufacturing method of EUV mask, and EUV mask' [patent_app_type] => utility [patent_app_number] => 13/034143 [patent_app_country] => US [patent_app_date] => 2011-02-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 14 [patent_no_of_words] => 4451 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13034143 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/034143
Substrate processing method, manufacturing method of EUV mask, and EUV mask Feb 23, 2011 Issued
Array ( [id] => 8675184 [patent_doc_number] => 08383297 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-02-26 [patent_title] => 'Pellicle for lithography and method for manufacturing pellicle film' [patent_app_type] => utility [patent_app_number] => 13/032186 [patent_app_country] => US [patent_app_date] => 2011-02-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 8187 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13032186 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/032186
Pellicle for lithography and method for manufacturing pellicle film Feb 21, 2011 Issued
Array ( [id] => 7567281 [patent_doc_number] => 20110287344 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-11-24 [patent_title] => 'REFLECTIVE PHOTOMASK, MANUFACTURING METHOD OF THE PHOTOMASK, AND PATTERN FORMATION METHOD' [patent_app_type] => utility [patent_app_number] => 13/029637 [patent_app_country] => US [patent_app_date] => 2011-02-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 8091 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0287/20110287344.pdf [firstpage_image] =>[orig_patent_app_number] => 13029637 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/029637
REFLECTIVE PHOTOMASK, MANUFACTURING METHOD OF THE PHOTOMASK, AND PATTERN FORMATION METHOD Feb 16, 2011 Abandoned
Array ( [id] => 8870509 [patent_doc_number] => 08465885 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-06-18 [patent_title] => 'Boundary layer formation and resultant structures' [patent_app_type] => utility [patent_app_number] => 13/021852 [patent_app_country] => US [patent_app_date] => 2011-02-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 22 [patent_no_of_words] => 2693 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13021852 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/021852
Boundary layer formation and resultant structures Feb 6, 2011 Issued
Array ( [id] => 8772130 [patent_doc_number] => 08426083 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-04-23 [patent_title] => 'Pellicle for lithography' [patent_app_type] => utility [patent_app_number] => 12/929554 [patent_app_country] => US [patent_app_date] => 2011-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 2940 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12929554 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/929554
Pellicle for lithography Jan 31, 2011 Issued
Array ( [id] => 8533126 [patent_doc_number] => 08309279 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-11-13 [patent_title] => 'Pellicle for lithography' [patent_app_type] => utility [patent_app_number] => 12/929555 [patent_app_country] => US [patent_app_date] => 2011-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 3930 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12929555 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/929555
Pellicle for lithography Jan 31, 2011 Issued
Array ( [id] => 8858308 [patent_doc_number] => 08460842 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-06-11 [patent_title] => 'Defect repair apparatus and method for EUV mask using a hydrogen ion beam' [patent_app_type] => utility [patent_app_number] => 12/931412 [patent_app_country] => US [patent_app_date] => 2011-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5024 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12931412 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/931412
Defect repair apparatus and method for EUV mask using a hydrogen ion beam Jan 27, 2011 Issued
Array ( [id] => 8323804 [patent_doc_number] => 20120196209 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-08-02 [patent_title] => 'L-shaped Feature, Method of Making an L-shaped Feature and Method of Making an L-shaped Structure' [patent_app_type] => utility [patent_app_number] => 13/016841 [patent_app_country] => US [patent_app_date] => 2011-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 4645 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13016841 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/016841
L-shaped feature, method of making an L-shaped feature and method of making an L-shaped structure Jan 27, 2011 Issued
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