
Stephen D Rosasco
Examiner (ID: 6637, Phone: (571)272-1389 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1752, 1795, 1507, 1721, 1113, 1756, 1737 |
| Total Applications | 2769 |
| Issued Applications | 2461 |
| Pending Applications | 68 |
| Abandoned Applications | 246 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8796838
[patent_doc_number] => 08435705
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-05-07
[patent_title] => 'Methods of correcting optical parameters in photomasks'
[patent_app_type] => utility
[patent_app_number] => 13/072993
[patent_app_country] => US
[patent_app_date] => 2011-03-28
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[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13072993
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Array
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[patent_issue_date] => 2011-07-14
[patent_title] => 'Semiconductor Devices and Methods of Manufacturing Thereof'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 13/072227 | Semiconductor devices and methods of manufacturing thereof | Mar 24, 2011 | Issued |
Array
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[patent_issue_date] => 2011-07-14
[patent_title] => 'PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK BLANK'
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Array
(
[id] => 8932357
[patent_doc_number] => 08492054
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[patent_issue_date] => 2013-07-23
[patent_title] => 'Mechanisms for patterning fine features'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 13/072169 | Mechanisms for patterning fine features | Mar 24, 2011 | Issued |
Array
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[patent_title] => 'REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY'
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Array
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[patent_title] => 'Reflective extreme ultraviolet mask'
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Array
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Array
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[id] => 7488274
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[patent_title] => 'Pellicle for lithography'
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[patent_app_number] => 13/064335
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[rel_patent_id] =>[rel_patent_doc_number] =>) 13/064335 | Pellicle for lithography | Mar 20, 2011 | Issued |
Array
(
[id] => 8405795
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[patent_issue_date] => 2012-09-20
[patent_title] => 'PHOTOMASK AND A METHOD FOR DETERMINING A PATTERN OF A PHOTOMASK'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 13/051339 | PHOTOMASK AND A METHOD FOR DETERMINING A PATTERN OF A PHOTOMASK | Mar 17, 2011 | Abandoned |
Array
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[id] => 7977035
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[patent_title] => 'Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask'
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Array
(
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[patent_title] => 'Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithography'
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Array
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Array
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Array
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Array
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Array
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