
Stephen D Rosasco
Examiner (ID: 6637, Phone: (571)272-1389 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1752, 1795, 1507, 1721, 1113, 1756, 1737 |
| Total Applications | 2769 |
| Issued Applications | 2461 |
| Pending Applications | 68 |
| Abandoned Applications | 246 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8213689
[patent_doc_number] => 08192900
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-06-05
[patent_title] => 'Advanced phase shift lithography and attenuated phase shift mask for narrow track width d write pole definition'
[patent_app_type] => utility
[patent_app_number] => 12/714159
[patent_app_country] => US
[patent_app_date] => 2010-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 31
[patent_figures_cnt] => 31
[patent_no_of_words] => 5657
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/192/08192900.pdf
[firstpage_image] =>[orig_patent_app_number] => 12714159
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/714159 | Advanced phase shift lithography and attenuated phase shift mask for narrow track width d write pole definition | Feb 25, 2010 | Issued |
Array
(
[id] => 6395227
[patent_doc_number] => 20100304279
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-02
[patent_title] => 'MANUFACTURING METHOD OF PHASE SHIFT MASK, CREATING METHOD OF MASK DATA OF PHASE SHIFT MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/708944
[patent_app_country] => US
[patent_app_date] => 2010-02-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5181
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0304/20100304279.pdf
[firstpage_image] =>[orig_patent_app_number] => 12708944
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/708944 | MANUFACTURING METHOD OF PHASE SHIFT MASK, CREATING METHOD OF MASK DATA OF PHASE SHIFT MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Feb 18, 2010 | Abandoned |
Array
(
[id] => 6435475
[patent_doc_number] => 20100143831
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-06-10
[patent_title] => 'PHOTOMASK BLANK AND PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 12/709116
[patent_app_country] => US
[patent_app_date] => 2010-02-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8646
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0143/20100143831.pdf
[firstpage_image] =>[orig_patent_app_number] => 12709116
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/709116 | Photomask blank and photomask | Feb 18, 2010 | Issued |
Array
(
[id] => 6505459
[patent_doc_number] => 20100216063
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-26
[patent_title] => 'Masks and methods of forming the same'
[patent_app_type] => utility
[patent_app_number] => 12/656881
[patent_app_country] => US
[patent_app_date] => 2010-02-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 4269
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0216/20100216063.pdf
[firstpage_image] =>[orig_patent_app_number] => 12656881
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/656881 | Masks and methods of forming the same | Feb 17, 2010 | Issued |
Array
(
[id] => 6497962
[patent_doc_number] => 20100209826
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-19
[patent_title] => 'Apparatus for processing photomask, methods of using the same, and methods of processing photomask'
[patent_app_type] => utility
[patent_app_number] => 12/656747
[patent_app_country] => US
[patent_app_date] => 2010-02-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 6043
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0209/20100209826.pdf
[firstpage_image] =>[orig_patent_app_number] => 12656747
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/656747 | Apparatus for processing photomask, methods of using the same, and methods of processing photomask | Feb 15, 2010 | Abandoned |
Array
(
[id] => 6505451
[patent_doc_number] => 20100216062
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-26
[patent_title] => 'Reflective photomask and method of fabricating, reflective illumination system and method of process using the same'
[patent_app_type] => utility
[patent_app_number] => 12/656668
[patent_app_country] => US
[patent_app_date] => 2010-02-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 7224
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0216/20100216062.pdf
[firstpage_image] =>[orig_patent_app_number] => 12656668
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/656668 | Reflective photomask and method of fabricating, reflective illumination system and method of process using the same | Feb 11, 2010 | Issued |
Array
(
[id] => 9344729
[patent_doc_number] => 08663876
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-03-04
[patent_title] => 'Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 13/201368
[patent_app_country] => US
[patent_app_date] => 2010-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 15254
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13201368
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/201368 | Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same | Feb 3, 2010 | Issued |
Array
(
[id] => 6524501
[patent_doc_number] => 20100203432
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-12
[patent_title] => 'EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/700457
[patent_app_country] => US
[patent_app_date] => 2010-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6885
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0203/20100203432.pdf
[firstpage_image] =>[orig_patent_app_number] => 12700457
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/700457 | Exposure mask and method for manufacturing same and method for manufacturing semiconductor device | Feb 3, 2010 | Issued |
Array
(
[id] => 7580162
[patent_doc_number] => 20110294045
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-12-01
[patent_title] => 'PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 13/147634
[patent_app_country] => US
[patent_app_date] => 2010-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 22
[patent_no_of_words] => 22334
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0294/20110294045.pdf
[firstpage_image] =>[orig_patent_app_number] => 13147634
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/147634 | Photomask and methods for manufacturing and correcting photomask | Feb 3, 2010 | Issued |
Array
(
[id] => 6246951
[patent_doc_number] => 20100136487
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-06-03
[patent_title] => 'PATTERN FORMATION METHOD USING LEVENSON-TYPE MASK AND METHOD OF MANUFACTURING LEVENSON-TYPE MASK'
[patent_app_type] => utility
[patent_app_number] => 12/699330
[patent_app_country] => US
[patent_app_date] => 2010-02-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 13197
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0136/20100136487.pdf
[firstpage_image] =>[orig_patent_app_number] => 12699330
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/699330 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask | Feb 2, 2010 | Issued |
Array
(
[id] => 8994728
[patent_doc_number] => 08518612
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-08-27
[patent_title] => 'Pellicle for lithography and manufacturing method thereof'
[patent_app_type] => utility
[patent_app_number] => 13/264552
[patent_app_country] => US
[patent_app_date] => 2010-02-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 21
[patent_no_of_words] => 4651
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13264552
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/264552 | Pellicle for lithography and manufacturing method thereof | Feb 1, 2010 | Issued |
Array
(
[id] => 9344728
[patent_doc_number] => 08663875
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-03-04
[patent_title] => 'Method of manufacturing a photomask'
[patent_app_type] => utility
[patent_app_number] => 13/201148
[patent_app_country] => US
[patent_app_date] => 2010-01-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 12881
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13201148
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/201148 | Method of manufacturing a photomask | Jan 28, 2010 | Issued |
Array
(
[id] => 7586697
[patent_doc_number] => 20110281207
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-11-17
[patent_title] => 'REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK'
[patent_app_type] => utility
[patent_app_number] => 13/122024
[patent_app_country] => US
[patent_app_date] => 2010-01-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8353
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0281/20110281207.pdf
[firstpage_image] =>[orig_patent_app_number] => 13122024
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/122024 | Reflective mask blank and method of manufacturing a reflective mask | Jan 28, 2010 | Issued |
Array
(
[id] => 6416639
[patent_doc_number] => 20100167187
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-01
[patent_title] => 'REFLECTIVE-TYPE MASK BLANK FOR EUV LITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 12/694860
[patent_app_country] => US
[patent_app_date] => 2010-01-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 15010
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0167/20100167187.pdf
[firstpage_image] =>[orig_patent_app_number] => 12694860
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/694860 | Reflective-type mask blank for EUV lithography | Jan 26, 2010 | Issued |
Array
(
[id] => 8213675
[patent_doc_number] => 08192899
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-06-05
[patent_title] => 'Pellicle for photolithography'
[patent_app_type] => utility
[patent_app_number] => 12/656207
[patent_app_country] => US
[patent_app_date] => 2010-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 11
[patent_no_of_words] => 7295
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/192/08192899.pdf
[firstpage_image] =>[orig_patent_app_number] => 12656207
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/656207 | Pellicle for photolithography | Jan 20, 2010 | Issued |
Array
(
[id] => 6229424
[patent_doc_number] => 20100183960
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-22
[patent_title] => 'PATTERN CORRECTION METHOD, EXPOSURE MASK, MANUFACTURING METHOD OF EXPOSURE MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/688039
[patent_app_country] => US
[patent_app_date] => 2010-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 18
[patent_no_of_words] => 10287
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0183/20100183960.pdf
[firstpage_image] =>[orig_patent_app_number] => 12688039
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/688039 | Pattern correction method, exposure mask, manufacturing method of exposure mask, and manufacturing method of semiconductor device | Jan 14, 2010 | Issued |
Array
(
[id] => 8527577
[patent_doc_number] => 08304146
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-11-06
[patent_title] => 'Photomask making method, photomask blank and dry etching method'
[patent_app_type] => utility
[patent_app_number] => 12/687539
[patent_app_country] => US
[patent_app_date] => 2010-01-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 14314
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 275
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12687539
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/687539 | Photomask making method, photomask blank and dry etching method | Jan 13, 2010 | Issued |
Array
(
[id] => 6397651
[patent_doc_number] => 20100178598
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-15
[patent_title] => 'METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS'
[patent_app_type] => utility
[patent_app_number] => 12/685491
[patent_app_country] => US
[patent_app_date] => 2010-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1505
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0178/20100178598.pdf
[firstpage_image] =>[orig_patent_app_number] => 12685491
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/685491 | Method and apparatus for sub-pellicle defect reduction on photomasks | Jan 10, 2010 | Issued |
Array
(
[id] => 8351814
[patent_doc_number] => 08247141
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-08-21
[patent_title] => 'Method of generating reticle data, memory medium storing program for generating reticle data and method of producing reticle'
[patent_app_type] => utility
[patent_app_number] => 12/685275
[patent_app_country] => US
[patent_app_date] => 2010-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
[patent_figures_cnt] => 60
[patent_no_of_words] => 10493
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 218
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12685275
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/685275 | Method of generating reticle data, memory medium storing program for generating reticle data and method of producing reticle | Jan 10, 2010 | Issued |
Array
(
[id] => 6606794
[patent_doc_number] => 20100323280
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-23
[patent_title] => 'Mask for EUV Lithography and Method for Exposure Using the Same'
[patent_app_type] => utility
[patent_app_number] => 12/650869
[patent_app_country] => US
[patent_app_date] => 2009-12-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 3586
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0323/20100323280.pdf
[firstpage_image] =>[orig_patent_app_number] => 12650869
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/650869 | Mask for EUV lithography and method for exposure using the same | Dec 30, 2009 | Issued |