
Stephen D Rosasco
Examiner (ID: 6637, Phone: (571)272-1389 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1752, 1795, 1507, 1721, 1113, 1756, 1737 |
| Total Applications | 2769 |
| Issued Applications | 2461 |
| Pending Applications | 68 |
| Abandoned Applications | 246 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6395221
[patent_doc_number] => 20100304278
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-02
[patent_title] => 'Method for Fabricating a Phase Shift Mask Using a Binary Blank'
[patent_app_type] => utility
[patent_app_number] => 12/650768
[patent_app_country] => US
[patent_app_date] => 2009-12-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 2520
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0304/20100304278.pdf
[firstpage_image] =>[orig_patent_app_number] => 12650768
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/650768 | Method for Fabricating a Phase Shift Mask Using a Binary Blank | Dec 30, 2009 | Abandoned |
Array
(
[id] => 6395213
[patent_doc_number] => 20100304277
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-02
[patent_title] => 'Photomask for Extreme Ultraviolet Lithography and Method for Fabricating the Same'
[patent_app_type] => utility
[patent_app_number] => 12/649566
[patent_app_country] => US
[patent_app_date] => 2009-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3117
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0304/20100304277.pdf
[firstpage_image] =>[orig_patent_app_number] => 12649566
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/649566 | Photomask for extreme ultraviolet lithography and method for fabricating the same | Dec 29, 2009 | Issued |
Array
(
[id] => 6557047
[patent_doc_number] => 20100233589
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-09-16
[patent_title] => 'Method for Manufacturing Photomask Using Self-assembled Molecule Layer'
[patent_app_type] => utility
[patent_app_number] => 12/648030
[patent_app_country] => US
[patent_app_date] => 2009-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2424
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0233/20100233589.pdf
[firstpage_image] =>[orig_patent_app_number] => 12648030
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/648030 | Method for manufacturing photomask using self-assembled molecule layer | Dec 27, 2009 | Issued |
Array
(
[id] => 6416628
[patent_doc_number] => 20100167185
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-01
[patent_title] => 'PHOTOMASK BLANK MANUFACTURING METHOD AND PHOTOMASK MANUFACTURING METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/647808
[patent_app_country] => US
[patent_app_date] => 2009-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 13135
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0167/20100167185.pdf
[firstpage_image] =>[orig_patent_app_number] => 12647808
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/647808 | Photomask blank manufacturing method and photomask manufacturing method | Dec 27, 2009 | Issued |
Array
(
[id] => 6557050
[patent_doc_number] => 20100233590
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-09-16
[patent_title] => 'Method for Manufacturing Photo Mask Using Fluorescence Layer'
[patent_app_type] => utility
[patent_app_number] => 12/648047
[patent_app_country] => US
[patent_app_date] => 2009-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3351
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0233/20100233590.pdf
[firstpage_image] =>[orig_patent_app_number] => 12648047
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/648047 | Method for Manufacturing Photo Mask Using Fluorescence Layer | Dec 27, 2009 | Abandoned |
Array
(
[id] => 9059612
[patent_doc_number] => 08546047
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-10-01
[patent_title] => 'Reflective mask blank and method of manufacturing a reflective mask'
[patent_app_type] => utility
[patent_app_number] => 13/122099
[patent_app_country] => US
[patent_app_date] => 2009-12-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 10646
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 126
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13122099
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/122099 | Reflective mask blank and method of manufacturing a reflective mask | Dec 23, 2009 | Issued |
Array
(
[id] => 6630764
[patent_doc_number] => 20100173230
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-08
[patent_title] => 'PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 12/639155
[patent_app_country] => US
[patent_app_date] => 2009-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4849
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0173/20100173230.pdf
[firstpage_image] =>[orig_patent_app_number] => 12639155
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/639155 | Photomask | Dec 15, 2009 | Issued |
Array
(
[id] => 6484271
[patent_doc_number] => 20100092878
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-04-15
[patent_title] => 'PHASE SHIFT MASK WITH TWO-PHASE CLEAR FEATURE'
[patent_app_type] => utility
[patent_app_number] => 12/637604
[patent_app_country] => US
[patent_app_date] => 2009-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4020
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0092/20100092878.pdf
[firstpage_image] =>[orig_patent_app_number] => 12637604
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/637604 | Phase shift mask with two-phase clear feature | Dec 13, 2009 | Issued |
Array
(
[id] => 6416633
[patent_doc_number] => 20100167186
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-01
[patent_title] => 'Extreme ultraviolet photomask and methods and apparatuses for manufacturing the extreme ultraviolet photomask'
[patent_app_type] => utility
[patent_app_number] => 12/654174
[patent_app_country] => US
[patent_app_date] => 2009-12-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 6847
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0167/20100167186.pdf
[firstpage_image] =>[orig_patent_app_number] => 12654174
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/654174 | Extreme ultraviolet photomask and methods and apparatuses for manufacturing the extreme ultraviolet photomask | Dec 10, 2009 | Issued |
Array
(
[id] => 6557042
[patent_doc_number] => 20100233588
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-09-16
[patent_title] => 'Phase Shift Mask with Enhanced Resolution and Method for Fabricating the Same'
[patent_app_type] => utility
[patent_app_number] => 12/633494
[patent_app_country] => US
[patent_app_date] => 2009-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 3933
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0233/20100233588.pdf
[firstpage_image] =>[orig_patent_app_number] => 12633494
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/633494 | Phase shift mask with enhanced resolution and method for fabricating the same | Dec 7, 2009 | Issued |
Array
(
[id] => 6024997
[patent_doc_number] => 20110053323
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-03
[patent_title] => 'PHOTOMASK AND METHOD FOR FABRICATING SOURCE/DRAIN ELECTRODE OF THIN FILM TRANSISTOR'
[patent_app_type] => utility
[patent_app_number] => 12/629985
[patent_app_country] => US
[patent_app_date] => 2009-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4650
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0053/20110053323.pdf
[firstpage_image] =>[orig_patent_app_number] => 12629985
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/629985 | Photomask and method for fabricating source/drain electrode of thin film transistor | Dec 2, 2009 | Issued |
Array
(
[id] => 4604536
[patent_doc_number] => 07985515
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-07-26
[patent_title] => 'Method and apparatus for performing model-based layout conversion for use with dipole illumination'
[patent_app_type] => utility
[patent_app_number] => 12/630280
[patent_app_country] => US
[patent_app_date] => 2009-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 26
[patent_no_of_words] => 7563
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 141
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/985/07985515.pdf
[firstpage_image] =>[orig_patent_app_number] => 12630280
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/630280 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Dec 2, 2009 | Issued |
Array
(
[id] => 6188581
[patent_doc_number] => 20110171568
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-07-14
[patent_title] => 'MASK BLANK SUBSTRATE'
[patent_app_type] => utility
[patent_app_number] => 13/120263
[patent_app_country] => US
[patent_app_date] => 2009-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 20633
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0171/20110171568.pdf
[firstpage_image] =>[orig_patent_app_number] => 13120263
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/120263 | Mask blank substrate | Nov 24, 2009 | Issued |
Array
(
[id] => 4579784
[patent_doc_number] => 07859645
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-12-28
[patent_title] => 'Masks and methods of manufacture thereof'
[patent_app_type] => utility
[patent_app_number] => 12/626515
[patent_app_country] => US
[patent_app_date] => 2009-11-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 21
[patent_no_of_words] => 9369
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 141
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/859/07859645.pdf
[firstpage_image] =>[orig_patent_app_number] => 12626515
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/626515 | Masks and methods of manufacture thereof | Nov 24, 2009 | Issued |
Array
(
[id] => 6395207
[patent_doc_number] => 20100304276
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-02
[patent_title] => 'MASK AND METHOD FOR FABRICATING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/616388
[patent_app_country] => US
[patent_app_date] => 2009-11-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6519
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0304/20100304276.pdf
[firstpage_image] =>[orig_patent_app_number] => 12616388
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/616388 | Mask and method for fabricating the same | Nov 10, 2009 | Issued |
Array
(
[id] => 6088753
[patent_doc_number] => 20110217634
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-09-08
[patent_title] => 'MULTILAYER REFLECTIVE FILM COATED SUBSTRATE, REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING A REFLECTIVE MASK'
[patent_app_type] => utility
[patent_app_number] => 13/122322
[patent_app_country] => US
[patent_app_date] => 2009-11-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4438
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0217/20110217634.pdf
[firstpage_image] =>[orig_patent_app_number] => 13122322
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/122322 | Multilayer reflective film coated substrate, reflective mask blank, and method of manufacturing a reflective mask | Nov 10, 2009 | Issued |
Array
(
[id] => 8103381
[patent_doc_number] => 08153336
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-04-10
[patent_title] => 'Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask'
[patent_app_type] => utility
[patent_app_number] => 12/591121
[patent_app_country] => US
[patent_app_date] => 2009-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 12597
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 223
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/153/08153336.pdf
[firstpage_image] =>[orig_patent_app_number] => 12591121
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/591121 | Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask | Nov 8, 2009 | Issued |
Array
(
[id] => 5936561
[patent_doc_number] => 20110212392
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-09-01
[patent_title] => 'PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/126614
[patent_app_country] => US
[patent_app_date] => 2009-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 17
[patent_no_of_words] => 15843
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0212/20110212392.pdf
[firstpage_image] =>[orig_patent_app_number] => 13126614
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/126614 | Photomask blank, photomask, and methods of manufacturing the same | Oct 26, 2009 | Issued |
Array
(
[id] => 7795596
[patent_doc_number] => 08124302
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-02-28
[patent_title] => 'Optical component for EUVL and smoothing method thereof'
[patent_app_type] => utility
[patent_app_number] => 12/582847
[patent_app_country] => US
[patent_app_date] => 2009-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 12331
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/124/08124302.pdf
[firstpage_image] =>[orig_patent_app_number] => 12582847
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/582847 | Optical component for EUVL and smoothing method thereof | Oct 20, 2009 | Issued |
Array
(
[id] => 21886
[patent_doc_number] => 07799510
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-09-21
[patent_title] => 'Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 12/603055
[patent_app_country] => US
[patent_app_date] => 2009-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 34
[patent_figures_cnt] => 71
[patent_no_of_words] => 19167
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/799/07799510.pdf
[firstpage_image] =>[orig_patent_app_number] => 12603055
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/603055 | Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device | Oct 20, 2009 | Issued |