Search

Stephen D. Rosasco

Examiner (ID: 18862, Phone: (571)272-1389 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1756, 1721, 1507, 1752, 1795, 1737, 1113
Total Applications
2769
Issued Applications
2461
Pending Applications
68
Abandoned Applications
246

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 7025283 [patent_doc_number] => 20050019677 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-27 [patent_title] => 'Photomask blank substrate, photomask blank and photomask' [patent_app_type] => utility [patent_app_number] => 10/896970 [patent_app_country] => US [patent_app_date] => 2004-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 10782 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0019/20050019677.pdf [firstpage_image] =>[orig_patent_app_number] => 10896970 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/896970
Photomask blank substrate, photomask blank and photomask Jul 22, 2004 Issued
Array ( [id] => 830006 [patent_doc_number] => 07399558 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-15 [patent_title] => 'Mask and manufacturing method thereof and exposure method' [patent_app_type] => utility [patent_app_number] => 10/896538 [patent_app_country] => US [patent_app_date] => 2004-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 35 [patent_no_of_words] => 9435 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 185 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/399/07399558.pdf [firstpage_image] =>[orig_patent_app_number] => 10896538 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/896538
Mask and manufacturing method thereof and exposure method Jul 21, 2004 Issued
Array ( [id] => 587941 [patent_doc_number] => 07435512 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-10-14 [patent_title] => 'Photolithography process and photomask structure implemented in a photolithography process' [patent_app_type] => utility [patent_app_number] => 10/894924 [patent_app_country] => US [patent_app_date] => 2004-07-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2661 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/435/07435512.pdf [firstpage_image] =>[orig_patent_app_number] => 10894924 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/894924
Photolithography process and photomask structure implemented in a photolithography process Jul 19, 2004 Issued
Array ( [id] => 602258 [patent_doc_number] => 07432021 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-10-07 [patent_title] => 'Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle' [patent_app_type] => utility [patent_app_number] => 10/890299 [patent_app_country] => US [patent_app_date] => 2004-07-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 43 [patent_no_of_words] => 12215 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/432/07432021.pdf [firstpage_image] =>[orig_patent_app_number] => 10890299 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/890299
Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle Jul 13, 2004 Issued
Array ( [id] => 887472 [patent_doc_number] => 07348107 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-03-25 [patent_title] => 'Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/886767 [patent_app_country] => US [patent_app_date] => 2004-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 9 [patent_no_of_words] => 3861 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/348/07348107.pdf [firstpage_image] =>[orig_patent_app_number] => 10886767 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/886767
Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method Jul 7, 2004 Issued
Array ( [id] => 5738359 [patent_doc_number] => 20060008749 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-01-12 [patent_title] => 'Method for manufacturing of a mask blank for EUV photolithography and mask blank' [patent_app_type] => utility [patent_app_number] => 10/885898 [patent_app_country] => US [patent_app_date] => 2004-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5937 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20060008749.pdf [firstpage_image] =>[orig_patent_app_number] => 10885898 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/885898
Method for manufacturing of a mask blank for EUV photolithography and mask blank Jul 7, 2004 Abandoned
Array ( [id] => 7088836 [patent_doc_number] => 20050008948 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-13 [patent_title] => 'Complementary division mask, method of producing mask, and program' [patent_app_type] => utility [patent_app_number] => 10/885822 [patent_app_country] => US [patent_app_date] => 2004-07-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 4983 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20050008948.pdf [firstpage_image] =>[orig_patent_app_number] => 10885822 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/885822
Complementary division mask, method of producing mask, and program Jul 6, 2004 Issued
Array ( [id] => 7275826 [patent_doc_number] => 20040235277 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-11-25 [patent_title] => '2N mask design for sequential lateral solidification' [patent_app_type] => new [patent_app_number] => 10/883230 [patent_app_country] => US [patent_app_date] => 2004-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 2489 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0235/20040235277.pdf [firstpage_image] =>[orig_patent_app_number] => 10883230 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/883230
2N mask design for sequential lateral solidification Jun 30, 2004 Issued
Array ( [id] => 852814 [patent_doc_number] => 07378195 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-05-27 [patent_title] => 'System for coloring a partially colored design in an alternating phase shift mask' [patent_app_type] => utility [patent_app_number] => 10/710224 [patent_app_country] => US [patent_app_date] => 2004-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 17 [patent_no_of_words] => 6161 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 329 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/378/07378195.pdf [firstpage_image] =>[orig_patent_app_number] => 10710224 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/710224
System for coloring a partially colored design in an alternating phase shift mask Jun 27, 2004 Issued
Array ( [id] => 7060923 [patent_doc_number] => 20050003284 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-06 [patent_title] => 'Method of correcting optical proximity effect of contact holes' [patent_app_type] => utility [patent_app_number] => 10/871755 [patent_app_country] => US [patent_app_date] => 2004-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2712 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20050003284.pdf [firstpage_image] =>[orig_patent_app_number] => 10871755 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/871755
Method of correcting optical proximity effect of contact holes Jun 17, 2004 Issued
Array ( [id] => 411294 [patent_doc_number] => 07282307 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-10-16 [patent_title] => 'Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same' [patent_app_type] => utility [patent_app_number] => 10/872057 [patent_app_country] => US [patent_app_date] => 2004-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 8696 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/282/07282307.pdf [firstpage_image] =>[orig_patent_app_number] => 10872057 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/872057
Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same Jun 17, 2004 Issued
Array ( [id] => 785059 [patent_doc_number] => 06989219 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-01-24 [patent_title] => 'Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks' [patent_app_type] => utility [patent_app_number] => 10/871941 [patent_app_country] => US [patent_app_date] => 2004-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 7528 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/989/06989219.pdf [firstpage_image] =>[orig_patent_app_number] => 10871941 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/871941
Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks Jun 16, 2004 Issued
Array ( [id] => 833328 [patent_doc_number] => 07396617 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-08 [patent_title] => 'Photomask reticle having multiple versions of the same mask pattern with different biases' [patent_app_type] => utility [patent_app_number] => 10/866976 [patent_app_country] => US [patent_app_date] => 2004-06-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 14 [patent_no_of_words] => 5404 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/396/07396617.pdf [firstpage_image] =>[orig_patent_app_number] => 10866976 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/866976
Photomask reticle having multiple versions of the same mask pattern with different biases Jun 13, 2004 Issued
Array ( [id] => 390129 [patent_doc_number] => 07300724 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-11-27 [patent_title] => 'Interference multilayer capping design for multilayer reflective mask blanks' [patent_app_type] => utility [patent_app_number] => 10/864945 [patent_app_country] => US [patent_app_date] => 2004-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 1834 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/300/07300724.pdf [firstpage_image] =>[orig_patent_app_number] => 10864945 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/864945
Interference multilayer capping design for multilayer reflective mask blanks Jun 8, 2004 Issued
Array ( [id] => 577257 [patent_doc_number] => 07452637 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-11-18 [patent_title] => 'Method and apparatus for clean photomask handling' [patent_app_type] => utility [patent_app_number] => 10/865145 [patent_app_country] => US [patent_app_date] => 2004-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3147 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/452/07452637.pdf [firstpage_image] =>[orig_patent_app_number] => 10865145 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/865145
Method and apparatus for clean photomask handling Jun 8, 2004 Issued
Array ( [id] => 5182850 [patent_doc_number] => 20070054196 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-08 [patent_title] => 'Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography' [patent_app_type] => utility [patent_app_number] => 10/578683 [patent_app_country] => US [patent_app_date] => 2004-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2697 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0054/20070054196.pdf [firstpage_image] =>[orig_patent_app_number] => 10578683 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/578683
Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography Jun 7, 2004 Issued
Array ( [id] => 830005 [patent_doc_number] => 07399557 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-15 [patent_title] => 'Photomask correcting method and manufacturing method of semiconductor device' [patent_app_type] => utility [patent_app_number] => 10/860138 [patent_app_country] => US [patent_app_date] => 2004-06-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 40 [patent_no_of_words] => 5740 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 336 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/399/07399557.pdf [firstpage_image] =>[orig_patent_app_number] => 10860138 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/860138
Photomask correcting method and manufacturing method of semiconductor device Jun 3, 2004 Issued
Array ( [id] => 803126 [patent_doc_number] => 07422829 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2008-09-09 [patent_title] => 'Optical proximity correction (OPC) technique to compensate for flare' [patent_app_type] => utility [patent_app_number] => 10/859276 [patent_app_country] => US [patent_app_date] => 2004-06-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 20 [patent_no_of_words] => 5576 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/422/07422829.pdf [firstpage_image] =>[orig_patent_app_number] => 10859276 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/859276
Optical proximity correction (OPC) technique to compensate for flare Jun 1, 2004 Issued
Array ( [id] => 7251452 [patent_doc_number] => 20040259042 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-12-23 [patent_title] => 'Method and system of lithography using masks having gray-tone features' [patent_app_type] => new [patent_app_number] => 10/855546 [patent_app_country] => US [patent_app_date] => 2004-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 11749 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 3 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0259/20040259042.pdf [firstpage_image] =>[orig_patent_app_number] => 10855546 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/855546
Method and system of lithography using masks having gray-tone features May 26, 2004 Issued
Array ( [id] => 507645 [patent_doc_number] => 07198872 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-04-03 [patent_title] => 'Light scattering EUVL mask' [patent_app_type] => utility [patent_app_number] => 10/709733 [patent_app_country] => US [patent_app_date] => 2004-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 3733 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/198/07198872.pdf [firstpage_image] =>[orig_patent_app_number] => 10709733 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/709733
Light scattering EUVL mask May 24, 2004 Issued
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