Stephen D Rosasco

Array ( [id] => 11206455 [patent_doc_number] => 09436081 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-09-06 [patent_title] => 'Methods of modifying masking reticles to remove forbidden pitch regions thereof' [patent_app_type] => utility [patent_app_number] => 14/205569 [patent_app_country] => US [patent_app_date] => 2014-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 19 [patent_no_of_words] => 6423 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14205569 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11278376 [patent_doc_number] => 09494855 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-11-15 [patent_title] => 'Lithography-oriented photomask repair' [patent_app_type] => utility [patent_app_number] => 14/205748 [patent_app_country] => US [patent_app_date] => 2014-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 20 [patent_no_of_words] => 7550 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14205748 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10562003 [patent_doc_number] => 09285672 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-03-15 [patent_title] => 'Reflective mask and method for manufacturing same' [patent_app_type] => utility [patent_app_number] => 14/187885 [patent_app_country] => US [patent_app_date] => 2014-02-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 23 [patent_no_of_words] => 11502 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14187885 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10589068 [patent_doc_number] => 09310674 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-04-12 [patent_title] => 'Mask that provides improved focus control using orthogonal edges' [patent_app_type] => utility [patent_app_number] => 14/185440 [patent_app_country] => US [patent_app_date] => 2014-02-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 37 [patent_no_of_words] => 25186 [patent_no_of_claims] => 40 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14185440 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10536146 [patent_doc_number] => 09261773 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-02-16 [patent_title] => 'Reflective mask blank for EUV lithography, and reflective layer-coated substrate for EUV lithography' [patent_app_type] => utility [patent_app_number] => 14/182688 [patent_app_country] => US [patent_app_date] => 2014-02-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 14331 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 306 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14182688 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10658007 [patent_doc_number] => 20160004151 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-01-07 [patent_title] => 'SURFACE DEFECT REPAIR BY IRRADIATION' [patent_app_type] => utility [patent_app_number] => 14/767263 [patent_app_country] => US [patent_app_date] => 2014-02-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7367 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14767263 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10342033 [patent_doc_number] => 20150227037 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-08-13 [patent_title] => 'Structure and Method of Photomask with Reduction of Electron-Beam Scatterring' [patent_app_type] => utility [patent_app_number] => 14/179136 [patent_app_country] => US [patent_app_date] => 2014-02-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 21 [patent_figures_cnt] => 21 [patent_no_of_words] => 7073 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14179136 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11786208 [patent_doc_number] => 09395634 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-07-19 [patent_title] => 'Pellicle frame and pellicle with this' [patent_app_type] => utility [patent_app_number] => 14/169283 [patent_app_country] => US [patent_app_date] => 2014-01-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 8 [patent_no_of_words] => 4471 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 31 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14169283 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10327415 [patent_doc_number] => 20150212419 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-07-30 [patent_title] => 'Lithography System And Method For Haze Elimination' [patent_app_type] => utility [patent_app_number] => 14/163287 [patent_app_country] => US [patent_app_date] => 2014-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4917 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14163287 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10320190 [patent_doc_number] => 20150205194 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-07-23 [patent_title] => 'Lithography Mask' [patent_app_type] => utility [patent_app_number] => 14/158068 [patent_app_country] => US [patent_app_date] => 2014-01-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5289 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14158068 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10453716 [patent_doc_number] => 20150338731 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-11-26 [patent_title] => 'MASK BLANK, PHASE-SHIFT MASK, AND METHOD FOR MANUFACTURING THE SAME' [patent_app_type] => utility [patent_app_number] => 14/760911 [patent_app_country] => US [patent_app_date] => 2014-01-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 42173 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14760911 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9435315 [patent_doc_number] => 20140113222 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-04-24 [patent_title] => 'Mask for Use in Lithography' [patent_app_type] => utility [patent_app_number] => 14/152680 [patent_app_country] => US [patent_app_date] => 2014-01-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3850 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14152680 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9463187 [patent_doc_number] => 20140127614 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-05-08 [patent_title] => 'PHOTOMASK BLANK, METHOD OF MANUFACTURING THE SAME, PHOTOMASK, AND METHOD OF MANUFACTURING THE SAME' [patent_app_type] => utility [patent_app_number] => 14/152788 [patent_app_country] => US [patent_app_date] => 2014-01-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 15268 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14152788 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11465269 [patent_doc_number] => 09581895 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-02-28 [patent_title] => 'Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device' [patent_app_type] => utility [patent_app_number] => 14/655190 [patent_app_country] => US [patent_app_date] => 2013-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 21342 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14655190 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10630067 [patent_doc_number] => 09348215 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-05-24 [patent_title] => 'Photolithographic masks and fabrication method thereof' [patent_app_type] => utility [patent_app_number] => 14/140678 [patent_app_country] => US [patent_app_date] => 2013-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 5215 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14140678 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11538118 [patent_doc_number] => 09612521 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-04-04 [patent_title] => 'Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor' [patent_app_type] => utility [patent_app_number] => 14/139371 [patent_app_country] => US [patent_app_date] => 2013-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3926 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14139371 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10637010 [patent_doc_number] => 09354508 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-05-31 [patent_title] => 'Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor' [patent_app_type] => utility [patent_app_number] => 14/139307 [patent_app_country] => US [patent_app_date] => 2013-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 4297 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14139307 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11186114 [patent_doc_number] => 09417515 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-08-16 [patent_title] => 'Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor' [patent_app_type] => utility [patent_app_number] => 14/139507 [patent_app_country] => US [patent_app_date] => 2013-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 4051 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14139507 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10177326 [patent_doc_number] => 09207529 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-12-08 [patent_title] => 'Reflective mask blank for EUV lithography, and process for its production' [patent_app_type] => utility [patent_app_number] => 14/134433 [patent_app_country] => US [patent_app_date] => 2013-12-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 15489 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14134433 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10143578 [patent_doc_number] => 09176385 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-11-03 [patent_title] => 'Lithography methods, methods for forming patterning tools and patterning tools' [patent_app_type] => utility [patent_app_number] => 14/107767 [patent_app_country] => US [patent_app_date] => 2013-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 13 [patent_no_of_words] => 3257 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14107767 [rel_patent_id] =>[rel_patent_doc_number] =>)