Search

Suman Kumar Nath

Examiner (ID: 19378, Phone: (571)270-1443 , Office: P/2855 )

Most Active Art Unit
2855
Art Unit(s)
2855, 2861
Total Applications
750
Issued Applications
599
Pending Applications
69
Abandoned Applications
101

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6080229 [patent_doc_number] => 20020081522 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-27 [patent_title] => 'Positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser' [patent_app_type] => new [patent_app_number] => 09/993634 [patent_app_country] => US [patent_app_date] => 2001-11-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 22293 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20020081522.pdf [firstpage_image] =>[orig_patent_app_number] => 09993634 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/993634
Positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser Nov 26, 2001 Abandoned
Array ( [id] => 5985600 [patent_doc_number] => 20020098442 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-25 [patent_title] => 'Resist resins, chemically amplified \nresist composition, and process for the \nformation of a pattern' [patent_app_type] => new [patent_app_number] => 09/991691 [patent_app_country] => US [patent_app_date] => 2001-11-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4579 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 12 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0098/20020098442.pdf [firstpage_image] =>[orig_patent_app_number] => 09991691 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/991691
Resist resins, chemically amplified nresist composition, and process for the nformation of a pattern Nov 25, 2001 Abandoned
Array ( [id] => 5969255 [patent_doc_number] => 20020091215 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-11 [patent_title] => 'Polymer, resist composition and patterning process' [patent_app_type] => new [patent_app_number] => 09/986274 [patent_app_country] => US [patent_app_date] => 2001-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16428 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0091/20020091215.pdf [firstpage_image] =>[orig_patent_app_number] => 09986274 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/986274
Polymer, resist composition and patterning process Nov 7, 2001 Issued
Array ( [id] => 1062630 [patent_doc_number] => 06849374 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-02-01 [patent_title] => 'Photoacid generators and photoresists comprising same' [patent_app_type] => utility [patent_app_number] => 10/007855 [patent_app_country] => US [patent_app_date] => 2001-11-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8005 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/849/06849374.pdf [firstpage_image] =>[orig_patent_app_number] => 10007855 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/007855
Photoacid generators and photoresists comprising same Nov 2, 2001 Issued
Array ( [id] => 6592328 [patent_doc_number] => 20020042019 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-11 [patent_title] => 'Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores' [patent_app_type] => new [patent_app_number] => 10/001467 [patent_app_country] => US [patent_app_date] => 2001-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 8427 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20020042019.pdf [firstpage_image] =>[orig_patent_app_number] => 10001467 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/001467
Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores Oct 30, 2001 Issued
Array ( [id] => 6744916 [patent_doc_number] => 20030022099 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-01-30 [patent_title] => 'Photoresist with adjustable polarized light reaction and photolithography process using the photoresist' [patent_app_type] => new [patent_app_number] => 10/017805 [patent_app_country] => US [patent_app_date] => 2001-10-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2352 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0022/20030022099.pdf [firstpage_image] =>[orig_patent_app_number] => 10017805 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/017805
Photoresist with adjustable polarized light reaction and photolithography process using the photoresist Oct 29, 2001 Abandoned
Array ( [id] => 6241934 [patent_doc_number] => 20020045127 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-18 [patent_title] => 'Polyimides, process for producing the same and photosensitive composition containing the same' [patent_app_type] => new [patent_app_number] => 09/982634 [patent_app_country] => US [patent_app_date] => 2001-10-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4321 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0045/20020045127.pdf [firstpage_image] =>[orig_patent_app_number] => 09982634 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/982634
Polyimides, process for producing the same and photosensitive composition containing the same Oct 17, 2001 Issued
Array ( [id] => 7312623 [patent_doc_number] => 20040033436 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-02-19 [patent_title] => 'Compositions for microlithography' [patent_app_type] => new [patent_app_number] => 10/380922 [patent_app_country] => US [patent_app_date] => 2003-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10712 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0033/20040033436.pdf [firstpage_image] =>[orig_patent_app_number] => 10380922 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/380922
Compositions for microlithography Oct 15, 2001 Issued
Array ( [id] => 5828150 [patent_doc_number] => 20020068237 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-06 [patent_title] => 'Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern' [patent_app_type] => new [patent_app_number] => 09/976279 [patent_app_country] => US [patent_app_date] => 2001-10-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7972 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20020068237.pdf [firstpage_image] =>[orig_patent_app_number] => 09976279 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/976279
Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern Oct 14, 2001 Issued
Array ( [id] => 1046641 [patent_doc_number] => 06864035 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-03-08 [patent_title] => 'Positive photosensitive resin composition, positive photosensitive dry film and method of forming pattern' [patent_app_type] => utility [patent_app_number] => 09/976278 [patent_app_country] => US [patent_app_date] => 2001-10-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8590 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/864/06864035.pdf [firstpage_image] =>[orig_patent_app_number] => 09976278 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/976278
Positive photosensitive resin composition, positive photosensitive dry film and method of forming pattern Oct 14, 2001 Issued
Array ( [id] => 7351058 [patent_doc_number] => 20040048188 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-03-11 [patent_title] => 'Positive photosensitive polyimide resin composition' [patent_app_type] => new [patent_app_number] => 10/381736 [patent_app_country] => US [patent_app_date] => 2003-04-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7943 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0048/20040048188.pdf [firstpage_image] =>[orig_patent_app_number] => 10381736 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/381736
Positive photosensitive polyimide resin composition Oct 2, 2001 Issued
Array ( [id] => 6355343 [patent_doc_number] => 20020057882 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-05-16 [patent_title] => 'Fluorinated polyethers having perfluorinated aliphatic group and optical waveguide using the same' [patent_app_type] => new [patent_app_number] => 09/964653 [patent_app_country] => US [patent_app_date] => 2001-09-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 5097 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0057/20020057882.pdf [firstpage_image] =>[orig_patent_app_number] => 09964653 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/964653
Fluorinated polyethers having perfluorinated aliphatic group and optical waveguide using the same Sep 27, 2001 Issued
Array ( [id] => 1137347 [patent_doc_number] => 06780563 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-24 [patent_title] => 'Polymer, resist composition and patterning process' [patent_app_type] => B2 [patent_app_number] => 09/963465 [patent_app_country] => US [patent_app_date] => 2001-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10272 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 13 [patent_words_short_claim] => 183 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/780/06780563.pdf [firstpage_image] =>[orig_patent_app_number] => 09963465 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/963465
Polymer, resist composition and patterning process Sep 26, 2001 Issued
Array ( [id] => 1196185 [patent_doc_number] => 06727039 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-04-27 [patent_title] => 'Positive photoresist composition' [patent_app_type] => B2 [patent_app_number] => 09/960343 [patent_app_country] => US [patent_app_date] => 2001-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12043 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 258 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/727/06727039.pdf [firstpage_image] =>[orig_patent_app_number] => 09960343 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/960343
Positive photoresist composition Sep 23, 2001 Issued
Array ( [id] => 6357762 [patent_doc_number] => 20020058201 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-05-16 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => new [patent_app_number] => 09/953941 [patent_app_country] => US [patent_app_date] => 2001-09-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 31126 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20020058201.pdf [firstpage_image] =>[orig_patent_app_number] => 09953941 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/953941
Radiation-sensitive resin composition Sep 17, 2001 Issued
Array ( [id] => 933942 [patent_doc_number] => 06977137 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-12-20 [patent_title] => 'Direct writing of optical devices in silica-based glass using femtosecond pulse lasers' [patent_app_type] => utility [patent_app_number] => 09/954500 [patent_app_country] => US [patent_app_date] => 2001-09-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 22 [patent_no_of_words] => 6860 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 144 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/977/06977137.pdf [firstpage_image] =>[orig_patent_app_number] => 09954500 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/954500
Direct writing of optical devices in silica-based glass using femtosecond pulse lasers Sep 16, 2001 Issued
Array ( [id] => 1247865 [patent_doc_number] => 06673515 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-01-06 [patent_title] => 'Polymer, resist composition and patterning process' [patent_app_type] => B2 [patent_app_number] => 09/951523 [patent_app_country] => US [patent_app_date] => 2001-09-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14928 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 220 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/673/06673515.pdf [firstpage_image] =>[orig_patent_app_number] => 09951523 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/951523
Polymer, resist composition and patterning process Sep 13, 2001 Issued
Array ( [id] => 1092395 [patent_doc_number] => 06824952 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-11-30 [patent_title] => 'Deep-UV anti-reflective resist compositions' [patent_app_type] => B1 [patent_app_number] => 09/951718 [patent_app_country] => US [patent_app_date] => 2001-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5254 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/824/06824952.pdf [firstpage_image] =>[orig_patent_app_number] => 09951718 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/951718
Deep-UV anti-reflective resist compositions Sep 12, 2001 Issued
Array ( [id] => 1247862 [patent_doc_number] => 06673514 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-01-06 [patent_title] => 'Imagable articles and compositions, and their use' [patent_app_type] => B2 [patent_app_number] => 09/948182 [patent_app_country] => US [patent_app_date] => 2001-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7956 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/673/06673514.pdf [firstpage_image] =>[orig_patent_app_number] => 09948182 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/948182
Imagable articles and compositions, and their use Sep 6, 2001 Issued
Array ( [id] => 6095570 [patent_doc_number] => 20020051935 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-05-02 [patent_title] => 'Resist compositions and patterning process' [patent_app_type] => new [patent_app_number] => 09/947504 [patent_app_country] => US [patent_app_date] => 2001-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 10056 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0051/20020051935.pdf [firstpage_image] =>[orig_patent_app_number] => 09947504 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/947504
Resist compositions and patterning process Sep 6, 2001 Issued
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