
Thi D. Dang
Examiner (ID: 17638)
| Most Active Art Unit | 1763 |
| Art Unit(s) | 1104, 1754, 1303, 1763, 1304, 1109 |
| Total Applications | 1224 |
| Issued Applications | 1013 |
| Pending Applications | 43 |
| Abandoned Applications | 167 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4325500
[patent_doc_number] => 06329298
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-11
[patent_title] => 'Apparatus for treating samples'
[patent_app_type] => 1
[patent_app_number] => 8/986643
[patent_app_country] => US
[patent_app_date] => 1997-12-08
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[pdf_file] => patents/06/329/06329298.pdf
[firstpage_image] =>[orig_patent_app_number] => 986643
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/986643 | Apparatus for treating samples | Dec 7, 1997 | Issued |
Array
(
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[patent_doc_number] => 05975013
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[patent_kind] => NA
[patent_issue_date] => 1999-11-02
[patent_title] => 'Vacuum plasma processor having coil with small magnetic field in its center'
[patent_app_type] => 1
[patent_app_number] => 8/978868
[patent_app_country] => US
[patent_app_date] => 1997-11-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/975/05975013.pdf
[firstpage_image] =>[orig_patent_app_number] => 978868
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/978868 | Vacuum plasma processor having coil with small magnetic field in its center | Nov 27, 1997 | Issued |
Array
(
[id] => 4200768
[patent_doc_number] => 06027603
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-22
[patent_title] => 'Inductively coupled planar source for substantially uniform plasma flux'
[patent_app_type] => 1
[patent_app_number] => 8/980368
[patent_app_country] => US
[patent_app_date] => 1997-11-28
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[pdf_file] => patents/06/027/06027603.pdf
[firstpage_image] =>[orig_patent_app_number] => 980368
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/980368 | Inductively coupled planar source for substantially uniform plasma flux | Nov 27, 1997 | Issued |
Array
(
[id] => 3919045
[patent_doc_number] => 05914001
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[patent_kind] => NA
[patent_issue_date] => 1999-06-22
[patent_title] => 'In-situ etch of CVD chamber'
[patent_app_type] => 1
[patent_app_number] => 8/979734
[patent_app_country] => US
[patent_app_date] => 1997-11-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 12815
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[patent_words_short_claim] => 98
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[pdf_file] => patents/05/914/05914001.pdf
[firstpage_image] =>[orig_patent_app_number] => 979734
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/979734 | In-situ etch of CVD chamber | Nov 25, 1997 | Issued |
| 08/979015 | APPARATUS AND METHOD FOR IN-SITU ENDPOING DETECTION FOR CHEMICAL MECHANICAL POLISHING OPERATIONS | Nov 25, 1997 | Abandoned |
Array
(
[id] => 4006027
[patent_doc_number] => 05879575
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[patent_issue_date] => 1999-03-09
[patent_title] => 'Self-cleaning plasma processing reactor'
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[patent_app_number] => 8/976539
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[patent_app_date] => 1997-11-21
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[pdf_file] => patents/05/879/05879575.pdf
[firstpage_image] =>[orig_patent_app_number] => 976539
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/976539 | Self-cleaning plasma processing reactor | Nov 20, 1997 | Issued |
Array
(
[id] => 3999427
[patent_doc_number] => 05961776
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[patent_issue_date] => 1999-10-05
[patent_title] => 'Surface processing apparatus'
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[patent_app_date] => 1997-11-19
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[firstpage_image] =>[orig_patent_app_number] => 972945
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/972945 | Surface processing apparatus | Nov 18, 1997 | Issued |
Array
(
[id] => 3999414
[patent_doc_number] => 05961775
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[patent_issue_date] => 1999-10-05
[patent_title] => 'Apparatus for removing organic resist from semiconductor'
[patent_app_type] => 1
[patent_app_number] => 8/972435
[patent_app_country] => US
[patent_app_date] => 1997-11-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/05/961/05961775.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/972435 | Apparatus for removing organic resist from semiconductor | Nov 17, 1997 | Issued |
Array
(
[id] => 3987212
[patent_doc_number] => 05919336
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-06
[patent_title] => 'Apparatus for fabricating semiconductor device and method for fabricating semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/971569
[patent_app_country] => US
[patent_app_date] => 1997-11-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[pdf_file] => patents/05/919/05919336.pdf
[firstpage_image] =>[orig_patent_app_number] => 971569
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/971569 | Apparatus for fabricating semiconductor device and method for fabricating semiconductor device | Nov 16, 1997 | Issued |
Array
(
[id] => 4097413
[patent_doc_number] => 06051151
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-18
[patent_title] => 'Apparatus and method of producing a negative ion plasma'
[patent_app_type] => 1
[patent_app_number] => 8/968194
[patent_app_country] => US
[patent_app_date] => 1997-11-12
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 968194
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/968194 | Apparatus and method of producing a negative ion plasma | Nov 11, 1997 | Issued |
Array
(
[id] => 4132626
[patent_doc_number] => 06059922
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-09
[patent_title] => 'Plasma processing apparatus and a plasma processing method'
[patent_app_type] => 1
[patent_app_number] => 8/966243
[patent_app_country] => US
[patent_app_date] => 1997-11-07
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[pdf_file] => patents/06/059/06059922.pdf
[firstpage_image] =>[orig_patent_app_number] => 966243
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/966243 | Plasma processing apparatus and a plasma processing method | Nov 6, 1997 | Issued |
Array
(
[id] => 4057356
[patent_doc_number] => 06007674
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[patent_issue_date] => 1999-12-28
[patent_title] => 'Stabilizing apparatus for a dry etcher system'
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[firstpage_image] =>[orig_patent_app_number] => 965098
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/965098 | Stabilizing apparatus for a dry etcher system | Nov 5, 1997 | Issued |
Array
(
[id] => 4302799
[patent_doc_number] => 06251792
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[firstpage_image] =>[orig_patent_app_number] => 948560
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Array
(
[id] => 4145749
[patent_doc_number] => 06106659
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[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials'
[patent_app_type] => 1
[patent_app_number] => 8/947716
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Array
(
[id] => 3933553
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[patent_title] => 'Selective etching of nickle/iron alloys'
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[pdf_file] => patents/05/989/05989443.pdf
[firstpage_image] =>[orig_patent_app_number] => 943662
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/943662 | Selective etching of nickle/iron alloys | Oct 2, 1997 | Issued |
Array
(
[id] => 1559860
[patent_doc_number] => 06361644
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[patent_kind] => B1
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[patent_title] => 'Parallel-plate electrode reactor having an inductive antenna coupling power through a parallel plate electrode'
[patent_app_type] => B1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/936028 | Parallel-plate electrode reactor having an inductive antenna coupling power through a parallel plate electrode | Sep 22, 1997 | Issued |
Array
(
[id] => 3917678
[patent_doc_number] => 05876504
[patent_country] => US
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[patent_issue_date] => 1999-03-02
[patent_title] => 'Process for producing oxide thin films and chemical vapor deposition apparatus used therefor'
[patent_app_type] => 1
[patent_app_number] => 8/931672
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[patent_app_date] => 1997-09-17
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Array
(
[id] => 4102036
[patent_doc_number] => 06056848
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[patent_title] => 'Thin film electrostatic shield for inductive plasma processing'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/923110 | Substrate processing apparatus | Sep 3, 1997 | Issued |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/921715 | Plasma processing apparatus | Sep 1, 1997 | Issued |