| Application number | Title of the application | Filing Date | Status |
|---|
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[patent_issue_date] => 1999-04-20
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[patent_issue_date] => 1999-03-23
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[patent_app_number] => 8/762423
[patent_app_country] => US
[patent_app_date] => 1996-12-09
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Array
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[patent_kind] => NA
[patent_issue_date] => 2000-07-11
[patent_title] => 'Surface treatment apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/750397
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[patent_app_date] => 1996-12-06
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[patent_issue_date] => 2000-07-18
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Array
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Array
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Array
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[id] => 3935365
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[patent_issue_date] => 1999-12-07
[patent_title] => 'Process for setting a working rate distribution in an etching or plasma CVD apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/756022
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[patent_app_date] => 1996-11-26
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/756022 | Process for setting a working rate distribution in an etching or plasma CVD apparatus | Nov 25, 1996 | Issued |
| 08/754941 | APPATATUS AND METHOD FOR ETCHING PRINTING CIRCUIT BOARD | Nov 24, 1996 | Abandoned |
Array
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[id] => 3761399
[patent_doc_number] => 05849136
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[patent_kind] => NA
[patent_issue_date] => 1998-12-15
[patent_title] => 'High frequency semiconductor wafer processing apparatus and method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/754833 | High frequency semiconductor wafer processing apparatus and method | Nov 21, 1996 | Issued |
Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/740969 | Apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films | Nov 4, 1996 | Issued |
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Array
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Array
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Array
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[patent_app_type] => 1
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Array
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Array
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[patent_issue_date] => 2000-04-25
[patent_title] => 'Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density'
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| 08/740140 | METHOD FOR FORMING A FILM | Oct 21, 1996 | Abandoned |