
Thi D. Dang
Examiner (ID: 18990)
| Most Active Art Unit | 1763 |
| Art Unit(s) | 1304, 1109, 1763, 1754, 1104, 1303 |
| Total Applications | 1224 |
| Issued Applications | 1013 |
| Pending Applications | 43 |
| Abandoned Applications | 167 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1365268
[patent_doc_number] => 06562248
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-13
[patent_title] => 'Active control of phase shift mask etching process'
[patent_app_type] => B1
[patent_app_number] => 09/817518
[patent_app_country] => US
[patent_app_date] => 2001-03-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 22
[patent_no_of_words] => 8716
[patent_no_of_claims] => 8
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[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/562/06562248.pdf
[firstpage_image] =>[orig_patent_app_number] => 09817518
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/817518 | Active control of phase shift mask etching process | Mar 25, 2001 | Issued |
Array
(
[id] => 1541132
[patent_doc_number] => 06372084
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-16
[patent_title] => 'Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate'
[patent_app_type] => B1
[patent_app_number] => 09/815304
[patent_app_country] => US
[patent_app_date] => 2001-03-23
[patent_effective_date] => 0000-00-00
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[patent_words_short_claim] => 117
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[pdf_file] => patents/06/372/06372084.pdf
[firstpage_image] =>[orig_patent_app_number] => 09815304
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/815304 | Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate | Mar 22, 2001 | Issued |
Array
(
[id] => 1492827
[patent_doc_number] => 06402885
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-06-11
[patent_title] => 'Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma'
[patent_app_type] => B2
[patent_app_number] => 09/773409
[patent_app_country] => US
[patent_app_date] => 2001-01-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[firstpage_image] =>[orig_patent_app_number] => 09773409
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/773409 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Jan 30, 2001 | Issued |
Array
(
[id] => 1570262
[patent_doc_number] => 06467426
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-22
[patent_title] => 'Photomask correction device'
[patent_app_type] => B1
[patent_app_number] => 09/701605
[patent_app_country] => US
[patent_app_date] => 2001-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 2970
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[pdf_file] => patents/06/467/06467426.pdf
[firstpage_image] =>[orig_patent_app_number] => 09701605
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/701605 | Photomask correction device | Jan 29, 2001 | Issued |
Array
(
[id] => 1374426
[patent_doc_number] => 06551442
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-22
[patent_title] => 'Method of producing semiconductor device and system for producing the same'
[patent_app_type] => B2
[patent_app_number] => 09/767132
[patent_app_country] => US
[patent_app_date] => 2001-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/06/551/06551442.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/767132 | Method of producing semiconductor device and system for producing the same | Jan 22, 2001 | Issued |
Array
(
[id] => 6907488
[patent_doc_number] => 20010010255
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-02
[patent_title] => 'Dry etching endpoint detection system'
[patent_app_type] => new
[patent_app_number] => 09/754768
[patent_app_country] => US
[patent_app_date] => 2001-01-04
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0010/20010010255.pdf
[firstpage_image] =>[orig_patent_app_number] => 09754768
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/754768 | Dry etching endpoint detection system | Jan 3, 2001 | Issued |
Array
(
[id] => 6204753
[patent_doc_number] => 20020069828
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-13
[patent_title] => 'Chemical plasma cathode'
[patent_app_type] => new
[patent_app_number] => 09/732064
[patent_app_country] => US
[patent_app_date] => 2000-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3254
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[pdf_file] => publications/A1/0069/20020069828.pdf
[firstpage_image] =>[orig_patent_app_number] => 09732064
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/732064 | Chemical plasma cathode | Dec 6, 2000 | Issued |
Array
(
[id] => 1383063
[patent_doc_number] => 06526910
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-03-04
[patent_title] => 'Apparatus and method for forming a deposited film by means of plasma CVD'
[patent_app_type] => B2
[patent_app_number] => 09/727440
[patent_app_country] => US
[patent_app_date] => 2000-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => patents/06/526/06526910.pdf
[firstpage_image] =>[orig_patent_app_number] => 09727440
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/727440 | Apparatus and method for forming a deposited film by means of plasma CVD | Dec 3, 2000 | Issued |
Array
(
[id] => 1476133
[patent_doc_number] => 06451118
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-17
[patent_title] => 'Cluster tool architecture for sulfur trioxide processing'
[patent_app_type] => B1
[patent_app_number] => 09/713131
[patent_app_country] => US
[patent_app_date] => 2000-11-14
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[firstpage_image] =>[orig_patent_app_number] => 09713131
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/713131 | Cluster tool architecture for sulfur trioxide processing | Nov 13, 2000 | Issued |
Array
(
[id] => 1403418
[patent_doc_number] => 06524431
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-25
[patent_title] => 'Apparatus for automatically cleaning mask'
[patent_app_type] => B1
[patent_app_number] => 09/710710
[patent_app_country] => US
[patent_app_date] => 2000-11-10
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/524/06524431.pdf
[firstpage_image] =>[orig_patent_app_number] => 09710710
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/710710 | Apparatus for automatically cleaning mask | Nov 9, 2000 | Issued |
Array
(
[id] => 1374506
[patent_doc_number] => 06551447
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-22
[patent_title] => 'Inductive plasma reactor'
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[patent_app_number] => 09/707368
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[pdf_file] => patents/06/551/06551447.pdf
[firstpage_image] =>[orig_patent_app_number] => 09707368
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/707368 | Inductive plasma reactor | Nov 5, 2000 | Issued |
Array
(
[id] => 1404527
[patent_doc_number] => 06524490
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[patent_kind] => B1
[patent_issue_date] => 2003-02-25
[patent_title] => 'Method for electroless copper deposition using a hypophosphite reducing agent'
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[patent_app_number] => 09/704821
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/704821 | Method for electroless copper deposition using a hypophosphite reducing agent | Nov 2, 2000 | Issued |
Array
(
[id] => 1364387
[patent_doc_number] => 06562190
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[patent_issue_date] => 2003-05-13
[patent_title] => 'System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber'
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Array
(
[id] => 1348139
[patent_doc_number] => 06564743
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[patent_title] => 'Method for forming oxide film of semiconductor device, and oxide film forming apparatus capable of shortening pre-processing time for concentration measurement'
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[patent_app_number] => 09/675235
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Array
(
[id] => 1403401
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Array
(
[id] => 1374474
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[patent_title] => 'Plasma processing system and method for manufacturing a semiconductor device by using the same'
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Array
(
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[patent_title] => 'Plasma processing method'
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Array
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Array
(
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Array
(
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[patent_title] => 'RF plasma reactor with hybrid conductor and multi-radius dome ceiling'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/658572 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Sep 7, 2000 | Issued |