
Thi D. Dang
Examiner (ID: 8358)
| Most Active Art Unit | 1763 |
| Art Unit(s) | 1304, 1109, 1754, 1303, 1104, 1763 |
| Total Applications | 1224 |
| Issued Applications | 1013 |
| Pending Applications | 43 |
| Abandoned Applications | 167 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1441107
[patent_doc_number] => 06335293
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-01
[patent_title] => 'Systems and methods for two-sided etch of a semiconductor substrate'
[patent_app_type] => B1
[patent_app_number] => 09/351259
[patent_app_country] => US
[patent_app_date] => 1999-07-12
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/335/06335293.pdf
[firstpage_image] =>[orig_patent_app_number] => 09351259
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/351259 | Systems and methods for two-sided etch of a semiconductor substrate | Jul 11, 1999 | Issued |
Array
(
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[patent_doc_number] => 20010009177
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[patent_kind] => A1
[patent_issue_date] => 2001-07-26
[patent_title] => 'SYSTEMS AND METHODS FOR TWO-SIDED ETCH OF A SEMICONDUCTOR SUBSTRATE'
[patent_app_type] => new
[patent_app_number] => 09/351257
[patent_app_country] => US
[patent_app_date] => 1999-07-12
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[pdf_file] => publications/A1/0009/20010009177.pdf
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Array
(
[id] => 4360383
[patent_doc_number] => 06274058
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-14
[patent_title] => 'Remote plasma cleaning method for processing chambers'
[patent_app_type] => 1
[patent_app_number] => 9/347236
[patent_app_country] => US
[patent_app_date] => 1999-07-02
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 347236
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/347236 | Remote plasma cleaning method for processing chambers | Jul 1, 1999 | Issued |
Array
(
[id] => 4320307
[patent_doc_number] => 06319355
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Plasma processor with coil responsive to variable amplitude rf envelope'
[patent_app_type] => 1
[patent_app_number] => 9/343246
[patent_app_country] => US
[patent_app_date] => 1999-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[firstpage_image] =>[orig_patent_app_number] => 343246
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/343246 | Plasma processor with coil responsive to variable amplitude rf envelope | Jun 29, 1999 | Issued |
Array
(
[id] => 1476679
[patent_doc_number] => 06344105
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-02-05
[patent_title] => 'Techniques for improving etch rate uniformity'
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[patent_app_number] => 09/345639
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[firstpage_image] =>[orig_patent_app_number] => 09345639
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/345639 | Techniques for improving etch rate uniformity | Jun 29, 1999 | Issued |
Array
(
[id] => 4238943
[patent_doc_number] => 06221203
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[patent_kind] => NA
[patent_issue_date] => 2001-04-24
[patent_title] => 'Apparatus and method for controlling temperature of a chamber'
[patent_app_type] => 1
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[pdf_file] => patents/06/221/06221203.pdf
[firstpage_image] =>[orig_patent_app_number] => 323344
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/323344 | Apparatus and method for controlling temperature of a chamber | May 31, 1999 | Issued |
Array
(
[id] => 4402239
[patent_doc_number] => 06299723
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[patent_issue_date] => 2001-10-09
[patent_title] => 'Anti-airlock apparatus for filters'
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[patent_app_number] => 9/321659
[patent_app_country] => US
[patent_app_date] => 1999-05-28
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/321659 | Anti-airlock apparatus for filters | May 27, 1999 | Issued |
Array
(
[id] => 4286042
[patent_doc_number] => 06197150
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-03-06
[patent_title] => 'Apparatus for wafer treatment for the manufacture of semiconductor devices'
[patent_app_type] => 1
[patent_app_number] => 9/320139
[patent_app_country] => US
[patent_app_date] => 1999-05-26
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[firstpage_image] =>[orig_patent_app_number] => 320139
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/320139 | Apparatus for wafer treatment for the manufacture of semiconductor devices | May 25, 1999 | Issued |
Array
(
[id] => 1505543
[patent_doc_number] => 06440261
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Dual buffer chamber cluster tool for semiconductor wafer processing'
[patent_app_type] => B1
[patent_app_number] => 09/318233
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/318233 | Dual buffer chamber cluster tool for semiconductor wafer processing | May 24, 1999 | Issued |
Array
(
[id] => 4284273
[patent_doc_number] => 06179955
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-30
[patent_title] => 'Dry etching apparatus for manufacturing semiconductor devices'
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[patent_app_number] => 9/317138
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[firstpage_image] =>[orig_patent_app_number] => 317138
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/317138 | Dry etching apparatus for manufacturing semiconductor devices | May 23, 1999 | Issued |
Array
(
[id] => 4358892
[patent_doc_number] => 06273956
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[patent_kind] => NA
[patent_issue_date] => 2001-08-14
[patent_title] => 'Synchronous multiplexed near zero overhead architecture for vacuum processes'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/314193 | Synchronous multiplexed near zero overhead architecture for vacuum processes | May 18, 1999 | Issued |
Array
(
[id] => 4282930
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Array
(
[id] => 4219268
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[patent_title] => 'IC mechanical planarization process incorporating two slurry compositions for faster material removal times'
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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Array
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Array
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