
Timothy Howard Meeks
Examiner (ID: 9287)
| Most Active Art Unit | 1762 |
| Art Unit(s) | 1715, 1106, 1112, 1761, 1762, 1754 |
| Total Applications | 940 |
| Issued Applications | 680 |
| Pending Applications | 97 |
| Abandoned Applications | 163 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6735241
[patent_doc_number] => 20030012876
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-16
[patent_title] => 'Atomic layer deposition method using a novel group IV metal precursor'
[patent_app_type] => new
[patent_app_number] => 09/985690
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[pdf_file] => publications/A1/0012/20030012876.pdf
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Array
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[patent_issue_date] => 2003-11-18
[patent_title] => 'Method for forming thin-film layer for device and organic electroluminescence device'
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[patent_app_number] => 09/959655
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Array
(
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[patent_issue_date] => 2002-04-25
[patent_title] => 'Physical vapor deposition methods'
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Array
(
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[patent_doc_number] => 06531192
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[patent_issue_date] => 2003-03-11
[patent_title] => 'Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound'
[patent_app_type] => B2
[patent_app_number] => 10/032655
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Array
(
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[patent_title] => 'Beam shaped film pattern formation method'
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Array
(
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[patent_title] => 'Method of controlling the initial growth of CVD copper films by surface treatment of barrier metals films'
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Array
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[patent_title] => 'Sequential chemical vapor deposition'
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Array
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[patent_issue_date] => 2003-03-27
[patent_title] => 'Method of depositing an optical quality silica film by PECVD'
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Array
(
[id] => 1264629
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[patent_title] => 'Plasma processes for depositing low dielectric constant films'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/957551 | Plasma processes for depositing low dielectric constant films | Sep 18, 2001 | Issued |
Array
(
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[patent_title] => 'Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition'
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Array
(
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Array
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Array
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Array
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Array
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Array
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Array
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Array
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