
Wayne A. Lambert
Examiner (ID: 15419, Phone: (571)270-3516 , Office: P/3745 )
| Most Active Art Unit | 3745 |
| Art Unit(s) | 3745 |
| Total Applications | 610 |
| Issued Applications | 362 |
| Pending Applications | 54 |
| Abandoned Applications | 202 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5868045
[patent_doc_number] => 20060162662
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-07-27
[patent_title] => 'Vacuum vapor deposition apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/334409
[patent_app_country] => US
[patent_app_date] => 2006-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 13067
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0162/20060162662.pdf
[firstpage_image] =>[orig_patent_app_number] => 11334409
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/334409 | Vacuum vapor deposition apparatus | Jan 18, 2006 | Abandoned |
| 11/324123 | Method and apparatus to control the formation of layers useful in integrated circuits | Dec 29, 2005 | Abandoned |
Array
(
[id] => 5776937
[patent_doc_number] => 20060105577
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-18
[patent_title] => 'Aspect ratio controlled etch selectivity using time modulated DC bias voltage'
[patent_app_type] => utility
[patent_app_number] => 11/319402
[patent_app_country] => US
[patent_app_date] => 2005-12-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 4581
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0105/20060105577.pdf
[firstpage_image] =>[orig_patent_app_number] => 11319402
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/319402 | Aspect ratio controlled etch selectivity using time modulated DC bias voltage | Dec 28, 2005 | Abandoned |
Array
(
[id] => 5645141
[patent_doc_number] => 20060130873
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-22
[patent_title] => 'Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method'
[patent_app_type] => utility
[patent_app_number] => 11/318122
[patent_app_country] => US
[patent_app_date] => 2005-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 7261
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0130/20060130873.pdf
[firstpage_image] =>[orig_patent_app_number] => 11318122
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/318122 | Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method | Dec 22, 2005 | Abandoned |
Array
(
[id] => 4965006
[patent_doc_number] => 20080107826
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-05-08
[patent_title] => 'Method and apparatus for fabricating nanostructure multi-element compound'
[patent_app_type] => utility
[patent_app_number] => 11/299930
[patent_app_country] => US
[patent_app_date] => 2005-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2898
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0107/20080107826.pdf
[firstpage_image] =>[orig_patent_app_number] => 11299930
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/299930 | Method and apparatus for fabricating nanostructure multi-element compound | Dec 11, 2005 | Abandoned |
Array
(
[id] => 4785664
[patent_doc_number] => 20080138993
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-06-12
[patent_title] => 'Plasma Processing Apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/794306
[patent_app_country] => US
[patent_app_date] => 2005-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 7252
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0138/20080138993.pdf
[firstpage_image] =>[orig_patent_app_number] => 11794306
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/794306 | Plasma Processing Apparatus | Dec 5, 2005 | Abandoned |
Array
(
[id] => 5720844
[patent_doc_number] => 20060073619
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-04-06
[patent_title] => 'Semiconductor fabricating apparatus and method and apparatus for determining state of semiconductor fabricating process'
[patent_app_type] => utility
[patent_app_number] => 11/293213
[patent_app_country] => US
[patent_app_date] => 2005-12-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 8625
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0073/20060073619.pdf
[firstpage_image] =>[orig_patent_app_number] => 11293213
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/293213 | Semiconductor fabricating apparatus and method and apparatus for determining state of semiconductor fabricating process | Dec 4, 2005 | Abandoned |
Array
(
[id] => 5907002
[patent_doc_number] => 20060124055
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-15
[patent_title] => 'Mask-retaining device'
[patent_app_type] => utility
[patent_app_number] => 11/286170
[patent_app_country] => US
[patent_app_date] => 2005-11-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2165
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0124/20060124055.pdf
[firstpage_image] =>[orig_patent_app_number] => 11286170
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/286170 | Mask-retaining device | Nov 22, 2005 | Abandoned |
Array
(
[id] => 5669483
[patent_doc_number] => 20060174836
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-08-10
[patent_title] => 'Apparatus for heating wafer'
[patent_app_type] => utility
[patent_app_number] => 11/267406
[patent_app_country] => US
[patent_app_date] => 2005-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3700
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0174/20060174836.pdf
[firstpage_image] =>[orig_patent_app_number] => 11267406
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/267406 | Apparatus for heating wafer | Nov 6, 2005 | Abandoned |
Array
(
[id] => 5862412
[patent_doc_number] => 20060096542
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-11
[patent_title] => 'Heating crucible and deposition apparatus including the same'
[patent_app_type] => utility
[patent_app_number] => 11/266397
[patent_app_country] => US
[patent_app_date] => 2005-11-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 2944
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0096/20060096542.pdf
[firstpage_image] =>[orig_patent_app_number] => 11266397
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/266397 | Heating crucible and deposition apparatus including the same | Nov 3, 2005 | Issued |
Array
(
[id] => 5710621
[patent_doc_number] => 20060051966
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-09
[patent_title] => 'In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber'
[patent_app_type] => utility
[patent_app_number] => 11/266167
[patent_app_country] => US
[patent_app_date] => 2005-11-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 13165
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0051/20060051966.pdf
[firstpage_image] =>[orig_patent_app_number] => 11266167
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/266167 | In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber | Nov 2, 2005 | Abandoned |
Array
(
[id] => 5804502
[patent_doc_number] => 20060090854
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-04
[patent_title] => 'RF supply system and plasma processing apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/262747
[patent_app_country] => US
[patent_app_date] => 2005-11-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 4530
[patent_no_of_claims] => 17
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0090/20060090854.pdf
[firstpage_image] =>[orig_patent_app_number] => 11262747
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/262747 | RF supply system and plasma processing apparatus | Oct 31, 2005 | Issued |
Array
(
[id] => 5608175
[patent_doc_number] => 20060269691
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-11-30
[patent_title] => 'Plasma treatment apparatus and plasma treatment method'
[patent_app_type] => utility
[patent_app_number] => 11/259050
[patent_app_country] => US
[patent_app_date] => 2005-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0269/20060269691.pdf
[firstpage_image] =>[orig_patent_app_number] => 11259050
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/259050 | Plasma treatment apparatus and plasma treatment method | Oct 26, 2005 | Abandoned |
Array
(
[id] => 5710605
[patent_doc_number] => 20060051950
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-09
[patent_title] => 'Apparatus and a method for forming an alloy layer over a substrate'
[patent_app_type] => utility
[patent_app_number] => 11/259961
[patent_app_country] => US
[patent_app_date] => 2005-10-26
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[pdf_file] => publications/A1/0051/20060051950.pdf
[firstpage_image] =>[orig_patent_app_number] => 11259961
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/259961 | Apparatus and a method for forming an alloy layer over a substrate | Oct 25, 2005 | Abandoned |
Array
(
[id] => 5590963
[patent_doc_number] => 20060040415
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-23
[patent_title] => 'Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring'
[patent_app_type] => utility
[patent_app_number] => 11/258658
[patent_app_country] => US
[patent_app_date] => 2005-10-25
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0040/20060040415.pdf
[firstpage_image] =>[orig_patent_app_number] => 11258658
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/258658 | Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring | Oct 24, 2005 | Abandoned |
Array
(
[id] => 5712609
[patent_doc_number] => 20060075972
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-04-13
[patent_title] => 'Substrate processing apparatus and substrate processing method'
[patent_app_type] => utility
[patent_app_number] => 11/258670
[patent_app_country] => US
[patent_app_date] => 2005-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
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[patent_no_of_words] => 13777
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[pdf_file] => publications/A1/0075/20060075972.pdf
[firstpage_image] =>[orig_patent_app_number] => 11258670
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/258670 | Substrate processing apparatus and substrate processing method | Oct 24, 2005 | Abandoned |
Array
(
[id] => 5645033
[patent_doc_number] => 20060130765
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-22
[patent_title] => 'Arrangement for coating a substrate'
[patent_app_type] => utility
[patent_app_number] => 11/254425
[patent_app_country] => US
[patent_app_date] => 2005-10-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0130/20060130765.pdf
[firstpage_image] =>[orig_patent_app_number] => 11254425
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/254425 | Arrangement for coating a substrate | Oct 19, 2005 | Issued |
Array
(
[id] => 5796171
[patent_doc_number] => 20060032848
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-16
[patent_title] => 'Process and system for heating semiconductor substrates in a processing chamber containing a susceptor'
[patent_app_type] => utility
[patent_app_number] => 11/253271
[patent_app_country] => US
[patent_app_date] => 2005-10-18
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0032/20060032848.pdf
[firstpage_image] =>[orig_patent_app_number] => 11253271
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/253271 | Process and system for heating semiconductor substrates in a processing chamber containing a susceptor | Oct 17, 2005 | Abandoned |
Array
(
[id] => 4917056
[patent_doc_number] => 20080097657
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-24
[patent_title] => 'Method and System for Wafer Temperature Control'
[patent_app_type] => utility
[patent_app_number] => 11/664550
[patent_app_country] => US
[patent_app_date] => 2005-10-13
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0097/20080097657.pdf
[firstpage_image] =>[orig_patent_app_number] => 11664550
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/664550 | Method and System for Wafer Temperature Control | Oct 12, 2005 | Abandoned |
Array
(
[id] => 5877037
[patent_doc_number] => 20060027325
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-09
[patent_title] => 'Method and apparatus for photomask fabrication'
[patent_app_type] => utility
[patent_app_number] => 11/243548
[patent_app_country] => US
[patent_app_date] => 2005-10-04
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0027/20060027325.pdf
[firstpage_image] =>[orig_patent_app_number] => 11243548
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/243548 | Method and apparatus for photomask fabrication | Oct 3, 2005 | Abandoned |