
William A. Powell
Examiner (ID: 12339)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1307, 1109, 1301, 1304, 1303, 1765, 1106, 1104, 1763, 1502, 3202 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1581269
[patent_doc_number] => 06423644
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-23
[patent_title] => 'Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures'
[patent_app_type] => B1
[patent_app_number] => 09/614396
[patent_app_country] => US
[patent_app_date] => 2000-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 5926
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/423/06423644.pdf
[firstpage_image] =>[orig_patent_app_number] => 09614396
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/614396 | Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures | Jul 11, 2000 | Issued |
Array
(
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[patent_doc_number] => 06468913
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-22
[patent_title] => 'Ready-to-use stable chemical-mechanical polishing slurries'
[patent_app_type] => B1
[patent_app_number] => 09/611702
[patent_app_country] => US
[patent_app_date] => 2000-07-08
[patent_effective_date] => 0000-00-00
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Array
(
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[patent_doc_number] => 06436834
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Chemical-mechanical abrasive composition and method'
[patent_app_type] => B1
[patent_app_number] => 09/611831
[patent_app_country] => US
[patent_app_date] => 2000-07-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 3716
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[firstpage_image] =>[orig_patent_app_number] => 09611831
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/611831 | Chemical-mechanical abrasive composition and method | Jul 6, 2000 | Issued |
Array
(
[id] => 1594688
[patent_doc_number] => 06383941
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-07
[patent_title] => 'Method of etching organic ARCs in patterns having variable spacings'
[patent_app_type] => B1
[patent_app_number] => 09/611085
[patent_app_country] => US
[patent_app_date] => 2000-07-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 6023
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[firstpage_image] =>[orig_patent_app_number] => 09611085
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/611085 | Method of etching organic ARCs in patterns having variable spacings | Jul 5, 2000 | Issued |
Array
(
[id] => 1507519
[patent_doc_number] => 06440864
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Substrate cleaning process'
[patent_app_type] => B1
[patent_app_number] => 09/607822
[patent_app_country] => US
[patent_app_date] => 2000-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[firstpage_image] =>[orig_patent_app_number] => 09607822
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/607822 | Substrate cleaning process | Jun 29, 2000 | Issued |
Array
(
[id] => 1469920
[patent_doc_number] => 06407001
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[patent_kind] => B1
[patent_issue_date] => 2002-06-18
[patent_title] => 'Focused ion beam etching of copper'
[patent_app_type] => B1
[patent_app_number] => 09/608116
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[pdf_file] => patents/06/407/06407001.pdf
[firstpage_image] =>[orig_patent_app_number] => 09608116
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/608116 | Focused ion beam etching of copper | Jun 29, 2000 | Issued |
Array
(
[id] => 4327614
[patent_doc_number] => 06319837
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Technique for reducing dishing in Cu-based interconnects'
[patent_app_type] => 1
[patent_app_number] => 9/606833
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[patent_app_date] => 2000-06-29
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/319/06319837.pdf
[firstpage_image] =>[orig_patent_app_number] => 606833
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/606833 | Technique for reducing dishing in Cu-based interconnects | Jun 28, 2000 | Issued |
Array
(
[id] => 1446677
[patent_doc_number] => 06368977
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[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Semiconductor device manufacturing method'
[patent_app_type] => B1
[patent_app_number] => 09/605436
[patent_app_country] => US
[patent_app_date] => 2000-06-29
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[pdf_file] => patents/06/368/06368977.pdf
[firstpage_image] =>[orig_patent_app_number] => 09605436
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/605436 | Semiconductor device manufacturing method | Jun 28, 2000 | Issued |
Array
(
[id] => 1446682
[patent_doc_number] => 06368979
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Process for forming trenches and vias in layers of low dielectric constant carbon-doped silicon oxide dielectric material of an integrated circuit structure'
[patent_app_type] => B1
[patent_app_number] => 09/607511
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/607511 | Process for forming trenches and vias in layers of low dielectric constant carbon-doped silicon oxide dielectric material of an integrated circuit structure | Jun 27, 2000 | Issued |
Array
(
[id] => 1462671
[patent_doc_number] => 06350700
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[patent_title] => 'Process for forming trenches and vias in layers of low dielectric constant carbon-doped silicon oxide dielectric material of an integrated circuit structure'
[patent_app_type] => B1
[patent_app_number] => 09/607512
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Array
(
[id] => 4381855
[patent_doc_number] => 06277750
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-21
[patent_title] => 'Composition for bottom reflection preventive film and novel polymeric dye for use in the same'
[patent_app_type] => 1
[patent_app_number] => 9/508624
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/508624 | Composition for bottom reflection preventive film and novel polymeric dye for use in the same | Jun 26, 2000 | Issued |
Array
(
[id] => 4325554
[patent_doc_number] => 06329302
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[patent_issue_date] => 2001-12-11
[patent_title] => 'Removal of a top IC die from a bottom IC die of a multichip IC package with preservation of interconnect'
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[patent_app_number] => 9/603274
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Array
(
[id] => 1507536
[patent_doc_number] => 06440869
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Method of forming the capacitor with HSG in DRAM'
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[patent_app_number] => 09/604010
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[firstpage_image] =>[orig_patent_app_number] => 09604010
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/604010 | Method of forming the capacitor with HSG in DRAM | Jun 25, 2000 | Issued |
Array
(
[id] => 1561243
[patent_doc_number] => 06362105
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[patent_kind] => B1
[patent_issue_date] => 2002-03-26
[patent_title] => 'Method and apparatus for endpointing planarization of a microelectronic substrate'
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[patent_app_number] => 09/602612
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/602612 | Method and apparatus for endpointing planarization of a microelectronic substrate | Jun 21, 2000 | Issued |
Array
(
[id] => 1542781
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[patent_title] => 'Method for forming multi-level metal interconnection'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/599172 | Method for forming multi-level metal interconnection | Jun 21, 2000 | Issued |
Array
(
[id] => 4267741
[patent_doc_number] => 06306775
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[patent_kind] => NA
[patent_issue_date] => 2001-10-23
[patent_title] => 'Methods of selectively etching polysilicon relative to at least one of deposited oxide, thermally grown oxide and nitride, and methods of selectively etching polysilicon relative to BPSG'
[patent_app_type] => 1
[patent_app_number] => 9/599143
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/599143 | Methods of selectively etching polysilicon relative to at least one of deposited oxide, thermally grown oxide and nitride, and methods of selectively etching polysilicon relative to BPSG | Jun 20, 2000 | Issued |
Array
(
[id] => 4358287
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[patent_title] => 'Etching process using a buffer layer'
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Array
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Array
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Array
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[patent_title] => 'Plasma reactor with heated source of a polymer-hardening precursor material'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/595750 | Plasma reactor with heated source of a polymer-hardening precursor material | Jun 15, 2000 | Issued |