Search

William A. Powell

Examiner (ID: 12339)

Most Active Art Unit
1765
Art Unit(s)
1307, 1109, 1301, 1304, 1303, 1765, 1106, 1104, 1763, 1502, 3202
Total Applications
3597
Issued Applications
3357
Pending Applications
97
Abandoned Applications
143

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1550565 [patent_doc_number] => 06399512 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Method of making metallization and contact structures in an integrated circuit comprising an etch stop layer' [patent_app_type] => B1 [patent_app_number] => 09/593968 [patent_app_country] => US [patent_app_date] => 2000-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 10 [patent_no_of_words] => 6821 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399512.pdf [firstpage_image] =>[orig_patent_app_number] => 09593968 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/593968
Method of making metallization and contact structures in an integrated circuit comprising an etch stop layer Jun 14, 2000 Issued
Array ( [id] => 4226970 [patent_doc_number] => 06165314 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-26 [patent_title] => 'Apparatus for performing jet vapor reduction of the thickness of process layers' [patent_app_type] => 1 [patent_app_number] => 9/588910 [patent_app_country] => US [patent_app_date] => 2000-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 4483 [patent_no_of_claims] => 65 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/165/06165314.pdf [firstpage_image] =>[orig_patent_app_number] => 588910 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/588910
Apparatus for performing jet vapor reduction of the thickness of process layers Jun 6, 2000 Issued
Array ( [id] => 1566147 [patent_doc_number] => 06376389 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Method for eliminating anti-reflective coating in semiconductors' [patent_app_type] => B1 [patent_app_number] => 09/588117 [patent_app_country] => US [patent_app_date] => 2000-05-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 25 [patent_no_of_words] => 4792 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 140 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376389.pdf [firstpage_image] =>[orig_patent_app_number] => 09588117 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/588117
Method for eliminating anti-reflective coating in semiconductors May 30, 2000 Issued
Array ( [id] => 1458904 [patent_doc_number] => 06426295 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-30 [patent_title] => 'Reduction of surface roughness during chemical mechanical planarization(CMP)' [patent_app_type] => B1 [patent_app_number] => 09/584468 [patent_app_country] => US [patent_app_date] => 2000-05-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 4119 [patent_no_of_claims] => 63 [patent_no_of_ind_claims] => 19 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/426/06426295.pdf [firstpage_image] =>[orig_patent_app_number] => 09584468 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/584468
Reduction of surface roughness during chemical mechanical planarization(CMP) May 30, 2000 Issued
Array ( [id] => 1462668 [patent_doc_number] => 06350699 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-26 [patent_title] => 'Method for anisotropic plasma etching using non-chlorofluorocarbon, fluorine-based chemistry' [patent_app_type] => B1 [patent_app_number] => 09/584407 [patent_app_country] => US [patent_app_date] => 2000-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 3457 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/350/06350699.pdf [firstpage_image] =>[orig_patent_app_number] => 09584407 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/584407
Method for anisotropic plasma etching using non-chlorofluorocarbon, fluorine-based chemistry May 29, 2000 Issued
Array ( [id] => 4323145 [patent_doc_number] => 06312614 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Method for production of interposer for mounting semiconductor element' [patent_app_type] => 1 [patent_app_number] => 9/577883 [patent_app_country] => US [patent_app_date] => 2000-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 19 [patent_no_of_words] => 2662 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/312/06312614.pdf [firstpage_image] =>[orig_patent_app_number] => 577883 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/577883
Method for production of interposer for mounting semiconductor element May 24, 2000 Issued
Array ( [id] => 1559908 [patent_doc_number] => 06436832 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-20 [patent_title] => 'Method to reduce polish initiation time in a polish process' [patent_app_type] => B1 [patent_app_number] => 09/578157 [patent_app_country] => US [patent_app_date] => 2000-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 3648 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/436/06436832.pdf [firstpage_image] =>[orig_patent_app_number] => 09578157 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/578157
Method to reduce polish initiation time in a polish process May 22, 2000 Issued
Array ( [id] => 4381833 [patent_doc_number] => 06294472 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-25 [patent_title] => 'Dual slurry particle sizes for reducing microscratching of wafers' [patent_app_type] => 1 [patent_app_number] => 9/576750 [patent_app_country] => US [patent_app_date] => 2000-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 10 [patent_no_of_words] => 5777 [patent_no_of_claims] => 59 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/294/06294472.pdf [firstpage_image] =>[orig_patent_app_number] => 576750 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/576750
Dual slurry particle sizes for reducing microscratching of wafers May 22, 2000 Issued
Array ( [id] => 4250740 [patent_doc_number] => 06207572 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-03-27 [patent_title] => 'Reverse linear chemical mechanical polisher with loadable housing' [patent_app_type] => 1 [patent_app_number] => 9/576064 [patent_app_country] => US [patent_app_date] => 2000-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 8 [patent_no_of_words] => 3910 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/207/06207572.pdf [firstpage_image] =>[orig_patent_app_number] => 576064 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/576064
Reverse linear chemical mechanical polisher with loadable housing May 21, 2000 Issued
Array ( [id] => 1585662 [patent_doc_number] => 06358852 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-19 [patent_title] => 'Decapsulation techniques for multi-chip (MCP) devices' [patent_app_type] => B1 [patent_app_number] => 09/574580 [patent_app_country] => US [patent_app_date] => 2000-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 1548 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/358/06358852.pdf [firstpage_image] =>[orig_patent_app_number] => 09574580 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/574580
Decapsulation techniques for multi-chip (MCP) devices May 16, 2000 Issued
Array ( [id] => 1441093 [patent_doc_number] => 06335286 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-01 [patent_title] => 'Feedback control of polish buff time as a function of scratch count' [patent_app_type] => B1 [patent_app_number] => 09/568867 [patent_app_country] => US [patent_app_date] => 2000-05-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 6850 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/335/06335286.pdf [firstpage_image] =>[orig_patent_app_number] => 09568867 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/568867
Feedback control of polish buff time as a function of scratch count May 8, 2000 Issued
Array ( [id] => 4380492 [patent_doc_number] => 06277657 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Apparatus for fabricating semiconductor device and fabrication method therefor' [patent_app_type] => 1 [patent_app_number] => 9/530926 [patent_app_country] => US [patent_app_date] => 2000-05-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 21 [patent_no_of_words] => 15481 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277657.pdf [firstpage_image] =>[orig_patent_app_number] => 530926 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/530926
Apparatus for fabricating semiconductor device and fabrication method therefor May 7, 2000 Issued
Array ( [id] => 4408736 [patent_doc_number] => 06309980 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-30 [patent_title] => 'Semiconductor integrated circuit arrangement fabrication method' [patent_app_type] => 1 [patent_app_number] => 9/564754 [patent_app_country] => US [patent_app_date] => 2000-05-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 23 [patent_no_of_words] => 8149 [patent_no_of_claims] => 61 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/309/06309980.pdf [firstpage_image] =>[orig_patent_app_number] => 564754 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/564754
Semiconductor integrated circuit arrangement fabrication method May 3, 2000 Issued
Array ( [id] => 1043349 [patent_doc_number] => 06866791 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-15 [patent_title] => 'Method of forming patterned nickel and doped nickel films via microcontact printing and uses thereof' [patent_app_type] => utility [patent_app_number] => 09/562681 [patent_app_country] => US [patent_app_date] => 2000-05-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 2845 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 155 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/866/06866791.pdf [firstpage_image] =>[orig_patent_app_number] => 09562681 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/562681
Method of forming patterned nickel and doped nickel films via microcontact printing and uses thereof May 1, 2000 Issued
Array ( [id] => 4329672 [patent_doc_number] => 06313041 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Method of enhancing the rate of removal of a layer of light-sensitive material after an etching step in the fabrication of semiconductor electronic devices' [patent_app_type] => 1 [patent_app_number] => 9/561392 [patent_app_country] => US [patent_app_date] => 2000-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1873 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/313/06313041.pdf [firstpage_image] =>[orig_patent_app_number] => 561392 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/561392
Method of enhancing the rate of removal of a layer of light-sensitive material after an etching step in the fabrication of semiconductor electronic devices Apr 27, 2000 Issued
Array ( [id] => 4408095 [patent_doc_number] => 06228661 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-08 [patent_title] => 'Method to determine the dark-to-clear exposure dose for the swing curve' [patent_app_type] => 1 [patent_app_number] => 9/559960 [patent_app_country] => US [patent_app_date] => 2000-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 1969 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/228/06228661.pdf [firstpage_image] =>[orig_patent_app_number] => 559960 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/559960
Method to determine the dark-to-clear exposure dose for the swing curve Apr 26, 2000 Issued
Array ( [id] => 4329627 [patent_doc_number] => 06313038 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates' [patent_app_type] => 1 [patent_app_number] => 9/558807 [patent_app_country] => US [patent_app_date] => 2000-04-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 4360 [patent_no_of_claims] => 66 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/313/06313038.pdf [firstpage_image] =>[orig_patent_app_number] => 558807 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/558807
Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates Apr 25, 2000 Issued
Array ( [id] => 4337050 [patent_doc_number] => 06333275 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-25 [patent_title] => 'Etchant mixing system for edge bevel removal of copper from silicon wafers' [patent_app_type] => 1 [patent_app_number] => 9/557695 [patent_app_country] => US [patent_app_date] => 2000-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 11144 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/333/06333275.pdf [firstpage_image] =>[orig_patent_app_number] => 557695 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/557695
Etchant mixing system for edge bevel removal of copper from silicon wafers Apr 24, 2000 Issued
Array ( [id] => 4408747 [patent_doc_number] => 06309981 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-30 [patent_title] => 'Edge bevel removal of copper from silicon wafers' [patent_app_type] => 1 [patent_app_number] => 9/557668 [patent_app_country] => US [patent_app_date] => 2000-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 8215 [patent_no_of_claims] => 45 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/309/06309981.pdf [firstpage_image] =>[orig_patent_app_number] => 557668 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/557668
Edge bevel removal of copper from silicon wafers Apr 24, 2000 Issued
Array ( [id] => 4357657 [patent_doc_number] => 06174814 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-16 [patent_title] => 'Method for producing a crack stop for interlevel dielectric layers' [patent_app_type] => 1 [patent_app_number] => 9/557537 [patent_app_country] => US [patent_app_date] => 2000-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 11 [patent_no_of_words] => 4869 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/174/06174814.pdf [firstpage_image] =>[orig_patent_app_number] => 557537 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/557537
Method for producing a crack stop for interlevel dielectric layers Apr 24, 2000 Issued
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