
William A Powell
Examiner (ID: 17926)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1104, 1763, 1106, 1765, 1109, 1301, 1307, 3202, 1502, 1304, 1303 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4215174
[patent_doc_number] => 06110832
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-29
[patent_title] => 'Method and apparatus for slurry polishing'
[patent_app_type] => 1
[patent_app_number] => 9/301050
[patent_app_country] => US
[patent_app_date] => 1999-04-28
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[pdf_file] => patents/06/110/06110832.pdf
[firstpage_image] =>[orig_patent_app_number] => 301050
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/301050 | Method and apparatus for slurry polishing | Apr 27, 1999 | Issued |
Array
(
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[patent_doc_number] => 06107211
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[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Split polysilicon process in CMOS image integrated circuit'
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[patent_app_date] => 1999-04-26
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/298965 | Split polysilicon process in CMOS image integrated circuit | Apr 25, 1999 | Issued |
Array
(
[id] => 4294772
[patent_doc_number] => 06184142
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[patent_kind] => NA
[patent_issue_date] => 2001-02-06
[patent_title] => 'Process for low k organic dielectric film etch'
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[patent_app_number] => 9/302204
[patent_app_country] => US
[patent_app_date] => 1999-04-26
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[patent_drawing_sheets_cnt] => 11
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/302204 | Process for low k organic dielectric film etch | Apr 25, 1999 | Issued |
Array
(
[id] => 4154034
[patent_doc_number] => 06107207
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[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Procedure for generating information for producing a pattern defined by design information'
[patent_app_type] => 1
[patent_app_number] => 9/298393
[patent_app_country] => US
[patent_app_date] => 1999-04-23
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/107/06107207.pdf
[firstpage_image] =>[orig_patent_app_number] => 298393
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/298393 | Procedure for generating information for producing a pattern defined by design information | Apr 22, 1999 | Issued |
Array
(
[id] => 1441109
[patent_doc_number] => 06335294
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-01
[patent_title] => 'Wet cleans for cobalt disilicide processing'
[patent_app_type] => B1
[patent_app_number] => 09/296338
[patent_app_country] => US
[patent_app_date] => 1999-04-22
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[pdf_file] => patents/06/335/06335294.pdf
[firstpage_image] =>[orig_patent_app_number] => 09296338
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/296338 | Wet cleans for cobalt disilicide processing | Apr 21, 1999 | Issued |
Array
(
[id] => 4233564
[patent_doc_number] => 06117781
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[patent_kind] => NA
[patent_issue_date] => 2000-09-12
[patent_title] => 'Optimized trench/via profile for damascene processing'
[patent_app_type] => 1
[patent_app_number] => 9/296553
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Array
(
[id] => 4395679
[patent_doc_number] => 06297166
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[patent_title] => 'Method for modifying nested to isolated offsets'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/296335 | Method for modifying nested to isolated offsets | Apr 21, 1999 | Issued |
Array
(
[id] => 4132038
[patent_doc_number] => 06121150
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[patent_kind] => NA
[patent_issue_date] => 2000-09-19
[patent_title] => 'Sputter-resistant hardmask for damascene trench/via formation'
[patent_app_type] => 1
[patent_app_number] => 9/296557
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[patent_app_date] => 1999-04-22
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Array
(
[id] => 4132022
[patent_doc_number] => 06121149
[patent_country] => US
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[patent_issue_date] => 2000-09-19
[patent_title] => 'Optimized trench/via profile for damascene filling'
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Array
(
[id] => 4233578
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Array
(
[id] => 4233550
[patent_doc_number] => 06117780
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[patent_issue_date] => 2000-09-12
[patent_title] => 'Chemical mechanical polishing method with in-line thickness detection'
[patent_app_type] => 1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/296520 | Chemical mechanical polishing method with in-line thickness detection | Apr 21, 1999 | Issued |
Array
(
[id] => 4215232
[patent_doc_number] => 06110836
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-29
[patent_title] => 'Reactive plasma etch cleaning of high aspect ratio openings'
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Array
(
[id] => 4155005
[patent_doc_number] => 06103629
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[patent_issue_date] => 2000-08-15
[patent_title] => 'Self-aligned interconnect using high selectivity metal pillars and a via exclusion mask'
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[patent_app_number] => 9/295898
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Array
(
[id] => 4156591
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[patent_title] => 'Method for forming a fine pattern in a semiconductor device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/294874 | Method for forming a fine pattern in a semiconductor device | Apr 19, 1999 | Issued |
Array
(
[id] => 4134206
[patent_doc_number] => 06060028
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[patent_title] => 'Apparatus for dry fractionation of fats and oils'
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Array
(
[id] => 3938131
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Array
(
[id] => 1469698
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Array
(
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Array
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/281475 | Method of etching non-doped polysilicon | Mar 29, 1999 | Issued |