
William A Powell
Examiner (ID: 17926)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1104, 1763, 1106, 1765, 1109, 1301, 1307, 3202, 1502, 1304, 1303 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4259331
[patent_doc_number] => 06204192
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-03-20
[patent_title] => 'Plasma cleaning process for openings formed in at least one low dielectric constant insulation layer over copper metallization in integrated circuit structures'
[patent_app_type] => 1
[patent_app_number] => 9/281602
[patent_app_country] => US
[patent_app_date] => 1999-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 4064
[patent_no_of_claims] => 17
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[patent_words_short_claim] => 123
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/204/06204192.pdf
[firstpage_image] =>[orig_patent_app_number] => 281602
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/281602 | Plasma cleaning process for openings formed in at least one low dielectric constant insulation layer over copper metallization in integrated circuit structures | Mar 28, 1999 | Issued |
Array
(
[id] => 4084606
[patent_doc_number] => 06162735
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-19
[patent_title] => 'In-situ method for preparing and highlighting of defects for failure analysis'
[patent_app_type] => 1
[patent_app_number] => 9/277673
[patent_app_country] => US
[patent_app_date] => 1999-03-26
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 4149
[patent_no_of_claims] => 22
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[pdf_file] => patents/06/162/06162735.pdf
[firstpage_image] =>[orig_patent_app_number] => 277673
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/277673 | In-situ method for preparing and highlighting of defects for failure analysis | Mar 25, 1999 | Issued |
Array
(
[id] => 4359402
[patent_doc_number] => 06169036
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-02
[patent_title] => 'Method for cleaning via openings in integrated circuit manufacturing'
[patent_app_type] => 1
[patent_app_number] => 9/276034
[patent_app_country] => US
[patent_app_date] => 1999-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[firstpage_image] =>[orig_patent_app_number] => 276034
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/276034 | Method for cleaning via openings in integrated circuit manufacturing | Mar 24, 1999 | Issued |
Array
(
[id] => 4313020
[patent_doc_number] => 06242350
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-05
[patent_title] => 'Post gate etch cleaning process for self-aligned gate mosfets'
[patent_app_type] => 1
[patent_app_number] => 9/270594
[patent_app_country] => US
[patent_app_date] => 1999-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 4027
[patent_no_of_claims] => 25
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[pdf_file] => patents/06/242/06242350.pdf
[firstpage_image] =>[orig_patent_app_number] => 270594
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/270594 | Post gate etch cleaning process for self-aligned gate mosfets | Mar 17, 1999 | Issued |
Array
(
[id] => 4189106
[patent_doc_number] => 06153530
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-28
[patent_title] => 'Post-etch treatment of plasma-etched feature surfaces to prevent corrosion'
[patent_app_type] => 1
[patent_app_number] => 9/270286
[patent_app_country] => US
[patent_app_date] => 1999-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 8731
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[pdf_file] => patents/06/153/06153530.pdf
[firstpage_image] =>[orig_patent_app_number] => 270286
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/270286 | Post-etch treatment of plasma-etched feature surfaces to prevent corrosion | Mar 15, 1999 | Issued |
Array
(
[id] => 4208349
[patent_doc_number] => 06086779
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-07-11
[patent_title] => 'Copper etching compositions and method for etching copper'
[patent_app_type] => 1
[patent_app_number] => 9/260169
[patent_app_country] => US
[patent_app_date] => 1999-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/06/086/06086779.pdf
[firstpage_image] =>[orig_patent_app_number] => 260169
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/260169 | Copper etching compositions and method for etching copper | Feb 28, 1999 | Issued |
Array
(
[id] => 1536220
[patent_doc_number] => 06337286
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-08
[patent_title] => 'Method for etching metals using organohalide compounds'
[patent_app_type] => B1
[patent_app_number] => 09/258741
[patent_app_country] => US
[patent_app_date] => 1999-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/06/337/06337286.pdf
[firstpage_image] =>[orig_patent_app_number] => 09258741
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/258741 | Method for etching metals using organohalide compounds | Feb 25, 1999 | Issued |
Array
(
[id] => 4183968
[patent_doc_number] => 06159864
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-12
[patent_title] => 'Method of preventing damages of gate oxides of a semiconductor wafer in a plasma-related process'
[patent_app_type] => 1
[patent_app_number] => 9/257172
[patent_app_country] => US
[patent_app_date] => 1999-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2170
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[pdf_file] => patents/06/159/06159864.pdf
[firstpage_image] =>[orig_patent_app_number] => 257172
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/257172 | Method of preventing damages of gate oxides of a semiconductor wafer in a plasma-related process | Feb 23, 1999 | Issued |
Array
(
[id] => 4183057
[patent_doc_number] => 06150280
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-21
[patent_title] => 'Electron-beam cell projection aperture formation method'
[patent_app_type] => 1
[patent_app_number] => 9/256710
[patent_app_country] => US
[patent_app_date] => 1999-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[pdf_file] => patents/06/150/06150280.pdf
[firstpage_image] =>[orig_patent_app_number] => 256710
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/256710 | Electron-beam cell projection aperture formation method | Feb 23, 1999 | Issued |
Array
(
[id] => 4173221
[patent_doc_number] => 06083845
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-07-04
[patent_title] => 'Etching method'
[patent_app_type] => 1
[patent_app_number] => 9/255678
[patent_app_country] => US
[patent_app_date] => 1999-02-23
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/083/06083845.pdf
[firstpage_image] =>[orig_patent_app_number] => 255678
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/255678 | Etching method | Feb 22, 1999 | Issued |
Array
(
[id] => 4216030
[patent_doc_number] => 06087272
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[patent_kind] => NA
[patent_issue_date] => 2000-07-11
[patent_title] => 'Method of producing thin film transistor'
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[patent_app_number] => 9/251290
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[pdf_file] => patents/06/087/06087272.pdf
[firstpage_image] =>[orig_patent_app_number] => 251290
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/251290 | Method of producing thin film transistor | Feb 16, 1999 | Issued |
Array
(
[id] => 4359425
[patent_doc_number] => 06169038
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-02
[patent_title] => 'Method for rough-etching a semiconductor surface'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/251288 | Method for rough-etching a semiconductor surface | Feb 16, 1999 | Issued |
Array
(
[id] => 4408782
[patent_doc_number] => 06265318
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-24
[patent_title] => 'Iridium etchant methods for anisotropic profile'
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[patent_app_number] => 9/251633
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/251633 | Iridium etchant methods for anisotropic profile | Feb 16, 1999 | Issued |
Array
(
[id] => 4285395
[patent_doc_number] => 06210981
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[patent_issue_date] => 2001-04-03
[patent_title] => 'Method for etching a flip chip using secondary particle emissions to detect the etch end-point'
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Array
(
[id] => 4117385
[patent_doc_number] => 06071826
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[patent_issue_date] => 2000-06-06
[patent_title] => 'Method of manufacturing CMOS image sensor leakage free with double layer spacer'
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Array
(
[id] => 4094475
[patent_doc_number] => 06099662
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[patent_title] => 'Process for cleaning a semiconductor substrate after chemical-mechanical polishing'
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Array
(
[id] => 4303258
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Array
(
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Array
(
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[patent_title] => 'Method to reduce boron diffusion through gate oxide using sidewall spacers'
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Array
(
[id] => 4183954
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/236025 | Insitu hardmask and metal etch in a single etcher | Jan 21, 1999 | Issued |