
William A Powell
Examiner (ID: 17926)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1104, 1763, 1106, 1765, 1109, 1301, 1307, 3202, 1502, 1304, 1303 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4071404
[patent_doc_number] => 06069092
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-30
[patent_title] => 'Dry etching method and semiconductor device fabrication method'
[patent_app_type] => 1
[patent_app_number] => 9/178431
[patent_app_country] => US
[patent_app_date] => 1998-10-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 15
[patent_no_of_words] => 5801
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/069/06069092.pdf
[firstpage_image] =>[orig_patent_app_number] => 178431
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/178431 | Dry etching method and semiconductor device fabrication method | Oct 25, 1998 | Issued |
Array
(
[id] => 4139823
[patent_doc_number] => 06060401
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-09
[patent_title] => 'Method of fabricating dual cylindrical capacitor'
[patent_app_type] => 1
[patent_app_number] => 9/178273
[patent_app_country] => US
[patent_app_date] => 1998-10-23
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/060/06060401.pdf
[firstpage_image] =>[orig_patent_app_number] => 178273
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/178273 | Method of fabricating dual cylindrical capacitor | Oct 22, 1998 | Issued |
Array
(
[id] => 4178483
[patent_doc_number] => 06037271
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[patent_kind] => NA
[patent_issue_date] => 2000-03-14
[patent_title] => 'Low haze wafer treatment process'
[patent_app_type] => 1
[patent_app_number] => 9/176588
[patent_app_country] => US
[patent_app_date] => 1998-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 3257
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[patent_words_short_claim] => 148
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[pdf_file] => patents/06/037/06037271.pdf
[firstpage_image] =>[orig_patent_app_number] => 176588
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/176588 | Low haze wafer treatment process | Oct 20, 1998 | Issued |
Array
(
[id] => 4197906
[patent_doc_number] => 06013579
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-11
[patent_title] => 'Self-aligned via process for preventing poison via formation'
[patent_app_type] => 1
[patent_app_number] => 9/176385
[patent_app_country] => US
[patent_app_date] => 1998-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 2070
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
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[pdf_file] => patents/06/013/06013579.pdf
[firstpage_image] =>[orig_patent_app_number] => 176385
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/176385 | Self-aligned via process for preventing poison via formation | Oct 20, 1998 | Issued |
Array
(
[id] => 3896804
[patent_doc_number] => 05897378
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-04-27
[patent_title] => 'Method of monitoring deposit in chamber, method of plasma processing, method of dry-cleaning chamber, and semiconductor manufacturing apparatus'
[patent_app_type] => 1
[patent_app_number] => 9/174555
[patent_app_country] => US
[patent_app_date] => 1998-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
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[patent_no_of_words] => 10725
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[pdf_file] => patents/05/897/05897378.pdf
[firstpage_image] =>[orig_patent_app_number] => 174555
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/174555 | Method of monitoring deposit in chamber, method of plasma processing, method of dry-cleaning chamber, and semiconductor manufacturing apparatus | Oct 18, 1998 | Issued |
Array
(
[id] => 4246897
[patent_doc_number] => 06136722
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-24
[patent_title] => 'Plasma etching method for forming hole in masked silicon dioxide'
[patent_app_type] => 1
[patent_app_number] => 9/172860
[patent_app_country] => US
[patent_app_date] => 1998-10-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/06/136/06136722.pdf
[firstpage_image] =>[orig_patent_app_number] => 172860
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/172860 | Plasma etching method for forming hole in masked silicon dioxide | Oct 14, 1998 | Issued |
Array
(
[id] => 4102963
[patent_doc_number] => 06051507
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-18
[patent_title] => 'Method of fabricating capacitor with high capacitance'
[patent_app_type] => 1
[patent_app_number] => 9/172406
[patent_app_country] => US
[patent_app_date] => 1998-10-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/06/051/06051507.pdf
[firstpage_image] =>[orig_patent_app_number] => 172406
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/172406 | Method of fabricating capacitor with high capacitance | Oct 13, 1998 | Issued |
Array
(
[id] => 4205441
[patent_doc_number] => 06077789
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-20
[patent_title] => 'Method for forming a passivation layer with planarization'
[patent_app_type] => 1
[patent_app_number] => 9/172535
[patent_app_country] => US
[patent_app_date] => 1998-10-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 9
[patent_no_of_words] => 2244
[patent_no_of_claims] => 17
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[pdf_file] => patents/06/077/06077789.pdf
[firstpage_image] =>[orig_patent_app_number] => 172535
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/172535 | Method for forming a passivation layer with planarization | Oct 13, 1998 | Issued |
Array
(
[id] => 4207208
[patent_doc_number] => 06028011
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-22
[patent_title] => 'Method of forming electric pad of semiconductor device and method of forming solder bump'
[patent_app_type] => 1
[patent_app_number] => 9/170633
[patent_app_country] => US
[patent_app_date] => 1998-10-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 7304
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[pdf_file] => patents/06/028/06028011.pdf
[firstpage_image] =>[orig_patent_app_number] => 170633
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/170633 | Method of forming electric pad of semiconductor device and method of forming solder bump | Oct 12, 1998 | Issued |
Array
(
[id] => 4181785
[patent_doc_number] => 06020272
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-01
[patent_title] => 'Method for forming suspended micromechanical structures'
[patent_app_type] => 1
[patent_app_number] => 9/169307
[patent_app_country] => US
[patent_app_date] => 1998-10-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
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[patent_no_of_words] => 11387
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[pdf_file] => patents/06/020/06020272.pdf
[firstpage_image] =>[orig_patent_app_number] => 169307
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/169307 | Method for forming suspended micromechanical structures | Oct 7, 1998 | Issued |
Array
(
[id] => 4169938
[patent_doc_number] => 06140244
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-31
[patent_title] => 'Method for forming a spacer'
[patent_app_type] => 1
[patent_app_number] => 9/167100
[patent_app_country] => US
[patent_app_date] => 1998-10-05
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/140/06140244.pdf
[firstpage_image] =>[orig_patent_app_number] => 167100
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/167100 | Method for forming a spacer | Oct 4, 1998 | Issued |
Array
(
[id] => 4086020
[patent_doc_number] => 06017826
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-25
[patent_title] => 'Chlorine containing plasma etch method with enhanced sidewall passivation and attenuated microloading effect'
[patent_app_type] => 1
[patent_app_number] => 9/166746
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[pdf_file] => patents/06/017/06017826.pdf
[firstpage_image] =>[orig_patent_app_number] => 166746
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/166746 | Chlorine containing plasma etch method with enhanced sidewall passivation and attenuated microloading effect | Oct 4, 1998 | Issued |
Array
(
[id] => 4197933
[patent_doc_number] => 06013581
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-11
[patent_title] => 'Method for preventing poisoned vias and trenches'
[patent_app_type] => 1
[patent_app_number] => 9/166821
[patent_app_country] => US
[patent_app_date] => 1998-10-05
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/013/06013581.pdf
[firstpage_image] =>[orig_patent_app_number] => 166821
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/166821 | Method for preventing poisoned vias and trenches | Oct 4, 1998 | Issued |
Array
(
[id] => 4072611
[patent_doc_number] => RE036810
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-08
[patent_title] => 'Plasma processing apparatus and method'
[patent_app_type] => 2
[patent_app_number] => 9/165545
[patent_app_country] => US
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[pdf_file] => patents/RE/036/RE036810.pdf
[firstpage_image] =>[orig_patent_app_number] => 165545
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/165545 | Plasma processing apparatus and method | Oct 1, 1998 | Issued |
Array
(
[id] => 4136808
[patent_doc_number] => 06015755
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-18
[patent_title] => 'Method of fabricating a trench isolation structure using a reverse mask'
[patent_app_type] => 1
[patent_app_number] => 9/162576
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[pdf_file] => patents/06/015/06015755.pdf
[firstpage_image] =>[orig_patent_app_number] => 162576
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/162576 | Method of fabricating a trench isolation structure using a reverse mask | Sep 28, 1998 | Issued |
Array
(
[id] => 4178415
[patent_doc_number] => 06037266
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-14
[patent_title] => 'Method for patterning a polysilicon gate with a thin gate oxide in a polysilicon etcher'
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[patent_app_number] => 9/161567
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[pdf_file] => patents/06/037/06037266.pdf
[firstpage_image] =>[orig_patent_app_number] => 161567
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/161567 | Method for patterning a polysilicon gate with a thin gate oxide in a polysilicon etcher | Sep 27, 1998 | Issued |
Array
(
[id] => 3911580
[patent_doc_number] => 06001743
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-14
[patent_title] => 'Method for fabricating a self-aligned contact'
[patent_app_type] => 1
[patent_app_number] => 9/149736
[patent_app_country] => US
[patent_app_date] => 1998-09-08
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[pdf_file] => patents/06/001/06001743.pdf
[firstpage_image] =>[orig_patent_app_number] => 149736
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/149736 | Method for fabricating a self-aligned contact | Sep 7, 1998 | Issued |
Array
(
[id] => 4085301
[patent_doc_number] => 06025276
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-15
[patent_title] => 'Semiconductor processing methods of forming substrate features, including contact openings'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/146844 | Semiconductor processing methods of forming substrate features, including contact openings | Sep 2, 1998 | Issued |
Array
(
[id] => 4186301
[patent_doc_number] => 06093652
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-07-25
[patent_title] => 'Methods of forming insulative plugs, and oxide plug forming methods'
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[pdf_file] => patents/06/093/06093652.pdf
[firstpage_image] =>[orig_patent_app_number] => 146765
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/146765 | Methods of forming insulative plugs, and oxide plug forming methods | Sep 2, 1998 | Issued |
Array
(
[id] => 4114262
[patent_doc_number] => 06046111
[patent_country] => US
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[patent_title] => 'Method and apparatus for endpointing mechanical and chemical-mechanical planarization of microelectronic substrates'
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[pdf_file] => patents/06/046/06046111.pdf
[firstpage_image] =>[orig_patent_app_number] => 146330
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/146330 | Method and apparatus for endpointing mechanical and chemical-mechanical planarization of microelectronic substrates | Sep 1, 1998 | Issued |