
William A Powell
Examiner (ID: 17926)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1104, 1763, 1106, 1765, 1109, 1301, 1307, 3202, 1502, 1304, 1303 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4234355
[patent_doc_number] => 06074953
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-13
[patent_title] => 'Dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers'
[patent_app_type] => 1
[patent_app_number] => 9/141810
[patent_app_country] => US
[patent_app_date] => 1998-08-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 15
[patent_no_of_words] => 3333
[patent_no_of_claims] => 64
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/074/06074953.pdf
[firstpage_image] =>[orig_patent_app_number] => 141810
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/141810 | Dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers | Aug 27, 1998 | Issued |
Array
(
[id] => 4136850
[patent_doc_number] => 06015758
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-18
[patent_title] => 'Method of stripping a wafer of its film with gas injected into a CVD apparatus in which the wafer is disposed'
[patent_app_type] => 1
[patent_app_number] => 9/140332
[patent_app_country] => US
[patent_app_date] => 1998-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 2930
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 63
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/015/06015758.pdf
[firstpage_image] =>[orig_patent_app_number] => 140332
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/140332 | Method of stripping a wafer of its film with gas injected into a CVD apparatus in which the wafer is disposed | Aug 25, 1998 | Issued |
Array
(
[id] => 4064527
[patent_doc_number] => 06008135
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-28
[patent_title] => 'Method for etching metal layer of a semiconductor device using hard mask'
[patent_app_type] => 1
[patent_app_number] => 9/140325
[patent_app_country] => US
[patent_app_date] => 1998-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 2328
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 90
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/008/06008135.pdf
[firstpage_image] =>[orig_patent_app_number] => 140325
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/140325 | Method for etching metal layer of a semiconductor device using hard mask | Aug 25, 1998 | Issued |
Array
(
[id] => 4117399
[patent_doc_number] => 06071827
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-06
[patent_title] => 'Method for manufacturing semiconductor devices'
[patent_app_type] => 1
[patent_app_number] => 9/136139
[patent_app_country] => US
[patent_app_date] => 1998-08-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 2601
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/071/06071827.pdf
[firstpage_image] =>[orig_patent_app_number] => 136139
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/136139 | Method for manufacturing semiconductor devices | Aug 17, 1998 | Issued |
Array
(
[id] => 4181755
[patent_doc_number] => 06020270
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-01
[patent_title] => 'Bomine and iodine etch process for silicon and silicides'
[patent_app_type] => 1
[patent_app_number] => 9/134290
[patent_app_country] => US
[patent_app_date] => 1998-08-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 7
[patent_no_of_words] => 6972
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/020/06020270.pdf
[firstpage_image] =>[orig_patent_app_number] => 134290
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/134290 | Bomine and iodine etch process for silicon and silicides | Aug 13, 1998 | Issued |
Array
(
[id] => 4117320
[patent_doc_number] => 06071822
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-06
[patent_title] => 'Etching process for producing substantially undercut free silicon on insulator structures'
[patent_app_type] => 1
[patent_app_number] => 9/127762
[patent_app_country] => US
[patent_app_date] => 1998-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 7221
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 4
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/071/06071822.pdf
[firstpage_image] =>[orig_patent_app_number] => 127762
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/127762 | Etching process for producing substantially undercut free silicon on insulator structures | Jul 30, 1998 | Issued |
Array
(
[id] => 4139842
[patent_doc_number] => 06060402
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-09
[patent_title] => 'Process for selective recess etching of epitaxial field effect transistors with a novel etch-stop layer'
[patent_app_type] => 1
[patent_app_number] => 9/121160
[patent_app_country] => US
[patent_app_date] => 1998-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 4705
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/060/06060402.pdf
[firstpage_image] =>[orig_patent_app_number] => 121160
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/121160 | Process for selective recess etching of epitaxial field effect transistors with a novel etch-stop layer | Jul 22, 1998 | Issued |
Array
(
[id] => 3941130
[patent_doc_number] => 05989929
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-23
[patent_title] => 'Apparatus and method for manufacturing semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 9/119588
[patent_app_country] => US
[patent_app_date] => 1998-07-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 37
[patent_figures_cnt] => 45
[patent_no_of_words] => 19248
[patent_no_of_claims] => 36
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 71
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/989/05989929.pdf
[firstpage_image] =>[orig_patent_app_number] => 119588
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/119588 | Apparatus and method for manufacturing semiconductor device | Jul 20, 1998 | Issued |
Array
(
[id] => 4131888
[patent_doc_number] => 06147004
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-14
[patent_title] => 'Jet vapor reduction of the thickness of process layers'
[patent_app_type] => 1
[patent_app_number] => 9/120056
[patent_app_country] => US
[patent_app_date] => 1998-07-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 4483
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 3
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/147/06147004.pdf
[firstpage_image] =>[orig_patent_app_number] => 120056
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/120056 | Jet vapor reduction of the thickness of process layers | Jul 20, 1998 | Issued |
Array
(
[id] => 4085925
[patent_doc_number] => 06017820
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-25
[patent_title] => 'Integrated vacuum and plating cluster system'
[patent_app_type] => 1
[patent_app_number] => 9/118982
[patent_app_country] => US
[patent_app_date] => 1998-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4617
[patent_no_of_claims] => 18
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/017/06017820.pdf
[firstpage_image] =>[orig_patent_app_number] => 118982
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/118982 | Integrated vacuum and plating cluster system | Jul 16, 1998 | Issued |
Array
(
[id] => 4178427
[patent_doc_number] => 06037267
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-14
[patent_title] => 'Method of etching metallic film for semiconductor devices'
[patent_app_type] => 1
[patent_app_number] => 9/116483
[patent_app_country] => US
[patent_app_date] => 1998-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/037/06037267.pdf
[firstpage_image] =>[orig_patent_app_number] => 116483
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/116483 | Method of etching metallic film for semiconductor devices | Jul 15, 1998 | Issued |
Array
(
[id] => 3926617
[patent_doc_number] => 05938942
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-17
[patent_title] => 'Method of manufacturing semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 9/114337
[patent_app_country] => US
[patent_app_date] => 1998-07-13
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[pdf_file] => patents/05/938/05938942.pdf
[firstpage_image] =>[orig_patent_app_number] => 114337
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/114337 | Method of manufacturing semiconductor device | Jul 12, 1998 | Issued |
Array
(
[id] => 4181726
[patent_doc_number] => 06020268
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-01
[patent_title] => 'Magnetic field controlled spacer width'
[patent_app_type] => 1
[patent_app_number] => 9/114126
[patent_app_country] => US
[patent_app_date] => 1998-07-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/020/06020268.pdf
[firstpage_image] =>[orig_patent_app_number] => 114126
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/114126 | Magnetic field controlled spacer width | Jul 12, 1998 | Issued |
| 90/005036 | PLASMA ETCHING USING HYDROGEN BROMIDE ADDITION | Jul 1, 1998 | Issued |
Array
(
[id] => 4140169
[patent_doc_number] => 06063306
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-16
[patent_title] => 'Chemical mechanical polishing slurry useful for copper/tantalum substrate'
[patent_app_type] => 1
[patent_app_number] => 9/105555
[patent_app_country] => US
[patent_app_date] => 1998-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 7934
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/063/06063306.pdf
[firstpage_image] =>[orig_patent_app_number] => 105555
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/105555 | Chemical mechanical polishing slurry useful for copper/tantalum substrate | Jun 25, 1998 | Issued |
Array
(
[id] => 3942412
[patent_doc_number] => 05990017
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-23
[patent_title] => 'Plasma reactor with heated source of a polymer-hardening precursor material'
[patent_app_type] => 1
[patent_app_number] => 9/104550
[patent_app_country] => US
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[pdf_file] => patents/05/990/05990017.pdf
[firstpage_image] =>[orig_patent_app_number] => 104550
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/104550 | Plasma reactor with heated source of a polymer-hardening precursor material | Jun 24, 1998 | Issued |
Array
(
[id] => 3938653
[patent_doc_number] => 05939741
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-17
[patent_title] => 'Methods of forming integrated circuitry and integrated circuitry structures'
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[patent_app_number] => 9/095004
[patent_app_country] => US
[patent_app_date] => 1998-06-09
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[pdf_file] => patents/05/939/05939741.pdf
[firstpage_image] =>[orig_patent_app_number] => 095004
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/095004 | Methods of forming integrated circuitry and integrated circuitry structures | Jun 8, 1998 | Issued |
Array
(
[id] => 4247738
[patent_doc_number] => 06221776
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-24
[patent_title] => 'Anti-reflective coating used as a disposable etch stop'
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[patent_app_number] => 9/073033
[patent_app_country] => US
[patent_app_date] => 1998-05-05
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[pdf_file] => patents/06/221/06221776.pdf
[firstpage_image] =>[orig_patent_app_number] => 073033
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073033 | Anti-reflective coating used as a disposable etch stop | May 4, 1998 | Issued |
Array
(
[id] => 4086035
[patent_doc_number] => 06017827
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-25
[patent_title] => 'System and method for mixing a gas into a solvent used in semiconductor processing'
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[patent_app_number] => 9/073018
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[pdf_file] => patents/06/017/06017827.pdf
[firstpage_image] =>[orig_patent_app_number] => 073018
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073018 | System and method for mixing a gas into a solvent used in semiconductor processing | May 3, 1998 | Issued |
Array
(
[id] => 1523802
[patent_doc_number] => 06352937
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-05
[patent_title] => 'Method for stripping organic based film'
[patent_app_type] => B1
[patent_app_number] => 09/067377
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[pdf_file] => patents/06/352/06352937.pdf
[firstpage_image] =>[orig_patent_app_number] => 09067377
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/067377 | Method for stripping organic based film | Apr 26, 1998 | Issued |