
William A. Powell
Examiner (ID: 12339)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1307, 1109, 1301, 1304, 1303, 1765, 1106, 1104, 1763, 1502, 3202 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3886217
[patent_doc_number] => 05893753
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-04-13
[patent_title] => 'Vibrating polishing pad conditioning system and method'
[patent_app_type] => 1
[patent_app_number] => 8/869619
[patent_app_country] => US
[patent_app_date] => 1997-06-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 3405
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/893/05893753.pdf
[firstpage_image] =>[orig_patent_app_number] => 869619
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/869619 | Vibrating polishing pad conditioning system and method | Jun 4, 1997 | Issued |
Array
(
[id] => 3926491
[patent_doc_number] => 05877090
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-02
[patent_title] => 'Selective plasma etching of silicon nitride in presence of silicon or silicon oxides using mixture of NH.sub.3 or SF.sub.6 and HBR and N.sub.2'
[patent_app_type] => 1
[patent_app_number] => 8/868061
[patent_app_country] => US
[patent_app_date] => 1997-06-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 12
[patent_no_of_words] => 6505
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 117
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/877/05877090.pdf
[firstpage_image] =>[orig_patent_app_number] => 868061
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/868061 | Selective plasma etching of silicon nitride in presence of silicon or silicon oxides using mixture of NH.sub.3 or SF.sub.6 and HBR and N.sub.2 | Jun 2, 1997 | Issued |
Array
(
[id] => 3740856
[patent_doc_number] => 05786275
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Process of fabricating wiring structure having metal plug twice polished under different conditions'
[patent_app_type] => 1
[patent_app_number] => 8/865889
[patent_app_country] => US
[patent_app_date] => 1997-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 17
[patent_no_of_words] => 3914
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/786/05786275.pdf
[firstpage_image] =>[orig_patent_app_number] => 865889
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/865889 | Process of fabricating wiring structure having metal plug twice polished under different conditions | May 29, 1997 | Issued |
Array
(
[id] => 3928546
[patent_doc_number] => 05980763
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-09
[patent_title] => 'Electronic device manufacture'
[patent_app_type] => 1
[patent_app_number] => 8/866648
[patent_app_country] => US
[patent_app_date] => 1997-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 9
[patent_no_of_words] => 6932
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 197
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/980/05980763.pdf
[firstpage_image] =>[orig_patent_app_number] => 866648
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/866648 | Electronic device manufacture | May 29, 1997 | Issued |
Array
(
[id] => 4042709
[patent_doc_number] => 05874366
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-23
[patent_title] => 'Method for etching a semiconductor substrate and etching system'
[patent_app_type] => 1
[patent_app_number] => 8/863371
[patent_app_country] => US
[patent_app_date] => 1997-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1682
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/874/05874366.pdf
[firstpage_image] =>[orig_patent_app_number] => 863371
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/863371 | Method for etching a semiconductor substrate and etching system | May 26, 1997 | Issued |
Array
(
[id] => 3923183
[patent_doc_number] => 05914277
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-22
[patent_title] => 'Method for forming metallic wiring pattern'
[patent_app_type] => 1
[patent_app_number] => 8/862360
[patent_app_country] => US
[patent_app_date] => 1997-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 3806
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/914/05914277.pdf
[firstpage_image] =>[orig_patent_app_number] => 862360
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/862360 | Method for forming metallic wiring pattern | May 22, 1997 | Issued |
Array
(
[id] => 4124223
[patent_doc_number] => 06033581
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-07
[patent_title] => 'Process for producing ink jet recording head'
[patent_app_type] => 1
[patent_app_number] => 8/862465
[patent_app_country] => US
[patent_app_date] => 1997-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 12
[patent_no_of_words] => 3114
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 143
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/033/06033581.pdf
[firstpage_image] =>[orig_patent_app_number] => 862465
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/862465 | Process for producing ink jet recording head | May 22, 1997 | Issued |
Array
(
[id] => 3861139
[patent_doc_number] => 05795832
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-18
[patent_title] => 'Method and apparatus for dry etching'
[patent_app_type] => 1
[patent_app_number] => 8/861600
[patent_app_country] => US
[patent_app_date] => 1997-05-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 29
[patent_no_of_words] => 11293
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 44
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/795/05795832.pdf
[firstpage_image] =>[orig_patent_app_number] => 861600
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/861600 | Method and apparatus for dry etching | May 21, 1997 | Issued |
Array
(
[id] => 3980455
[patent_doc_number] => 05910022
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-08
[patent_title] => 'Method and system for tungsten chemical mechanical polishing for unplanarized dielectric surfaces'
[patent_app_type] => 1
[patent_app_number] => 8/861941
[patent_app_country] => US
[patent_app_date] => 1997-05-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 13
[patent_no_of_words] => 5751
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/910/05910022.pdf
[firstpage_image] =>[orig_patent_app_number] => 861941
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/861941 | Method and system for tungsten chemical mechanical polishing for unplanarized dielectric surfaces | May 21, 1997 | Issued |
Array
(
[id] => 3950871
[patent_doc_number] => 05899748
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-05-04
[patent_title] => 'Method for anchoring via/contact in semiconductor devices and devices formed'
[patent_app_type] => 1
[patent_app_number] => 8/859863
[patent_app_country] => US
[patent_app_date] => 1997-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 6
[patent_no_of_words] => 3866
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/899/05899748.pdf
[firstpage_image] =>[orig_patent_app_number] => 859863
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/859863 | Method for anchoring via/contact in semiconductor devices and devices formed | May 20, 1997 | Issued |
Array
(
[id] => 3989926
[patent_doc_number] => 05922217
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-13
[patent_title] => 'Method for correcting defects in a phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/859261
[patent_app_country] => US
[patent_app_date] => 1997-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 22
[patent_no_of_words] => 3173
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/922/05922217.pdf
[firstpage_image] =>[orig_patent_app_number] => 859261
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/859261 | Method for correcting defects in a phase shift mask | May 19, 1997 | Issued |
Array
(
[id] => 3832557
[patent_doc_number] => 05814564
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-29
[patent_title] => 'Etch back method to planarize an interlayer having a critical HDP-CVD deposition process'
[patent_app_type] => 1
[patent_app_number] => 8/857164
[patent_app_country] => US
[patent_app_date] => 1997-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 3641
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 421
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/814/05814564.pdf
[firstpage_image] =>[orig_patent_app_number] => 857164
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/857164 | Etch back method to planarize an interlayer having a critical HDP-CVD deposition process | May 14, 1997 | Issued |
Array
(
[id] => 3759502
[patent_doc_number] => 05851842
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-22
[patent_title] => 'Measurement system and measurement method'
[patent_app_type] => 1
[patent_app_number] => 8/857360
[patent_app_country] => US
[patent_app_date] => 1997-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 24
[patent_no_of_words] => 15091
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/851/05851842.pdf
[firstpage_image] =>[orig_patent_app_number] => 857360
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/857360 | Measurement system and measurement method | May 14, 1997 | Issued |
Array
(
[id] => 4040015
[patent_doc_number] => 05868951
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-09
[patent_title] => 'Electro-optical device and method'
[patent_app_type] => 1
[patent_app_number] => 8/853462
[patent_app_country] => US
[patent_app_date] => 1997-05-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 13
[patent_no_of_words] => 8619
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 32
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/868/05868951.pdf
[firstpage_image] =>[orig_patent_app_number] => 853462
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/853462 | Electro-optical device and method | May 8, 1997 | Issued |
Array
(
[id] => 4006041
[patent_doc_number] => 05879576
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-09
[patent_title] => 'Method and apparatus for processing substrates'
[patent_app_type] => 1
[patent_app_number] => 8/852291
[patent_app_country] => US
[patent_app_date] => 1997-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 11
[patent_no_of_words] => 6494
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/879/05879576.pdf
[firstpage_image] =>[orig_patent_app_number] => 852291
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/852291 | Method and apparatus for processing substrates | May 6, 1997 | Issued |
Array
(
[id] => 4047420
[patent_doc_number] => 05968841
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-10-19
[patent_title] => 'Device and method for preventing settlement of particles on a chemical-mechanical polishing pad'
[patent_app_type] => 1
[patent_app_number] => 8/851920
[patent_app_country] => US
[patent_app_date] => 1997-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 3725
[patent_no_of_claims] => 52
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 59
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/968/05968841.pdf
[firstpage_image] =>[orig_patent_app_number] => 851920
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/851920 | Device and method for preventing settlement of particles on a chemical-mechanical polishing pad | May 5, 1997 | Issued |
Array
(
[id] => 3733669
[patent_doc_number] => 05785791
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Method of manufacturing semiconductor component'
[patent_app_type] => 1
[patent_app_number] => 8/850307
[patent_app_country] => US
[patent_app_date] => 1997-05-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 3003
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 44
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/785/05785791.pdf
[firstpage_image] =>[orig_patent_app_number] => 850307
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/850307 | Method of manufacturing semiconductor component | May 4, 1997 | Issued |
Array
(
[id] => 4034897
[patent_doc_number] => 05856239
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-05
[patent_title] => 'Tungsten silicide/ tungsten polycide anisotropic dry etch process'
[patent_app_type] => 1
[patent_app_number] => 8/850573
[patent_app_country] => US
[patent_app_date] => 1997-05-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 4258
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 40
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/856/05856239.pdf
[firstpage_image] =>[orig_patent_app_number] => 850573
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/850573 | Tungsten silicide/ tungsten polycide anisotropic dry etch process | May 1, 1997 | Issued |
Array
(
[id] => 3771909
[patent_doc_number] => 05807790
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-15
[patent_title] => 'Selective i-line BARL etch process'
[patent_app_type] => 1
[patent_app_number] => 8/848778
[patent_app_country] => US
[patent_app_date] => 1997-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 1777
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 334
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/807/05807790.pdf
[firstpage_image] =>[orig_patent_app_number] => 848778
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/848778 | Selective i-line BARL etch process | Apr 30, 1997 | Issued |
Array
(
[id] => 4018729
[patent_doc_number] => 05906951
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-05-25
[patent_title] => 'Strained Si/SiGe layers on insulator'
[patent_app_type] => 1
[patent_app_number] => 8/846605
[patent_app_country] => US
[patent_app_date] => 1997-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1914
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 176
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/906/05906951.pdf
[firstpage_image] =>[orig_patent_app_number] => 846605
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/846605 | Strained Si/SiGe layers on insulator | Apr 29, 1997 | Issued |