
William A. Powell
Examiner (ID: 14143)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1763, 1304, 1765, 1104, 1303, 3202, 1106, 1502, 1301, 1109, 1307 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5999495
[patent_doc_number] => 20020028322
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-03-07
[patent_title] => 'Mask for the selective growth of a solid, a manufacturing method for the mask, and a method for selectively growing a solid using the mask'
[patent_app_type] => new
[patent_app_number] => 09/917711
[patent_app_country] => US
[patent_app_date] => 2001-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => publications/A1/0028/20020028322.pdf
[firstpage_image] =>[orig_patent_app_number] => 09917711
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/917711 | Mask for the selective growth of a solid, a manufacturing method for the mask, and a method for selectively growing a solid using the mask | Jul 30, 2001 | Issued |
Array
(
[id] => 1368920
[patent_doc_number] => 06558560
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[patent_kind] => B2
[patent_issue_date] => 2003-05-06
[patent_title] => 'Method for the fabrication of electrical contacts'
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[patent_app_number] => 09/917357
[patent_app_country] => US
[patent_app_date] => 2001-07-27
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Array
(
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[patent_title] => 'Material removal method for forming a structure'
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[patent_app_number] => 09/907296
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[patent_app_date] => 2001-07-16
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/907296 | Material removal method for forming a structure | Jul 15, 2001 | Issued |
Array
(
[id] => 1288912
[patent_doc_number] => 06632744
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[patent_issue_date] => 2003-10-14
[patent_title] => 'Manufacturing method of semiconductor integrated circuit device'
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[patent_app_date] => 2001-07-13
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/903580 | Manufacturing method of semiconductor integrated circuit device | Jul 12, 2001 | Issued |
Array
(
[id] => 1337616
[patent_doc_number] => 06585908
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[patent_issue_date] => 2003-07-01
[patent_title] => 'Shallow angle interference process and apparatus for determining real-time etching rate'
[patent_app_type] => B2
[patent_app_number] => 09/905032
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[patent_app_date] => 2001-07-13
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[pdf_file] => patents/06/585/06585908.pdf
[firstpage_image] =>[orig_patent_app_number] => 09905032
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/905032 | Shallow angle interference process and apparatus for determining real-time etching rate | Jul 12, 2001 | Issued |
Array
(
[id] => 1343730
[patent_doc_number] => 06579464
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[patent_issue_date] => 2003-06-17
[patent_title] => 'Fixtures for processing a workpiece in a supercritical fluid'
[patent_app_type] => B2
[patent_app_number] => 09/903880
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[patent_app_date] => 2001-07-12
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Array
(
[id] => 6651452
[patent_doc_number] => 20030008511
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[patent_issue_date] => 2003-01-09
[patent_title] => 'Dual damascene structure employing nitrogenated silicon carbide and non-nitrogenated silicon carbide ETCH stop layers'
[patent_app_type] => new
[patent_app_number] => 09/899420
[patent_app_country] => US
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[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0008/20030008511.pdf
[firstpage_image] =>[orig_patent_app_number] => 09899420
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/899420 | Dual damascene structure employing nitrogenated silicon carbide and non-nitrogenated silicon carbide etch stop layers | Jul 4, 2001 | Issued |
Array
(
[id] => 6651460
[patent_doc_number] => 20030008515
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-09
[patent_title] => 'Method of fabricating a vertical MOS transistor'
[patent_app_type] => new
[patent_app_number] => 09/681988
[patent_app_country] => US
[patent_app_date] => 2001-07-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
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[patent_no_of_words] => 2737
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[pdf_file] => publications/A1/0008/20030008515.pdf
[firstpage_image] =>[orig_patent_app_number] => 09681988
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/681988 | Method of fabricating a vertical MOS transistor | Jul 2, 2001 | Abandoned |
Array
(
[id] => 1346789
[patent_doc_number] => 06583067
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[patent_kind] => B2
[patent_issue_date] => 2003-06-24
[patent_title] => 'Method of avoiding dielectric layer deterioration with a low dielectric constant'
[patent_app_type] => B2
[patent_app_number] => 09/681987
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[firstpage_image] =>[orig_patent_app_number] => 09681987
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/681987 | Method of avoiding dielectric layer deterioration with a low dielectric constant | Jul 2, 2001 | Issued |
Array
(
[id] => 1362106
[patent_doc_number] => 06569770
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[patent_kind] => B2
[patent_issue_date] => 2003-05-27
[patent_title] => 'Method for improving oxide erosion of tungsten CMP operations'
[patent_app_type] => B2
[patent_app_number] => 09/893080
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[patent_app_date] => 2001-06-28
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Array
(
[id] => 1598450
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[patent_title] => 'Method for fabricating a stencil mask'
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[patent_app_number] => 09/892552
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/892552 | Method for fabricating a stencil mask | Jun 27, 2001 | Issued |
Array
(
[id] => 1390893
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[patent_title] => 'Method for improved die release of a semiconductor device from a wafer'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/891105 | Method for improved die release of a semiconductor device from a wafer | Jun 24, 2001 | Issued |
Array
(
[id] => 5996783
[patent_doc_number] => 20020027124
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[patent_issue_date] => 2002-03-07
[patent_title] => 'Bio-mediated assembly of micrometer-scale and nanometer-scale structures'
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Array
(
[id] => 1570144
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[patent_title] => 'Optical intensity modifier'
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Array
(
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Array
(
[id] => 1517394
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[patent_title] => 'Method of etching semiconductor metallic layer'
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Array
(
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[patent_title] => 'Method for controlling flatness of wafer and manufacturing method of thin-film magnetic head'
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Array
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Array
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/858770 | Microelectronic packaging methods and components | May 15, 2001 | Issued |