
William A. Powell
Examiner (ID: 14143)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1763, 1304, 1765, 1104, 1303, 3202, 1106, 1502, 1301, 1109, 1307 |
| Total Applications | 3597 |
| Issued Applications | 3357 |
| Pending Applications | 97 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1303986
[patent_doc_number] => 06616853
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-09
[patent_title] => 'Method for reducing leaching in metal-coated MEMS'
[patent_app_type] => B1
[patent_app_number] => 09/799916
[patent_app_country] => US
[patent_app_date] => 2001-03-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 5584
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[pdf_file] => patents/06/616/06616853.pdf
[firstpage_image] =>[orig_patent_app_number] => 09799916
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/799916 | Method for reducing leaching in metal-coated MEMS | Mar 4, 2001 | Issued |
Array
(
[id] => 1570332
[patent_doc_number] => 06498109
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-12-24
[patent_title] => 'System and method for plasma etching'
[patent_app_type] => B2
[patent_app_number] => 09/796914
[patent_app_country] => US
[patent_app_date] => 2001-03-01
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[pdf_file] => patents/06/498/06498109.pdf
[firstpage_image] =>[orig_patent_app_number] => 09796914
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/796914 | System and method for plasma etching | Feb 28, 2001 | Issued |
Array
(
[id] => 6895036
[patent_doc_number] => 20010025826
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-04
[patent_title] => 'Dense-plasma etching of InP-based materials using chlorine and nitrogen'
[patent_app_type] => new
[patent_app_number] => 09/795715
[patent_app_country] => US
[patent_app_date] => 2001-02-28
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[patent_drawing_sheets_cnt] => 6
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[pdf_file] => publications/A1/0025/20010025826.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/795715 | Dense-plasma etching of InP-based materials using chlorine and nitrogen | Feb 27, 2001 | Abandoned |
Array
(
[id] => 1449838
[patent_doc_number] => 06455333
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-24
[patent_title] => 'Method of achieving stable deep ultraviolet (DUV) resist etch rate for gate critical dimension (CD)'
[patent_app_type] => B1
[patent_app_number] => 09/796382
[patent_app_country] => US
[patent_app_date] => 2001-02-28
[patent_effective_date] => 0000-00-00
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Array
(
[id] => 1528165
[patent_doc_number] => 06479396
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-12
[patent_title] => 'Dry polymer and oxide veil removal for post etch cleaning'
[patent_app_type] => B1
[patent_app_number] => 09/794055
[patent_app_country] => US
[patent_app_date] => 2001-02-28
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/794055 | Dry polymer and oxide veil removal for post etch cleaning | Feb 27, 2001 | Issued |
Array
(
[id] => 6887806
[patent_doc_number] => 20010008800
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[patent_kind] => A1
[patent_issue_date] => 2001-07-19
[patent_title] => 'Removal of polishing residue from substrate using supercritical fluid process'
[patent_app_type] => new-utility
[patent_app_number] => 09/796300
[patent_app_country] => US
[patent_app_date] => 2001-02-27
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/796300 | Removal of polishing residue from substrate using supercritical fluid process | Feb 26, 2001 | Issued |
Array
(
[id] => 1598454
[patent_doc_number] => 06475400
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-11-05
[patent_title] => 'Method for controlling the sheet resistance of thin film resistors'
[patent_app_type] => B2
[patent_app_number] => 09/793252
[patent_app_country] => US
[patent_app_date] => 2001-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[firstpage_image] =>[orig_patent_app_number] => 09793252
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/793252 | Method for controlling the sheet resistance of thin film resistors | Feb 25, 2001 | Issued |
Array
(
[id] => 1507552
[patent_doc_number] => 06440873
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Post metal etch cleaning method'
[patent_app_type] => B1
[patent_app_number] => 09/792952
[patent_app_country] => US
[patent_app_date] => 2001-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_no_of_words] => 1259
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[pdf_file] => patents/06/440/06440873.pdf
[firstpage_image] =>[orig_patent_app_number] => 09792952
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/792952 | Post metal etch cleaning method | Feb 25, 2001 | Issued |
Array
(
[id] => 1419548
[patent_doc_number] => 06506686
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-14
[patent_title] => 'Plasma processing apparatus and plasma processing method'
[patent_app_type] => B2
[patent_app_number] => 09/790702
[patent_app_country] => US
[patent_app_date] => 2001-02-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => patents/06/506/06506686.pdf
[firstpage_image] =>[orig_patent_app_number] => 09790702
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/790702 | Plasma processing apparatus and plasma processing method | Feb 22, 2001 | Issued |
Array
(
[id] => 1382730
[patent_doc_number] => 06551941
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-22
[patent_title] => 'Method of forming a notched silicon-containing gate structure'
[patent_app_type] => B2
[patent_app_number] => 09/791446
[patent_app_country] => US
[patent_app_date] => 2001-02-22
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[pdf_file] => patents/06/551/06551941.pdf
[firstpage_image] =>[orig_patent_app_number] => 09791446
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/791446 | Method of forming a notched silicon-containing gate structure | Feb 21, 2001 | Issued |
Array
(
[id] => 1411092
[patent_doc_number] => 06511609
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[patent_kind] => B2
[patent_issue_date] => 2003-01-28
[patent_title] => 'Cu seed layer deposition for ULSI metalization'
[patent_app_type] => B2
[patent_app_number] => 09/785170
[patent_app_country] => US
[patent_app_date] => 2001-02-20
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[pdf_file] => patents/06/511/06511609.pdf
[firstpage_image] =>[orig_patent_app_number] => 09785170
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/785170 | Cu seed layer deposition for ULSI metalization | Feb 19, 2001 | Issued |
Array
(
[id] => 6900134
[patent_doc_number] => 20010009810
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[patent_title] => 'Etching process using a buffer layer'
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Array
(
[id] => 6548464
[patent_doc_number] => 20020111031
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[patent_title] => 'Deep reactive ion etching process and microelectromechanical devices formed thereby'
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Array
(
[id] => 6455069
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[patent_title] => 'Apparatus and methods for chemical-mechanical polishing of semiconductor wafers'
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Array
(
[id] => 6908172
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[patent_title] => 'Method of detecting etching depth'
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Array
(
[id] => 5981399
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[patent_title] => 'Method for fabricating a micro-electro-mechanical fluid ejector'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/768688 | Method for fabricating a micro-electro-mechanical fluid ejector | Jan 23, 2001 | Issued |
Array
(
[id] => 1394904
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[patent_title] => 'Finishing method for semiconductor wafers using a lubricating boundary layer'
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Array
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Array
(
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/766206 | Method for forming a shallow trench isolation structure in a semiconductor device | Jan 18, 2001 | Issued |