| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 17237946
[patent_doc_number] => 11181822
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-11-23
[patent_title] => Resist composition and method of forming resist pattern
[patent_app_type] => utility
[patent_app_number] => 16/420947
[patent_app_country] => US
[patent_app_date] => 2019-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 54052
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 270
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16420947
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/420947 | Resist composition and method of forming resist pattern | May 22, 2019 | Issued |
Array
(
[id] => 17237946
[patent_doc_number] => 11181822
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-11-23
[patent_title] => Resist composition and method of forming resist pattern
[patent_app_type] => utility
[patent_app_number] => 16/420947
[patent_app_country] => US
[patent_app_date] => 2019-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 54052
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 270
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16420947
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/420947 | Resist composition and method of forming resist pattern | May 22, 2019 | Issued |
Array
(
[id] => 15181501
[patent_doc_number] => 20190361342
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-11-28
[patent_title] => RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 16/420828
[patent_app_country] => US
[patent_app_date] => 2019-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 44761
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 289
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16420828
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/420828 | Resist composition and method of forming resist pattern | May 22, 2019 | Issued |
Array
(
[id] => 19898988
[patent_doc_number] => 12276909
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2025-04-15
[patent_title] => Novolak/DNQ based, chemically amplified photoresist
[patent_app_type] => utility
[patent_app_number] => 17/056773
[patent_app_country] => US
[patent_app_date] => 2019-05-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 21955
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 1476
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17056773
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/056773 | Novolak/DNQ based, chemically amplified photoresist | May 21, 2019 | Issued |
Array
(
[id] => 16779735
[patent_doc_number] => 20210116814
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-04-22
[patent_title] => RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUBLE BOND
[patent_app_type] => utility
[patent_app_number] => 17/055148
[patent_app_country] => US
[patent_app_date] => 2019-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 21482
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17055148
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/055148 | Resist underlayer film-forming composition using carbon-oxygen double bond | May 20, 2019 | Issued |
Array
(
[id] => 19292940
[patent_doc_number] => 12032292
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2024-07-09
[patent_title] => Photosensitive film and method for forming permanent mask resist
[patent_app_type] => utility
[patent_app_number] => 17/055264
[patent_app_country] => US
[patent_app_date] => 2019-05-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 6202
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 121
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17055264
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/055264 | Photosensitive film and method for forming permanent mask resist | May 8, 2019 | Issued |
Array
(
[id] => 15026727
[patent_doc_number] => 20190324368
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-10-24
[patent_title] => RESIST COMPOSITION AND PATTERNING PROCESS
[patent_app_type] => utility
[patent_app_number] => 16/388013
[patent_app_country] => US
[patent_app_date] => 2019-04-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9579
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 257
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16388013
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/388013 | Resist composition and patterning process | Apr 17, 2019 | Issued |
Array
(
[id] => 14688257
[patent_doc_number] => 20190243244
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-08-08
[patent_title] => RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
[patent_app_type] => utility
[patent_app_number] => 16/382353
[patent_app_country] => US
[patent_app_date] => 2019-04-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 18766
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -11
[patent_words_short_claim] => 448
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16382353
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/382353 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | Apr 11, 2019 | Abandoned |
Array
(
[id] => 17743965
[patent_doc_number] => 11392028
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-07-19
[patent_title] => Tin dodecamers and radiation patternable coatings with strong EUV absorption
[patent_app_type] => utility
[patent_app_number] => 16/375032
[patent_app_country] => US
[patent_app_date] => 2019-04-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 11
[patent_no_of_words] => 9276
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 66
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16375032
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/375032 | Tin dodecamers and radiation patternable coatings with strong EUV absorption | Apr 3, 2019 | Issued |
Array
(
[id] => 14628135
[patent_doc_number] => 20190227435
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-25
[patent_title] => PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND KIT
[patent_app_type] => utility
[patent_app_number] => 16/369712
[patent_app_country] => US
[patent_app_date] => 2019-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 41982
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 95
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16369712
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/369712 | Pattern forming method, method for producing electronic device, and kit | Mar 28, 2019 | Issued |
Array
(
[id] => 18342635
[patent_doc_number] => 11640113
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2023-05-02
[patent_title] => Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device
[patent_app_type] => utility
[patent_app_number] => 16/368522
[patent_app_country] => US
[patent_app_date] => 2019-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 27719
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 645
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16368522
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/368522 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device | Mar 27, 2019 | Issued |
Array
(
[id] => 16779733
[patent_doc_number] => 20210116812
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-04-22
[patent_title] => POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM THEREFROM, AND SOLID STATE IMAGE SENSOR COMPRISING THE SAME
[patent_app_type] => utility
[patent_app_number] => 17/041639
[patent_app_country] => US
[patent_app_date] => 2019-03-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10144
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17041639
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/041639 | Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same | Mar 26, 2019 | Issued |
Array
(
[id] => 14584627
[patent_doc_number] => 20190219922
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-18
[patent_title] => RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
[patent_app_type] => utility
[patent_app_number] => 16/363238
[patent_app_country] => US
[patent_app_date] => 2019-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 33302
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 608
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16363238
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/363238 | RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | Mar 24, 2019 | Abandoned |
Array
(
[id] => 14836349
[patent_doc_number] => 20190276575
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-09-12
[patent_title] => METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION
[patent_app_type] => utility
[patent_app_number] => 16/362820
[patent_app_country] => US
[patent_app_date] => 2019-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 29191
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 288
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16362820
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/362820 | METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION | Mar 24, 2019 | Abandoned |
Array
(
[id] => 14538229
[patent_doc_number] => 20190204736
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-04
[patent_title] => ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE
[patent_app_type] => utility
[patent_app_number] => 16/298459
[patent_app_country] => US
[patent_app_date] => 2019-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15565
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 112
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16298459
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/298459 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Mar 10, 2019 | Abandoned |
Array
(
[id] => 14839551
[patent_doc_number] => 20190278176
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-09-12
[patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND ELECTRONIC DEVICE
[patent_app_type] => utility
[patent_app_number] => 16/294218
[patent_app_country] => US
[patent_app_date] => 2019-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6017
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -8
[patent_words_short_claim] => 91
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16294218
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/294218 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND ELECTRONIC DEVICE | Mar 5, 2019 | Abandoned |
Array
(
[id] => 14839555
[patent_doc_number] => 20190278178
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-09-12
[patent_title] => CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE
[patent_app_type] => utility
[patent_app_number] => 16/294254
[patent_app_country] => US
[patent_app_date] => 2019-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13990
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -5
[patent_words_short_claim] => 204
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16294254
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/294254 | Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article | Mar 5, 2019 | Issued |
Array
(
[id] => 17542380
[patent_doc_number] => 11307497
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-04-19
[patent_title] => Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
[patent_app_type] => utility
[patent_app_number] => 16/293150
[patent_app_country] => US
[patent_app_date] => 2019-03-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 16787
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 146
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16293150
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/293150 | Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Mar 4, 2019 | Issued |
Array
(
[id] => 14505347
[patent_doc_number] => 20190196328
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-06-27
[patent_title] => PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION
[patent_app_type] => utility
[patent_app_number] => 16/291711
[patent_app_country] => US
[patent_app_date] => 2019-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 32104
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 536
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16291711
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/291711 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION | Mar 3, 2019 | Abandoned |
Array
(
[id] => 14505343
[patent_doc_number] => 20190196326
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-06-27
[patent_title] => ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
[patent_app_type] => utility
[patent_app_number] => 16/286984
[patent_app_country] => US
[patent_app_date] => 2019-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 25139
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16286984
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/286984 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | Feb 26, 2019 | Abandoned |