William Saba

Array ( [id] => 2253333 [patent_doc_number] => 04588451 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-05-13 [patent_title] => 'Metal organic chemical vapor deposition of 111-v compounds on silicon' [patent_app_type] => 1 [patent_app_number] => 6/604835 [patent_app_country] => US [patent_app_date] => 1984-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 4626 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 144 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/588/04588451.pdf [firstpage_image] =>[orig_patent_app_number] => 604835 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2187211 [patent_doc_number] => 04532700 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-08-06 [patent_title] => 'Method of manufacturing semiconductor structures having an oxidized porous silicon isolation layer' [patent_app_type] => 1 [patent_app_number] => 6/604563 [patent_app_country] => US [patent_app_date] => 1984-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 2475 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 128 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/532/04532700.pdf [firstpage_image] =>[orig_patent_app_number] => 604563 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2174189 [patent_doc_number] => 04554726 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-11-26 [patent_title] => 'CMOS Integrated circuit technology utilizing dual implantation of slow and fast diffusing donor ions to form the n-well' [patent_app_type] => 1 [patent_app_number] => 6/601353 [patent_app_country] => US [patent_app_date] => 1984-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 11 [patent_no_of_words] => 5216 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 176 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/554/04554726.pdf [firstpage_image] =>[orig_patent_app_number] => 601353 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2249937 [patent_doc_number] => 04563807 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-01-14 [patent_title] => 'Method for making semiconductor device utilizing molecular beam epitaxy to form the emitter layers' [patent_app_type] => 1 [patent_app_number] => 6/596592 [patent_app_country] => US [patent_app_date] => 1984-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 21 [patent_no_of_words] => 5051 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/563/04563807.pdf [firstpage_image] =>[orig_patent_app_number] => 596592 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2225788 [patent_doc_number] => 04573255 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-03-04 [patent_title] => 'Purging: a reliability assurance technique for semiconductor lasers utilizing a purging process' [patent_app_type] => 1 [patent_app_number] => 6/592285 [patent_app_country] => US [patent_app_date] => 1984-03-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 4433 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 30 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/573/04573255.pdf [firstpage_image] =>[orig_patent_app_number] => 592285 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2139955 [patent_doc_number] => 04497109 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-02-05 [patent_title] => 'Method of fabricating light-controlled thyristor utilizing selective etching and ion-implantation' [patent_app_type] => 1 [patent_app_number] => 6/587839 [patent_app_country] => US [patent_app_date] => 1984-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 1619 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 213 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/497/04497109.pdf [firstpage_image] =>[orig_patent_app_number] => 587839 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2164118 [patent_doc_number] => 04540452 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-09-10 [patent_title] => 'Process for manufacturing a semi-conductor device of the type comprising at least one silicon layer deposited on an insulating substrate' [patent_app_type] => 1 [patent_app_number] => 6/587641 [patent_app_country] => US [patent_app_date] => 1984-03-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 3292 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 223 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/540/04540452.pdf [firstpage_image] =>[orig_patent_app_number] => 587641 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2157443 [patent_doc_number] => 04554030 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-11-19 [patent_title] => 'Method of manufacturing a semiconductor device by means of a molecular beam technique' [patent_app_type] => 1 [patent_app_number] => 6/585649 [patent_app_country] => US [patent_app_date] => 1984-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 2615 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/554/04554030.pdf [firstpage_image] =>[orig_patent_app_number] => 585649 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2181600 [patent_doc_number] => 04555273 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-11-26 [patent_title] => 'Furnace transient anneal process' [patent_app_type] => 1 [patent_app_number] => 6/583560 [patent_app_country] => US [patent_app_date] => 1984-02-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2766 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 199 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/555/04555273.pdf [firstpage_image] =>[orig_patent_app_number] => 583560 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2163918 [patent_doc_number] => 04546537 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-10-15 [patent_title] => 'Method for producing a semiconductor device utilizing V-groove etching and thermal oxidation' [patent_app_type] => 1 [patent_app_number] => 6/578592 [patent_app_country] => US [patent_app_date] => 1984-02-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 3165 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 323 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/546/04546537.pdf [firstpage_image] =>[orig_patent_app_number] => 578592 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2195000 [patent_doc_number] => 04502898 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-03-05 [patent_title] => 'Diffusion procedure for semiconductor compound' [patent_app_type] => 1 [patent_app_number] => 6/563701 [patent_app_country] => US [patent_app_date] => 1983-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 3240 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/502/04502898.pdf [firstpage_image] =>[orig_patent_app_number] => 563701 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2227525 [patent_doc_number] => 04571275 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-02-18 [patent_title] => 'Method for minimizing autodoping during epitaxial deposition utilizing a graded pattern subcollector' [patent_app_type] => 1 [patent_app_number] => 6/562927 [patent_app_country] => US [patent_app_date] => 1983-12-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 18 [patent_no_of_words] => 3639 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/571/04571275.pdf [firstpage_image] =>[orig_patent_app_number] => 562927 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2179743 [patent_doc_number] => 04504331 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-03-12 [patent_title] => 'Silicon dopant source in intermetallic semiconductor growth operations' [patent_app_type] => 1 [patent_app_number] => 6/559583 [patent_app_country] => US [patent_app_date] => 1983-12-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1379 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/504/04504331.pdf [firstpage_image] =>[orig_patent_app_number] => 559583 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2218629 [patent_doc_number] => 04609413 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-09-02 [patent_title] => 'Method for manufacturing and epitaxially isolated semiconductor utilizing etch and refill technique' [patent_app_type] => 1 [patent_app_number] => 6/553326 [patent_app_country] => US [patent_app_date] => 1983-11-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 13 [patent_no_of_words] => 3505 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 161 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/609/04609413.pdf [firstpage_image] =>[orig_patent_app_number] => 553326 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2174405 [patent_doc_number] => 04529455 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-07-16 [patent_title] => 'Method for epitaxially growing Ge.sub.x Si.sub.1-x layers on Si utilizing molecular beam epitaxy' [patent_app_type] => 1 [patent_app_number] => 6/546736 [patent_app_country] => US [patent_app_date] => 1983-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 3731 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 181 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/529/04529455.pdf [firstpage_image] =>[orig_patent_app_number] => 546736 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2179729 [patent_doc_number] => 04504330 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-03-12 [patent_title] => 'Optimum reduced pressure epitaxial growth process to prevent autodoping' [patent_app_type] => 1 [patent_app_number] => 6/543555 [patent_app_country] => US [patent_app_date] => 1983-10-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1386 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/504/04504330.pdf [firstpage_image] =>[orig_patent_app_number] => 543555 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2156260 [patent_doc_number] => 04509997 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-04-09 [patent_title] => 'Organometallic chemical vapor deposition of films utilizing organic heterocyclic compounds' [patent_app_type] => 1 [patent_app_number] => 6/543003 [patent_app_country] => US [patent_app_date] => 1983-10-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 2134 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/509/04509997.pdf [firstpage_image] =>[orig_patent_app_number] => 543003 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2197100 [patent_doc_number] => 04533410 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-08-06 [patent_title] => 'Process of vapor phase epitaxy of compound semiconductors' [patent_app_type] => 1 [patent_app_number] => 6/542770 [patent_app_country] => US [patent_app_date] => 1983-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 11 [patent_no_of_words] => 4436 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/533/04533410.pdf [firstpage_image] =>[orig_patent_app_number] => 542770 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2179717 [patent_doc_number] => 04504329 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-03-12 [patent_title] => 'Process for the epitaxial deposition of III-V compounds utilizing a binary alloy as the metallic source' [patent_app_type] => 1 [patent_app_number] => 6/539603 [patent_app_country] => US [patent_app_date] => 1983-10-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2938 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 323 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/504/04504329.pdf [firstpage_image] =>[orig_patent_app_number] => 539603 [rel_patent_id] =>[rel_patent_doc_number] =>)