
William W. Lewis
Examiner (ID: 14829)
| Most Active Art Unit | 3731 |
| Art Unit(s) | 2899, 3306, 3309, 3731 |
| Total Applications | 1277 |
| Issued Applications | 996 |
| Pending Applications | 119 |
| Abandoned Applications | 162 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 709380
[patent_doc_number] => 07056388
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-06
[patent_title] => 'Reaction chamber with at least one HF feedthrough'
[patent_app_type] => utility
[patent_app_number] => 10/269157
[patent_app_country] => US
[patent_app_date] => 2002-10-11
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 1855
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[pdf_file] => patents/07/056/07056388.pdf
[firstpage_image] =>[orig_patent_app_number] => 10269157
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/269157 | Reaction chamber with at least one HF feedthrough | Oct 10, 2002 | Issued |
Array
(
[id] => 558351
[patent_doc_number] => 07458335
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2008-12-02
[patent_title] => 'Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils'
[patent_app_type] => utility
[patent_app_number] => 10/269129
[patent_app_country] => US
[patent_app_date] => 2002-10-10
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[firstpage_image] =>[orig_patent_app_number] => 10269129
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/269129 | Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils | Oct 9, 2002 | Issued |
Array
(
[id] => 7278140
[patent_doc_number] => 20040060517
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-01
[patent_title] => 'Process apparatus and method for improving plasma production of an inductively coupled plasma'
[patent_app_type] => new
[patent_app_number] => 10/255460
[patent_app_country] => US
[patent_app_date] => 2002-09-26
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[pdf_file] => publications/A1/0060/20040060517.pdf
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Array
(
[id] => 6713299
[patent_doc_number] => 20030024646
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-06
[patent_title] => 'Plasma etching apparatus and plasma etching method'
[patent_app_type] => new
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[patent_app_country] => US
[patent_app_date] => 2002-09-25
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/253862 | Plasma etching apparatus and plasma etching method | Sep 24, 2002 | Abandoned |
Array
(
[id] => 7365206
[patent_doc_number] => 20040026040
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[patent_kind] => A1
[patent_issue_date] => 2004-02-12
[patent_title] => 'Plasma processing apparatus'
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[firstpage_image] =>[orig_patent_app_number] => 10247555
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/247555 | Plasma processing apparatus | Sep 19, 2002 | Issued |
Array
(
[id] => 6718400
[patent_doc_number] => 20030052087
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[patent_kind] => A1
[patent_issue_date] => 2003-03-20
[patent_title] => 'Plasma generating apparatus and SiO2 thin film etching method using the same'
[patent_app_type] => new
[patent_app_number] => 10/235606
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/235606 | Plasma generating apparatus and SiO2 thin film etching method using the same | Sep 3, 2002 | Abandoned |
Array
(
[id] => 6630461
[patent_doc_number] => 20030006009
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[patent_issue_date] => 2003-01-09
[patent_title] => 'Process chamber having a voltage distribution electrode'
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[pdf_file] => publications/A1/0006/20030006009.pdf
[firstpage_image] =>[orig_patent_app_number] => 10232913
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/232913 | Process chamber having a voltage distribution electrode | Aug 29, 2002 | Abandoned |
Array
(
[id] => 476913
[patent_doc_number] => 07223321
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[patent_kind] => B1
[patent_issue_date] => 2007-05-29
[patent_title] => 'Faraday shield disposed within an inductively coupled plasma etching apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/232564
[patent_app_country] => US
[patent_app_date] => 2002-08-30
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/223/07223321.pdf
[firstpage_image] =>[orig_patent_app_number] => 10232564
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/232564 | Faraday shield disposed within an inductively coupled plasma etching apparatus | Aug 29, 2002 | Issued |
Array
(
[id] => 6855605
[patent_doc_number] => 20030129106
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-10
[patent_title] => 'Semiconductor processing using an efficiently coupled gas source'
[patent_app_type] => new
[patent_app_number] => 10/231867
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[patent_app_date] => 2002-08-29
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[pdf_file] => publications/A1/0129/20030129106.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/231867 | Semiconductor processing using an efficiently coupled gas source | Aug 28, 2002 | Abandoned |
Array
(
[id] => 7634769
[patent_doc_number] => 06656849
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-02
[patent_title] => 'Plasma reactor'
[patent_app_type] => B2
[patent_app_number] => 10/228999
[patent_app_country] => US
[patent_app_date] => 2002-08-28
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/228999 | Plasma reactor | Aug 27, 2002 | Issued |
Array
(
[id] => 7129542
[patent_doc_number] => 20040040662
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-04
[patent_title] => 'Plasma processing method and apparatus for etching nonvolatile material'
[patent_app_type] => new
[patent_app_number] => 10/229076
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[pdf_file] => publications/A1/0040/20040040662.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/229076 | Plasma processing method and apparatus for etching nonvolatile material | Aug 27, 2002 | Abandoned |
Array
(
[id] => 6772627
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[patent_issue_date] => 2003-01-23
[patent_title] => 'Inductively coupled plasma reactor'
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Array
(
[id] => 6708263
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/218413 | Plasma processing device and plasma processing method | Aug 14, 2002 | Abandoned |
| 10/210239 | Method for adjusting voltage on a powered Faraday shield | Jul 30, 2002 | Abandoned |
Array
(
[id] => 1085310
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/207183 | Plasma processing method and apparatus | Jul 29, 2002 | Issued |
Array
(
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Array
(
[id] => 928219
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[patent_title] => 'Plasma CVD apparatus'
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Array
(
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[patent_issue_date] => 2003-01-23
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Array
(
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Array
(
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