William W. Lewis

Array ( [id] => 6106084 [patent_doc_number] => 20020170678 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-11-21 [patent_title] => 'Plasma processing apparatus' [patent_app_type] => new [patent_app_number] => 10/146366 [patent_app_country] => US [patent_app_date] => 2002-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 8157 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0170/20020170678.pdf [firstpage_image] =>[orig_patent_app_number] => 10146366 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6789656 [patent_doc_number] => 20030085000 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-08 [patent_title] => 'Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber' [patent_app_type] => new [patent_app_number] => 10/146443 [patent_app_country] => US [patent_app_date] => 2002-05-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 38 [patent_figures_cnt] => 38 [patent_no_of_words] => 9513 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0085/20030085000.pdf [firstpage_image] =>[orig_patent_app_number] => 10146443 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6806663 [patent_doc_number] => 20030196602 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-10-23 [patent_title] => 'Method and apparatus for neutralization of ion beam using AC ion source' [patent_app_type] => new [patent_app_number] => 10/126132 [patent_app_country] => US [patent_app_date] => 2002-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2185 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 152 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0196/20030196602.pdf [firstpage_image] =>[orig_patent_app_number] => 10126132 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1209367 [patent_doc_number] => 06708645 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-03-23 [patent_title] => 'Arc resistant high voltage feedthru fitting for a vacuum deposition chamber' [patent_app_type] => B1 [patent_app_number] => 10/121812 [patent_app_country] => US [patent_app_date] => 2002-04-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 17 [patent_no_of_words] => 4502 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 270 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/708/06708645.pdf [firstpage_image] =>[orig_patent_app_number] => 10121812 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6872349 [patent_doc_number] => 20030192646 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-10-16 [patent_title] => 'Plasma processing chamber having magnetic assembly and method' [patent_app_type] => new [patent_app_number] => 10/122271 [patent_app_country] => US [patent_app_date] => 2002-04-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3920 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0192/20030192646.pdf [firstpage_image] =>[orig_patent_app_number] => 10122271 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1240489 [patent_doc_number] => 06682630 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-01-27 [patent_title] => 'Uniform gas distribution in large area plasma source' [patent_app_type] => B1 [patent_app_number] => 10/088512 [patent_app_country] => US [patent_app_date] => 2002-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 16 [patent_no_of_words] => 8777 [patent_no_of_claims] => 45 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/682/06682630.pdf [firstpage_image] =>[orig_patent_app_number] => 10088512 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6718124 [patent_doc_number] => 20030051811 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-20 [patent_title] => 'Plasma resistant member' [patent_app_type] => new [patent_app_number] => 10/108475 [patent_app_country] => US [patent_app_date] => 2002-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 7885 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0051/20030051811.pdf [firstpage_image] =>[orig_patent_app_number] => 10108475 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 665645 [patent_doc_number] => 07097735 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-08-29 [patent_title] => 'Plasma processing device' [patent_app_type] => utility [patent_app_number] => 10/296614 [patent_app_country] => US [patent_app_date] => 2002-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 20 [patent_no_of_words] => 10084 [patent_no_of_claims] => 58 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/097/07097735.pdf [firstpage_image] =>[orig_patent_app_number] => 10296614 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7317825 [patent_doc_number] => 20040134613 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-15 [patent_title] => 'Device and method for plasma processing, and slow-wave plate' [patent_app_type] => new [patent_app_number] => 10/296619 [patent_app_country] => US [patent_app_date] => 2002-11-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 9682 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0134/20040134613.pdf [firstpage_image] =>[orig_patent_app_number] => 10296619 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6106083 [patent_doc_number] => 20020170677 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-11-21 [patent_title] => 'RF power process apparatus and methods' [patent_app_type] => new [patent_app_number] => 10/104468 [patent_app_country] => US [patent_app_date] => 2002-03-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5290 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0170/20020170677.pdf [firstpage_image] =>[orig_patent_app_number] => 10104468 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6563623 [patent_doc_number] => 20020164883 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-11-07 [patent_title] => 'Plasma device' [patent_app_type] => new [patent_app_number] => 10/100533 [patent_app_country] => US [patent_app_date] => 2002-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 81 [patent_figures_cnt] => 81 [patent_no_of_words] => 32270 [patent_no_of_claims] => 73 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 30 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0164/20020164883.pdf [firstpage_image] =>[orig_patent_app_number] => 10100533 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1331919 [patent_doc_number] => 06596550 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-07-22 [patent_title] => 'Method for monitoring substrate biasing during plasma processing of a substrate' [patent_app_type] => B2 [patent_app_number] => 10/093628 [patent_app_country] => US [patent_app_date] => 2002-03-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 8369 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 264 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/596/06596550.pdf [firstpage_image] =>[orig_patent_app_number] => 10093628 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6771949 [patent_doc_number] => 20030015287 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-01-23 [patent_title] => 'Inner wall protection member for chamber and plasma procressing apparatus' [patent_app_type] => new [patent_app_number] => 10/092783 [patent_app_country] => US [patent_app_date] => 2002-03-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2938 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0015/20030015287.pdf [firstpage_image] =>[orig_patent_app_number] => 10092783 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6555406 [patent_doc_number] => 20020084035 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-04 [patent_title] => 'Plasma processing apparatus and method' [patent_app_type] => new [patent_app_number] => 10/086710 [patent_app_country] => US [patent_app_date] => 2002-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 17 [patent_no_of_words] => 7918 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 185 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0084/20020084035.pdf [firstpage_image] =>[orig_patent_app_number] => 10086710 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6763893 [patent_doc_number] => 20030098291 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-29 [patent_title] => 'Layer-by-layer etching apparatus using neutral beam and etching method using the same' [patent_app_type] => new [patent_app_number] => 10/086497 [patent_app_country] => US [patent_app_date] => 2002-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4981 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0098/20030098291.pdf [firstpage_image] =>[orig_patent_app_number] => 10086497 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6832237 [patent_doc_number] => 20030159782 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-08-28 [patent_title] => 'Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing' [patent_app_type] => new [patent_app_number] => 10/080496 [patent_app_country] => US [patent_app_date] => 2002-02-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 8718 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0159/20030159782.pdf [firstpage_image] =>[orig_patent_app_number] => 10080496 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1262946 [patent_doc_number] => 06660127 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-12-09 [patent_title] => 'Apparatus for plasma etching at a constant etch rate' [patent_app_type] => B2 [patent_app_number] => 10/075223 [patent_app_country] => US [patent_app_date] => 2002-02-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 12 [patent_no_of_words] => 8396 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/660/06660127.pdf [firstpage_image] =>[orig_patent_app_number] => 10075223 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6501064 [patent_doc_number] => 20020134509 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-26 [patent_title] => 'Apparatus and method for plasma etching' [patent_app_type] => new [patent_app_number] => 10/067966 [patent_app_country] => US [patent_app_date] => 2002-02-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 5683 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0134/20020134509.pdf [firstpage_image] =>[orig_patent_app_number] => 10067966 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6152801 [patent_doc_number] => 20020144781 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-10 [patent_title] => 'Local etching method' [patent_app_type] => new [patent_app_number] => 10/066607 [patent_app_country] => US [patent_app_date] => 2002-02-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 6012 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 206 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0144/20020144781.pdf [firstpage_image] =>[orig_patent_app_number] => 10066607 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6267269 [patent_doc_number] => 20020104482 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-08 [patent_title] => 'Plasma-assisted processing apparatus' [patent_app_type] => new [patent_app_number] => 10/061168 [patent_app_country] => US [patent_app_date] => 2002-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 9100 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0104/20020104482.pdf [firstpage_image] =>[orig_patent_app_number] => 10061168 [rel_patent_id] =>[rel_patent_doc_number] =>)