
Yvette C. Thornton
Examiner (ID: 1219)
| Most Active Art Unit | 1752 |
| Art Unit(s) | 1752 |
| Total Applications | 363 |
| Issued Applications | 301 |
| Pending Applications | 18 |
| Abandoned Applications | 44 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 946508
[patent_doc_number] => 06964840
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[patent_issue_date] => 2005-11-15
[patent_title] => 'Radiation-sensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 10/867892
[patent_app_country] => US
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Array
(
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[patent_issue_date] => 2005-11-08
[patent_title] => 'Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same'
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Array
(
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[patent_title] => 'Positive resist composition'
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Array
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Array
(
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Array
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Array
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Array
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[patent_title] => 'Resin useful for resist, resist composition and pattern forming process using the same'
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Array
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Array
(
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[patent_title] => 'Permanent resist, permanent resist-laminated substrate and process for producing the same'
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Array
(
[id] => 1085526
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[patent_title] => 'Acetal protected polymers and photoresists compositions thereof'
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/425848 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | Apr 29, 2003 | Issued |
Array
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Array
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Array
(
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[patent_title] => 'Negative resist composition comprising hydroxy-substituted base polymer and si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same'
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Array
(
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Array
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