
Yvette C. Thornton
Examiner (ID: 1219)
| Most Active Art Unit | 1752 |
| Art Unit(s) | 1752 |
| Total Applications | 363 |
| Issued Applications | 301 |
| Pending Applications | 18 |
| Abandoned Applications | 44 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1049921
[patent_doc_number] => 06861198
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-01
[patent_title] => 'Negative resist material and pattern formation method using the same'
[patent_app_type] => utility
[patent_app_number] => 10/351097
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Array
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[patent_doc_number] => 20030207215
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[patent_issue_date] => 2003-11-06
[patent_title] => 'Optical devices made from radiation curable fluorinated compositions'
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Array
(
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[patent_doc_number] => 20030165773
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[patent_issue_date] => 2003-09-04
[patent_title] => 'Polymers, resist compositions and patterning process'
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[patent_app_number] => 10/328007
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Array
(
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[patent_doc_number] => 20030091926
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[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Dry film photoresist'
[patent_app_type] => new
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Array
(
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[patent_doc_number] => 06962767
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[patent_issue_date] => 2005-11-08
[patent_title] => 'Acetal compound, polymer, resist composition and patterning process'
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Array
(
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Array
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[patent_title] => 'Polymerizable compounds with quadruple hydrogen bond forming groups'
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Array
(
[id] => 6710811
[patent_doc_number] => 20030170560
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[patent_issue_date] => 2003-09-11
[patent_title] => 'Decomposition type resin'
[patent_app_type] => new
[patent_app_number] => 10/287738
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/287738 | Decomposition type resin | Nov 4, 2002 | Abandoned |
Array
(
[id] => 6865022
[patent_doc_number] => 20030190548
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[patent_issue_date] => 2003-10-09
[patent_title] => 'Light-sensitive composition'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/283071 | Light-sensitive composition | Oct 29, 2002 | Issued |
Array
(
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[patent_title] => 'Resist composition and patterning process'
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Array
(
[id] => 1112604
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[patent_title] => 'Organic anti-reflective coating material and preparation thereof'
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Array
(
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[patent_title] => 'Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same'
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Array
(
[id] => 6683059
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Array
(
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Array
(
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Array
(
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[patent_title] => 'Bis-o-aminophenol derivatives, poly-o-hydroxyamides, and polybenzoxazoles, usable in photosensitive compositions, dielectrics, buffer coatings, and microelectronics'
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Array
(
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