
Yvette C. Thornton
Examiner (ID: 663)
| Most Active Art Unit | 1752 |
| Art Unit(s) | 1752 |
| Total Applications | 363 |
| Issued Applications | 301 |
| Pending Applications | 18 |
| Abandoned Applications | 44 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6817623
[patent_doc_number] => 20030068581
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-10
[patent_title] => 'Conductive pattern material and method for forming conductive pattern'
[patent_app_type] => new
[patent_app_number] => 10/208820
[patent_app_country] => US
[patent_app_date] => 2002-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 22260
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 39
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0068/20030068581.pdf
[firstpage_image] =>[orig_patent_app_number] => 10208820
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/208820 | Conductive pattern material and method for forming conductive pattern | Jul 31, 2002 | Issued |
Array
(
[id] => 6787498
[patent_doc_number] => 20030138737
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-24
[patent_title] => 'Photoresist stripping solution and a method of stripping photoresists using the same'
[patent_app_type] => new
[patent_app_number] => 10/208054
[patent_app_country] => US
[patent_app_date] => 2002-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7185
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 17
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0138/20030138737.pdf
[firstpage_image] =>[orig_patent_app_number] => 10208054
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/208054 | Photoresist stripping solution and a method of stripping photoresists using the same | Jul 30, 2002 | Abandoned |
Array
(
[id] => 6801026
[patent_doc_number] => 20030096190
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-22
[patent_title] => 'Chemically amplified photoresist and process for structuring substituents using transparency enhancement of resist copolymers for 157 NM photolithography through the use of fluorinated cinnamic acid derivatives'
[patent_app_type] => new
[patent_app_number] => 10/208326
[patent_app_country] => US
[patent_app_date] => 2002-07-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4027
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0096/20030096190.pdf
[firstpage_image] =>[orig_patent_app_number] => 10208326
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/208326 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Jul 29, 2002 | Issued |
Array
(
[id] => 972023
[patent_doc_number] => 06936408
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-08-30
[patent_title] => 'Partially photoexposed positive photoresist layer blocking method for regio-selectively processing a microelectronic layer'
[patent_app_type] => utility
[patent_app_number] => 10/197322
[patent_app_country] => US
[patent_app_date] => 2002-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 5
[patent_no_of_words] => 3248
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 139
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/936/06936408.pdf
[firstpage_image] =>[orig_patent_app_number] => 10197322
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/197322 | Partially photoexposed positive photoresist layer blocking method for regio-selectively processing a microelectronic layer | Jul 15, 2002 | Issued |
| 10/018744 | Photosensitive low-permittivity polyimide and method of forming positive polyimide film pattern from the same | Jul 11, 2002 | Abandoned |
Array
(
[id] => 6735411
[patent_doc_number] => 20030013046
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-16
[patent_title] => 'Use of sacrificial layers in the manufacturing of chemical reactor structures and the application of such structures'
[patent_app_type] => new
[patent_app_number] => 10/186252
[patent_app_country] => US
[patent_app_date] => 2002-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 6178
[patent_no_of_claims] => 43
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0013/20030013046.pdf
[firstpage_image] =>[orig_patent_app_number] => 10186252
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/186252 | Use of sacrificial layers in the manufacturing of chemical reactor structures and the application of such structures | Jun 27, 2002 | Abandoned |
Array
(
[id] => 6688228
[patent_doc_number] => 20030031953
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-13
[patent_title] => 'Polymers, resist compositions and patterning process'
[patent_app_type] => new
[patent_app_number] => 10/178638
[patent_app_country] => US
[patent_app_date] => 2002-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12955
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 15
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0031/20030031953.pdf
[firstpage_image] =>[orig_patent_app_number] => 10178638
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/178638 | Polymers, resist compositions and patterning process | Jun 24, 2002 | Issued |
Array
(
[id] => 1046643
[patent_doc_number] => 06864037
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-08
[patent_title] => 'Polymers, resist compositions and patterning process'
[patent_app_type] => utility
[patent_app_number] => 10/178237
[patent_app_country] => US
[patent_app_date] => 2002-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12053
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 14
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/864/06864037.pdf
[firstpage_image] =>[orig_patent_app_number] => 10178237
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/178237 | Polymers, resist compositions and patterning process | Jun 24, 2002 | Issued |
Array
(
[id] => 6688227
[patent_doc_number] => 20030031952
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-13
[patent_title] => 'Polymers, resist compositions and patterning process'
[patent_app_type] => new
[patent_app_number] => 10/178475
[patent_app_country] => US
[patent_app_date] => 2002-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9811
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 32
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0031/20030031952.pdf
[firstpage_image] =>[orig_patent_app_number] => 10178475
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/178475 | Polymers, resist compositions and patterning process | Jun 24, 2002 | Issued |
Array
(
[id] => 7612963
[patent_doc_number] => 06902870
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-06-07
[patent_title] => 'Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer'
[patent_app_type] => utility
[patent_app_number] => 10/174915
[patent_app_country] => US
[patent_app_date] => 2002-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 17
[patent_no_of_words] => 5861
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 118
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/902/06902870.pdf
[firstpage_image] =>[orig_patent_app_number] => 10174915
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/174915 | Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer | Jun 18, 2002 | Issued |
Array
(
[id] => 6735404
[patent_doc_number] => 20030013039
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-16
[patent_title] => 'Resist composition and patterning process'
[patent_app_type] => new
[patent_app_number] => 10/170345
[patent_app_country] => US
[patent_app_date] => 2002-06-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16185
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 25
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0013/20030013039.pdf
[firstpage_image] =>[orig_patent_app_number] => 10170345
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/170345 | Resist composition and patterning process | Jun 13, 2002 | Issued |
Array
(
[id] => 1373503
[patent_doc_number] => 06558874
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-06
[patent_title] => 'Photosensitive silver conductor tape and composition thereof'
[patent_app_type] => B2
[patent_app_number] => 10/155783
[patent_app_country] => US
[patent_app_date] => 2002-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5350
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 182
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/558/06558874.pdf
[firstpage_image] =>[orig_patent_app_number] => 10155783
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/155783 | Photosensitive silver conductor tape and composition thereof | May 23, 2002 | Issued |
Array
(
[id] => 7427050
[patent_doc_number] => 20040209186
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-21
[patent_title] => 'Substituted oxime derivatives and the use thereof as latent acids'
[patent_app_type] => new
[patent_app_number] => 10/478963
[patent_app_country] => US
[patent_app_date] => 2003-11-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20975
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0209/20040209186.pdf
[firstpage_image] =>[orig_patent_app_number] => 10478963
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/478963 | Substituted oxime derivatives and the use thereof as latent acids | May 22, 2002 | Issued |
Array
(
[id] => 6674112
[patent_doc_number] => 20030059715
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-27
[patent_title] => 'Positive resist composition'
[patent_app_type] => new
[patent_app_number] => 10/146896
[patent_app_country] => US
[patent_app_date] => 2002-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9660
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 335
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0059/20030059715.pdf
[firstpage_image] =>[orig_patent_app_number] => 10146896
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/146896 | Positive resist composition | May 16, 2002 | Abandoned |
Array
(
[id] => 5844037
[patent_doc_number] => 20020132185
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-19
[patent_title] => 'Copolymer photoresist with improved etch resistance'
[patent_app_type] => new
[patent_app_number] => 10/141482
[patent_app_country] => US
[patent_app_date] => 2002-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4176
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0132/20020132185.pdf
[firstpage_image] =>[orig_patent_app_number] => 10141482
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/141482 | Copolymer photoresist with improved etch resistance | May 7, 2002 | Abandoned |
Array
(
[id] => 1208853
[patent_doc_number] => 06713228
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-03-30
[patent_title] => 'Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same'
[patent_app_type] => B2
[patent_app_number] => 10/132804
[patent_app_country] => US
[patent_app_date] => 2002-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5626
[patent_no_of_claims] => 61
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 50
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/713/06713228.pdf
[firstpage_image] =>[orig_patent_app_number] => 10132804
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/132804 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | Apr 23, 2002 | Issued |
Array
(
[id] => 1122881
[patent_doc_number] => 06794111
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-09-21
[patent_title] => 'Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation'
[patent_app_type] => B2
[patent_app_number] => 10/126877
[patent_app_country] => US
[patent_app_date] => 2002-04-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19049
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/794/06794111.pdf
[firstpage_image] =>[orig_patent_app_number] => 10126877
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/126877 | Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation | Apr 21, 2002 | Issued |
Array
(
[id] => 1245479
[patent_doc_number] => 06677103
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-01-13
[patent_title] => 'Positive-working photoresist composition'
[patent_app_type] => B2
[patent_app_number] => 10/114258
[patent_app_country] => US
[patent_app_date] => 2002-04-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5358
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 248
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/677/06677103.pdf
[firstpage_image] =>[orig_patent_app_number] => 10114258
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/114258 | Positive-working photoresist composition | Apr 2, 2002 | Issued |
Array
(
[id] => 6688225
[patent_doc_number] => 20030031950
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-13
[patent_title] => 'Positive photoresist composition'
[patent_app_type] => new
[patent_app_number] => 10/109872
[patent_app_country] => US
[patent_app_date] => 2002-04-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13791
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 22
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0031/20030031950.pdf
[firstpage_image] =>[orig_patent_app_number] => 10109872
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/109872 | Positive photoresist composition | Mar 31, 2002 | Issued |
Array
(
[id] => 6735403
[patent_doc_number] => 20030013038
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-16
[patent_title] => 'Chemical amplification type positive resist composition'
[patent_app_type] => new
[patent_app_number] => 10/107488
[patent_app_country] => US
[patent_app_date] => 2002-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4845
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 118
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0013/20030013038.pdf
[firstpage_image] =>[orig_patent_app_number] => 10107488
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/107488 | Chemical amplification type positive resist composition | Mar 27, 2002 | Issued |