Zond, LLC v. Fujitsu Limited et al > Summary
Court Case Number 1:13-cv-11634
Filing Date Jul 9, 2013
Court Massachusetts District Court
Status Unknown
Plaintiff
Defendant
5Plaintiff Attorneys
6Zond
Attorney Name: David S. Godkin
Birnbaum & Godkin
Zond
Attorney Name: Daniel Kesack
Radulescu LLP
Zond
Attorney Name: Etai Yaacov Lahav
Radulescu LLP
Zond
Attorney Name: Gregory S. Maskel
Radulescu LLP
Zond
Attorney Name: David C. Radulescu
Radulescu LLP
Zond
Attorney Name: Tigran Vardanian
Radulescu LLP
Defendant Attorneys
10Fujitsu Semiconductor America
Attorney Name: Alexandra Capachietti
Burns & Levinson
Fujitsu Limited
Attorney Name: Alexandra Capachietti
Burns & Levinson
TSMC Development
Attorney Name: Anthony J. Fitzpatrick
Duane Morris LLP
Taiwan Semiconductor Manufacturing Company
Attorney Name: Anthony J. Fitzpatrick
Duane Morris LLP
Taiwan Semiconductor Manufacturing Company
Attorney Name: Anthony J. Fitzpatrick
Duane Morris LLP
WAFERTECH, LLC
Attorney Name: Anthony J. Fitzpatrick
Duane Morris LLP
Fujitsu Semiconductor America
Attorney Name: Merton E. Thompson
Burns & Levinson
Fujitsu Semiconductor America
Attorney Name: Merton E. Thompson
Burns & Levinson
Fujitsu Limited
Attorney Name: Merton E. Thompson
Burns & Levinson
Cause
35:271 Patent Infringement
Related Patents
| Doc No | Title | Issue date |
|---|---|---|
| 08125155 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities | Feb 28, 2012 |
| 07811421 | High deposition rate sputtering | Oct 12, 2010 |
| 07808184 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities | Oct 5, 2010 |
| 07604716 | Methods and apparatus for generating high-density plasma | Oct 20, 2009 |
| 07147759 | High-power pulsed magnetron sputtering | Dec 12, 2006 |
| 06853142 | Methods and apparatus for generating high-density plasma | Feb 8, 2005 |
| 06805779 | Plasma generation using multi-step ionization | Oct 19, 2004 |
| 06806652 | High-density plasma source using excited atoms | Oct 19, 2004 |
