Induction heated reactor system for chemical vapor deposition | Patent Number 04579080

US 04579080 NA
Application Number6698580
Publication Number-
Pendency1 year, 1 month, 24 days
Filled DateFeb 6, 1985
Priority DateDec 9, 1983
Publication Date-
Expiration DateApr 1, 1990
Inventor/Applicants John G. Martin
Walter C. Benzing
Robert Graham
ExaminesLUSIGNAN, MICHAEL R
Art Unit1502
Technology Center1500
Assignments
Applied Materials Inc.
Current
Applied Materials IsraelApplied Materials Inc.
Original
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