Organometallic solution based high resolution patterning compositions and corresponding methods | Patent Number 10642153

US 10642153 B2
Application Number14920107
Publication NumberUS 20160116839 A1
Pendency4 years, 6 months, 17 days
Filled DateOct 22, 2015
Priority DateOct 23, 2014
Publication DateApr 28, 2016
Expiration DateOct 22, 2034
Inventor/ApplicantsKai Jiang
Stephen T. Meyers
Joseph Burton Edson
Michael K. Kocsis
Brian J. Cardineau
Douglas A. Keszler
Jeremy T. Anderson
Alan J. Telecky
ExaminesCHACKO DAVIS, DABORAH
Art Unit1737
Technology Center1700
Assignments
Inpria Corporation
Current
Inpria Corporation
Original
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