Techniques for controlling precursors in chemical deposition processes | Patent Number 10822699

US 10822699 B2
Application Number15946483
Publication NumberUS 20190203358 A1
Pendency2 years, 7 months, 3 days
Filled DateApr 5, 2018
Priority DateDec 29, 2017
Publication DateJul 4, 2019
Expiration DateDec 28, 2037
Inventor/ApplicantsElaina Babayan
Vijay Venugopal
Sarah White
Jonathan Bakke
ExaminesZERVIGON, RUDY
Art Unit1716
Technology Center1700
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