Performance improvement of EUV photoresist by ion implantation | Patent Number 10990014
US 10990014 B2Filled DateNov 22, 2019
Priority DateAug 18, 2017
Publication DateMar 26, 2020
Expiration DateAug 17, 2037
Inventor/ApplicantsTristan Y. Ma
Anthony Renau
Joseph Olson
Huixiong Dai
John Hautala
Anthony Renau
Joseph Olson
Huixiong Dai
John Hautala
ExaminesDUDA, KATHLEEN
Art Unit1737
Technology Center1700
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