Techniques to engineer nanoscale patterned features using ions | Patent Number 11488823

US 11488823 B2
Application Number17170351
Publication NumberUS 20210166936 A1
Pendency1 year, 8 months, 26 days
Filled DateFeb 8, 2021
Priority DateJun 25, 2015
Publication DateJun 3, 2021
Expiration DateJun 24, 2035
Inventor/ApplicantsJohn Hautala
Huixiong Dai
Simon Ruffell
Adam Brand
ExaminesDEO, DUY VU NGUYEN
Art Unit1713
Technology Center1700
Assignments
Varian Medical Systems Inc.
Current
Varian Medical Systems Inc.
Original
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