Target structure of physical vapor deposition | Patent Number 11649543

US 11649543 B2
Application Number17667362
Publication NumberUS 20220162744 A1
Pendency1 year, 3 months, 7 days
Filled DateFeb 8, 2022
Priority DateJun 30, 2017
Publication DateMay 26, 2022
Expiration DateJun 29, 2037
Inventor/ApplicantsChih-Hsuan HSIEH
Yu-Hsuan Wang
Yu-Hsuan WANG
Hung-Cheng Chen
Ping-Yuan Chen
Chih-Hsuan Hsieh
Ping-Yuan CHEN
Hung-Cheng CHEN
ExaminesMCDONALD, RODNEY GLENN
Art Unit1794
Technology Center1700
Assignments
Taiwan Semiconductor Manufacturing Company
Current
Taiwan Semiconductor Manufacturing Company
Original
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