Semiconductor device having a multi-layer diffusion barrier and method of making the same | Patent Number 11742393

US 11742393 B2
Application Number17683749
Publication NumberUS 20220190122 A1
Pendency1 year, 6 months, 1 day
Filled DateMar 1, 2022
Priority DateJun 30, 2017
Publication DateJun 16, 2022
Expiration DateJun 29, 2037
Inventor/ApplicantsJyh-nan LIN
Yuh-Ta Fan
Jyh-nan Lin
Ding-I Liu
ExaminesCHAMBLISS, ALONZO
Art Unit2897
Technology Center2800
Assignments
Taiwan Semiconductor Manufacturing Company
Current
Taiwan Semiconductor Manufacturing Company
Original
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