Substrate processing apparatus and substrate processing method | Patent Number 11801537

US 11801537 B2
Application Number17661601
Publication NumberUS 20220362813 A1
Pendency1 year, 6 months, 2 days
Filled DateMay 2, 2022
Priority DateMay 2, 2022
Publication DateNov 17, 2022
Expiration DateMay 1, 2042
Inventor/ApplicantsTakahito Nakashoya
Takahito NAKASHOYA
ExaminesBERGNER, ERIN FLANAGAN
Art Unit1713
Technology Center1700
Assignments
Tokyo Electron Limited
Current
Tokyo Electron Limited
Original
Law Firm
You must be logged in to view
Login
Attorneys
Subscription-Only
View Concierge Program
Patent Prosecution report image

Empower your practice with Patexia Publication Prosecution IP Module.

Get access to our exclusive rankings and unlock powerful data.
Check our Latest ReportPurchase IP Module

Looking for a Publication Attorney?

Get in touch with our team or create your account to start exploring a network of over 120K attorneys.