Techniques to engineer nanoscale patterned features using ions | Patent Number 11908691
US 11908691 B2Filled DateSep 23, 2022
Priority DateJun 25, 2015
Publication DateJan 19, 2023
Expiration DateJun 24, 2035
Inventor/ApplicantsJohn Hautala
Huixiong Dai
Adam Brand
Simon Ruffell
Huixiong Dai
Adam Brand
Simon Ruffell
ExaminesDEO, DUY VU NGUYEN
Art Unit1713
Technology Center1700
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