Method and apparatus for controlling spatial distribution of RF power and plasma density | Patent Publication Number 20050031796
US 20050031796 A1Publication DateFeb 10, 2005
Original AssigneeTaiwan Semiconductor Manufacturing Company
Current AssigneeTaiwan Semiconductor Manufacturing Company
Inventor/ApplicantsBing-Hung Chen
Sunny Wu
Ping-Hsu Chen
Chih-Tien Chang
Sunny Wu
Ping-Hsu Chen
Chih-Tien Chang
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