ETCHING COMPOSITION FOR SELECTIVELY ETCHING SILICON NITRIDE, ETCHING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME | Patent Publication Number 20240014044
US 20240014044 A1Publication DateJan 11, 2024
Original Assignee
Current AssigneeSk Hynix
Ajou University
Ajou University
Inventor/ApplicantsGo Un KIM
Eun Seok OH
Hyun Goo KANG
Tae Gun PARK
Young Mee KANG
Sang Woo LIM
Eun Seok OH
Hyun Goo KANG
Tae Gun PARK
Young Mee KANG
Sang Woo LIM
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