Method and apparatus for reducing vacuum loss in an ion implantation system | Patent Publication Number 20220216040

US 20220216040 A1
Patent NumberUS 11764042 B2
Application Number17701538
Filled DateMar 22, 2022
Priority DateOct 23, 2018
Publication DateJul 7, 2022
Original AssigneeTaiwan Semiconductor Manufacturing Company
Current AssigneeTaiwan Semiconductor Manufacturing Company
Inventor/ApplicantsFang-Chi Chien
Chao-Po Lu
Tsung-Min LIN
Tsung-Min Lin
Cheng-Yi Huang
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