Raylen E Worthington
Examiner (ID: 8673)
Most Active Art Unit | 2933 |
Art Unit(s) | 2933 |
Total Applications | 39 |
Issued Applications | 34 |
Pending Applications | 5 |
Abandoned Applications | 0 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 1296626
[patent_doc_number] => 06627382
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Fluoro-containing photosensitive polymer and photoresist composition containing the same'
[patent_app_type] => B2
[patent_app_number] => 09/947582
[patent_app_country] => US
[patent_app_date] => 2001-09-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7410
[patent_no_of_claims] => 46
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/627/06627382.pdf
[firstpage_image] =>[orig_patent_app_number] => 09947582
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/947582 | Fluoro-containing photosensitive polymer and photoresist composition containing the same | Sep 5, 2001 | Issued |
Array
(
[id] => 5873737
[patent_doc_number] => 20020048723
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-25
[patent_title] => 'Photoresist composition for resist flow process'
[patent_app_type] => new
[patent_app_number] => 09/947625
[patent_app_country] => US
[patent_app_date] => 2001-09-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 3222
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0048/20020048723.pdf
[firstpage_image] =>[orig_patent_app_number] => 09947625
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/947625 | Photoresist composition for resist flow process | Sep 5, 2001 | Issued |
Array
(
[id] => 1110526
[patent_doc_number] => 06806024
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-10-19
[patent_title] => 'Oxime derivatives and the use thereof as photoinitiators'
[patent_app_type] => B1
[patent_app_number] => 09/914433
[patent_app_country] => US
[patent_app_date] => 2001-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22271
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 1751
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/806/06806024.pdf
[firstpage_image] =>[orig_patent_app_number] => 09914433
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/914433 | Oxime derivatives and the use thereof as photoinitiators | Aug 26, 2001 | Issued |
Array
(
[id] => 1148292
[patent_doc_number] => 06770417
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-03
[patent_title] => 'Negative resist composition, process for forming resist patterns, and process for manufacturing electron device'
[patent_app_type] => B2
[patent_app_number] => 09/935832
[patent_app_country] => US
[patent_app_date] => 2001-08-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 15
[patent_no_of_words] => 17448
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 27
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/770/06770417.pdf
[firstpage_image] =>[orig_patent_app_number] => 09935832
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/935832 | Negative resist composition, process for forming resist patterns, and process for manufacturing electron device | Aug 23, 2001 | Issued |
Array
(
[id] => 524011
[patent_doc_number] => 07183037
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-02-27
[patent_title] => 'Antireflective coatings with increased etch rates'
[patent_app_type] => utility
[patent_app_number] => 09/932792
[patent_app_country] => US
[patent_app_date] => 2001-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6830
[patent_no_of_claims] => 42
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 31
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/183/07183037.pdf
[firstpage_image] =>[orig_patent_app_number] => 09932792
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/932792 | Antireflective coatings with increased etch rates | Aug 16, 2001 | Issued |
Array
(
[id] => 1415934
[patent_doc_number] => 06514667
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-02-04
[patent_title] => 'Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof'
[patent_app_type] => B2
[patent_app_number] => 09/932002
[patent_app_country] => US
[patent_app_date] => 2001-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 18
[patent_no_of_words] => 7639
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/514/06514667.pdf
[firstpage_image] =>[orig_patent_app_number] => 09932002
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/932002 | Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof | Aug 16, 2001 | Issued |
Array
(
[id] => 6750196
[patent_doc_number] => 20030044716
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-06
[patent_title] => 'Photoresist compositions'
[patent_app_type] => new
[patent_app_number] => 09/930880
[patent_app_country] => US
[patent_app_date] => 2001-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5983
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 20
[patent_words_short_claim] => 16
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20030044716.pdf
[firstpage_image] =>[orig_patent_app_number] => 09930880
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/930880 | Photoresist compositions | Aug 14, 2001 | Issued |
Array
(
[id] => 1413833
[patent_doc_number] => 06511786
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-28
[patent_title] => 'Pattern formation material and pattern formation method'
[patent_app_type] => B2
[patent_app_number] => 09/924093
[patent_app_country] => US
[patent_app_date] => 2001-08-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 4363
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/511/06511786.pdf
[firstpage_image] =>[orig_patent_app_number] => 09924093
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/924093 | Pattern formation material and pattern formation method | Aug 7, 2001 | Issued |
Array
(
[id] => 1276896
[patent_doc_number] => 06645694
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-11
[patent_title] => 'Pattern formation material and pattern formation method'
[patent_app_type] => B2
[patent_app_number] => 09/922638
[patent_app_country] => US
[patent_app_date] => 2001-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 4416
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/645/06645694.pdf
[firstpage_image] =>[orig_patent_app_number] => 09922638
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/922638 | Pattern formation material and pattern formation method | Aug 6, 2001 | Issued |
Array
(
[id] => 6095567
[patent_doc_number] => 20020051933
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-05-02
[patent_title] => 'Positive photosensitive composition'
[patent_app_type] => new
[patent_app_number] => 09/921691
[patent_app_country] => US
[patent_app_date] => 2001-08-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19709
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0051/20020051933.pdf
[firstpage_image] =>[orig_patent_app_number] => 09921691
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/921691 | Positive photosensitive composition | Aug 5, 2001 | Issued |
Array
(
[id] => 5828157
[patent_doc_number] => 20020068242
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-06
[patent_title] => 'Exposure method'
[patent_app_type] => new
[patent_app_number] => 09/907372
[patent_app_country] => US
[patent_app_date] => 2001-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 3751
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0068/20020068242.pdf
[firstpage_image] =>[orig_patent_app_number] => 09907372
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/907372 | Exposure method | Jul 16, 2001 | Issued |
Array
(
[id] => 6778480
[patent_doc_number] => 20030049561
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-13
[patent_title] => 'Etch improved resist systems containing acrylate (or methacrylate) silane monomers'
[patent_app_type] => new
[patent_app_number] => 09/907392
[patent_app_country] => US
[patent_app_date] => 2001-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7896
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 13
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0049/20030049561.pdf
[firstpage_image] =>[orig_patent_app_number] => 09907392
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/907392 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Jul 16, 2001 | Issued |
Array
(
[id] => 1383491
[patent_doc_number] => 06548229
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-15
[patent_title] => 'Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same'
[patent_app_type] => B2
[patent_app_number] => 09/903586
[patent_app_country] => US
[patent_app_date] => 2001-07-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4630
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 199
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/548/06548229.pdf
[firstpage_image] =>[orig_patent_app_number] => 09903586
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/903586 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Jul 12, 2001 | Issued |
Array
(
[id] => 6063230
[patent_doc_number] => 20020031719
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-03-14
[patent_title] => 'Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio'
[patent_app_type] => new
[patent_app_number] => 09/901646
[patent_app_country] => US
[patent_app_date] => 2001-07-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 6519
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0031/20020031719.pdf
[firstpage_image] =>[orig_patent_app_number] => 09901646
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/901646 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Jul 10, 2001 | Issued |
Array
(
[id] => 6650183
[patent_doc_number] => 20030008230
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-09
[patent_title] => 'Thiophene-containing photo acid generators for photolithography'
[patent_app_type] => new
[patent_app_number] => 09/896538
[patent_app_country] => US
[patent_app_date] => 2001-06-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5152
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 38
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20030008230.pdf
[firstpage_image] =>[orig_patent_app_number] => 09896538
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/896538 | Thiophene-containing photo acid generators for photolithography | Jun 28, 2001 | Issued |
Array
(
[id] => 1277502
[patent_doc_number] => RE038282
[patent_country] => US
[patent_kind] => E1
[patent_issue_date] => 2003-10-21
[patent_title] => 'Process for using bilayer photoresist'
[patent_app_type] => E1
[patent_app_number] => 09/895624
[patent_app_country] => US
[patent_app_date] => 2001-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3232
[patent_no_of_claims] => 71
[patent_no_of_ind_claims] => 0
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/RE/038/RE038282.pdf
[firstpage_image] =>[orig_patent_app_number] => 09895624
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/895624 | Process for using bilayer photoresist | Jun 27, 2001 | Issued |
Array
(
[id] => 6434549
[patent_doc_number] => 20020127789
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-12
[patent_title] => 'Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof'
[patent_app_type] => new
[patent_app_number] => 09/888829
[patent_app_country] => US
[patent_app_date] => 2001-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3911
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 11
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0127/20020127789.pdf
[firstpage_image] =>[orig_patent_app_number] => 09888829
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/888829 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof | Jun 24, 2001 | Issued |
Array
(
[id] => 1344645
[patent_doc_number] => 06582883
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-06-24
[patent_title] => 'Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof'
[patent_app_type] => B2
[patent_app_number] => 09/891029
[patent_app_country] => US
[patent_app_date] => 2001-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3721
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/582/06582883.pdf
[firstpage_image] =>[orig_patent_app_number] => 09891029
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/891029 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Jun 24, 2001 | Issued |
Array
(
[id] => 1383362
[patent_doc_number] => 06548220
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-15
[patent_title] => 'Chemical amplifying type positive resist composition and sulfonium salt'
[patent_app_type] => B2
[patent_app_number] => 09/886386
[patent_app_country] => US
[patent_app_date] => 2001-06-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14072
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 361
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/548/06548220.pdf
[firstpage_image] =>[orig_patent_app_number] => 09886386
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/886386 | Chemical amplifying type positive resist composition and sulfonium salt | Jun 21, 2001 | Issued |
Array
(
[id] => 1413889
[patent_doc_number] => 06511789
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-28
[patent_title] => 'Photosensitive polyimide precursor compositions'
[patent_app_type] => B2
[patent_app_number] => 09/886626
[patent_app_country] => US
[patent_app_date] => 2001-06-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4510
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 62
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/511/06511789.pdf
[firstpage_image] =>[orig_patent_app_number] => 09886626
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/886626 | Photosensitive polyimide precursor compositions | Jun 19, 2001 | Issued |