Method and apparatus for reducing vacuum loss in an ion implantation system | Patent Number 11764042

US 11764042 B2
Application Number17701538
Publication NumberUS 20220216040 A1
Pendency1 year, 6 months, 1 day
Filled DateMar 22, 2022
Priority DateOct 23, 2018
Publication DateJul 7, 2022
Expiration DateOct 22, 2038
Inventor/ApplicantsCheng-Yi Huang
Tsung-Min Lin
Chao-Po Lu
Fang-Chi Chien
Tsung-Min LIN
ExaminesIPPOLITO, NICOLE MARIE
Art Unit2881
Technology Center2800
Assignments
Taiwan Semiconductor Manufacturing Company
Current
Taiwan Semiconductor Manufacturing Company
Original
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